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    Methods, Systems, and Computer Program Products for Printing Patterns on Photosensitive Surfaces
    2.
    发明申请
    Methods, Systems, and Computer Program Products for Printing Patterns on Photosensitive Surfaces 有权
    方法，系统和计算机程序产品，用于在感光表面上打印图案

    公开(公告)号：US20080079923A1

    公开(公告)日：2008-04-03

    申请号：US11836343

    申请日：2007-08-09

    申请人： Azat Latypov ,  Karel Mast

    发明人： Azat Latypov ,  Karel Mast

    IPC分类号： G03B27/72 ,  G03B27/54

    CPC分类号： G03F7/70475 ,  G03B27/54 ,  G03F7/70291

    摘要： A method, system, and computer program product are provided for printing a pattern on a photosensitive surface using a maskless lithography system including a spatial light modulator (SLM). The method, system, and computer program product define two or more exposure areas within a predetermined region of the surface, each area corresponding to selected pixels of the SLM. An overlap region is formed between the two or more exposure areas, the overlapping region being defined by respective overlapping edges of the exposure areas, the overlapping edges corresponding to overlapping pairs of the selected pixels from each area. The pixels within each pair are alternately activated such that only one of the pixels within the pair is used to produce the pattern.

    摘要翻译： 提供了一种使用包括空间光调制器（SLM）的无掩模光刻系统在感光表面上印刷图案的方法，系统和计算机程序产品。 方法，系统和计算机程序产品在表面的预定区域内定义两个或更多个曝光区域，每个区域对应于SLM的所选像素。 在两个或多个曝光区域之间形成重叠区域，重叠区域由曝光区域的相应重叠边缘限定，重叠边缘对应于来自每个区域的所选像素的重叠对。 每对中的像素被交替地激活，使得只有一对中的像素之一用于产生图案。

    Methods and systems to compensate for a stitching disturbance of a printed pattern
    5.
    发明申请
    Methods and systems to compensate for a stitching disturbance of a printed pattern 有权
    用于补偿印刷图案的缝合干扰的方法和系统

    公开(公告)号：US20080094595A1

    公开(公告)日：2008-04-24

    申请号：US12000522

    申请日：2007-12-13

    申请人： Arno Bleeker ,  Wenceslao Cebuhar ,  Justin Kreuzer ,  Azat Latypov ,  Yuli Vladimirsky

    发明人： Arno Bleeker ,  Wenceslao Cebuhar ,  Justin Kreuzer ,  Azat Latypov ,  Yuli Vladimirsky

    IPC分类号： G03B27/42

    CPC分类号： G03F7/70475 ,  G03B21/18 ,  G03B27/42 ,  G03F7/70091 ,  G03F7/70291 ,  G03F7/70466

    摘要： A method and system are provided of using a patterning device. An exemplary method includes performing a first exposure of a surface corresponding to image data, determining an image deficiency within a region of the first image, adjusting the image data to compensate for the image deficiency, and performing a second exposure of the surface corresponding to the adjusted image data during a second pass of the patterning device with respect to the surface. The first exposure occurs during a first pass of the patterning device with respect to the surface to produce a first image on the surface.

    摘要翻译： 提供了使用图案形成装置的方法和系统。 示例性方法包括执行与图像数据相对应的表面的第一曝光，确定第一图像的区域内的图像不足，调整图像数据以补偿图像不足，以及执行对应于图像数据的表面的第二次曝光 在图案形成装置相对于表面的第二遍期间的调整图像数据。 第一曝光在图案形成装置相对于表面的第一遍期间发生，以在表面上产生第一图像。

    Methods and systems to compensate for a stitching disturbance of a printed pattern in a maskless lithography system utilizing overlap without an explicit attenuation
    6.
    发明授权
    Methods and systems to compensate for a stitching disturbance of a printed pattern in a maskless lithography system utilizing overlap without an explicit attenuation 有权
    用于补偿无掩模光刻系统中印刷图案的缝合干扰的方法和系统，其利用重叠而没有明确的衰减

    公开(公告)号：US07259831B2

    公开(公告)日：2007-08-21

    申请号：US11396542

    申请日：2006-04-04

    申请人： Azat Latypov ,  Karel Van der Mast

    发明人： Azat Latypov ,  Karel Van der Mast

    IPC分类号： G03B27/32 ,  G03B27/54

    CPC分类号： G03F7/70475 ,  G03B27/54 ,  G03F7/70291

    摘要： A method and system are provided for printing a pattern on a photosensitive surface using a maskless lithography system including a spatial light modulator (SLM). The method includes defining two or more exposure areas within a predetermined region of the surface, each area corresponding to selected pixels of the SLM. An overlap region is formed between the two or more exposure areas, the overlapping region being defined by respective overlapping edges of the exposure areas, the overlapping edges corresponding to overlapping pairs of the selected pixels from each area. The pixels within each pair are alternately activated such that only one of the pixels within the pair is used to produce the pattern.

    摘要翻译： 提供了一种用于使用包括空间光调制器（SLM）的无掩模光刻系统在感光表面上印刷图案的方法和系统。 该方法包括在表面的预定区域内定义两个或更多个曝光区域，每个区域对应于SLM的所选像素。 在两个或多个曝光区域之间形成重叠区域，重叠区域由曝光区域的相应重叠边缘限定，重叠边缘对应于来自每个区域的所选像素的重叠对。 每对中的像素被交替地激活，使得只有一对中的像素之一用于产生图案。

    Method and system for maskless lithography real-time pattern rasterization and using computationally coupled mirrors to achieve optimum feature representation
    7.
    发明申请
    Method and system for maskless lithography real-time pattern rasterization and using computationally coupled mirrors to achieve optimum feature representation 有权

    公开(公告)号：US20070002419A1

    公开(公告)日：2007-01-04

    申请号：US11170065

    申请日：2005-06-30

    申请人： Azat Latypov ,  Kars Troost ,  Johannes Matheus Baselmans

    发明人： Azat Latypov ,  Kars Troost ,  Johannes Matheus Baselmans

    IPC分类号： G02B26/00

    CPC分类号： G03F7/70291

    摘要： A method and system for determining specific pixel modulation states of a spatial light modulator (SLM) to print a desired pattern on a substrate are disclosed. The method includes selecting at least one super-pixel in an object plane of the desired pattern, the super-pixel being formed of at least two pixels. At least one edge of the desired pattern crosses a boundary within the super-pixel, the at least one edge being defined by specific slope and position parameters relative to the super-pixel. The method also includes (i) forming an interpolation table to tabulate pre-calculated pixel modulation states and (ii) determining the specific pixel modulation states for each of the pixels in accordance with the interpolation table. Disclosed also are a method and system for providing a spatial light modulator (SLM). The SLM includes a plurality of mirrors structured to form groups of super-pixels. Each super-pixel (i) includes two or more mirrors from the plurality of mirrors and (ii) is configured to switch only one pixel of light. Each of the two or more mirrors can be separately actuated.

    SYSTEM AND METHOD FOR CALCULATING AERIAL IMAGE OF A SPATIAL LIGHT MODULATOR
    10.
    发明申请
    SYSTEM AND METHOD FOR CALCULATING AERIAL IMAGE OF A SPATIAL LIGHT MODULATOR 有权
    用于计算空间光调制器的空气影像的系统和方法

    公开(公告)号：US20050243397A1

    公开(公告)日：2005-11-03

    申请号：US10835403

    申请日：2004-04-30

    申请人： Azat Latypov

    发明人： Azat Latypov

    IPC分类号： H01L21/027 ,  G02B26/00 ,  G02F1/00 ,  G03B27/42 ,  G03F1/00 ,  G03F7/20 ,  G03F9/00 ,  G09G5/02 ,  H04N11/20

    CPC分类号： G03F7/70441 ,  G03F7/70283 ,  G03F7/70291 ,  G03F7/705 ,  G03F7/70508 ,  G03F7/70666

    摘要： A method of calculating an aerial image of a spatial light modulator array includes calculating a pixel interference matrix that represents pair wise interference between pixels of the spatial light modulator array; calculating effective graytones corresponding to modulation states of the pixels; and calculating the aerial image based on the pixel interference matrix and the effective graytones. The graytones depend only on the modulation states of the pixels. The pixel interference matrix depends only on position variables. The position variables are position in an image plane and position in a plane of a source of electromagnetic radiation. The pixel interference matrix can be a matrix of functions. The pixel interference matrix can be a four dimensional matrix. The effective graytones are approximated using sinc functions, or using polynomial functions.

    摘要翻译： 计算空间光调制器阵列的空间图像的方法包括：计算表示空间光调制器阵列的像素之间的成对干涉的像素干涉矩阵; 计算与像素的调制状态对应的有效灰度; 并基于像素干涉矩阵和有效灰度来计算空间图像。 灰度只取决于像素的调制状态。 像素干涉矩阵仅取决于位置变量。 位置变量是图像平面中的位置和电磁辐射源的平面中的位置。 像素干涉矩阵可以是函数矩阵。 像素干涉矩阵可以是四维矩阵。 使用sinc函数或使用多项式函数近似有效的灰度。