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公开(公告)号:US07760324B2
公开(公告)日:2010-07-20
申请号:US11378627
申请日:2006-03-20
申请人: Jozef Petrus Henricus Benschop , Hans Butler , Nicolaas Rudolf Kemper , Bartholomeus Hendricus Koek , Frits Van Der Meulen , Harmen Klaas Van Der Schoot
发明人: Jozef Petrus Henricus Benschop , Hans Butler , Nicolaas Rudolf Kemper , Bartholomeus Hendricus Koek , Frits Van Der Meulen , Harmen Klaas Van Der Schoot
IPC分类号: G03B27/52
CPC分类号: G03F7/70341
摘要: An immersion lithographic projection apparatus includes a shutter member is employed to block a liquid supply system during substrate swap to ensure that liquid remains in contact with an element of the projection system during substrate swap. The shutter member is connected to a metrology frame which also supports the projection system. In this way the position of the shutter member is always known.
摘要翻译: 浸没式光刻投影装置包括闸板构件,以在衬底交换期间阻挡液体供应系统,以确保在衬底互换期间液体保持与投影系统的元件接触。 挡板构件连接到也支撑投影系统的计量框架。 以这种方式,挡板部件的位置总是已知的。