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公开(公告)号：US20110085180A1
公开(公告)日：2011-04-14
申请号：US12902847
申请日：2010-10-12
申请人： Ruud Antonius Catharina Maria Beerens , Sjoerd Nicolaas Lambertus Donders , Engelbertus Antonius Fransiscus Van Der Pasch , Bastiaan Lambertus Wilhelmus Marinus Van De Ven , Johannes Petrus Martinus Bernardus Vermeulen
发明人： Ruud Antonius Catharina Maria Beerens , Sjoerd Nicolaas Lambertus Donders , Engelbertus Antonius Fransiscus Van Der Pasch , Bastiaan Lambertus Wilhelmus Marinus Van De Ven , Johannes Petrus Martinus Bernardus Vermeulen
IPC分类号： G01B11/14
CPC分类号： G03F7/7085 , G01B9/02 , G01B9/02049 , G01B11/14 , G01B2290/70 , G03F7/70766 , G03F7/70775
摘要： A position measurement system configured to measure a position quantity of a movable object in a measurement direction, the system including a radiation source, a beam splitter to split the radiation beam in a measurement beam and a reference beam, a first reflective surface mounted on the movable object to receive the measurement beam, a second reflective surface mounted on a reference object to receive the reference beam, and a detector arranged to receive a first and second reflected beam reflected by the first and second reflective surface, respectively, and configured to provide a signal representative of the position quantity of the movable object based on the first and the second beam, wherein the radiation source and detector are mounted on an object that is different from the movable object and the reference object.
摘要翻译： 一种位置测量系统，被配置为在测量方向上测量可移动物体的位置量，所述系统包括辐射源，将测量光束中的辐射束分离的分束器和参考光束，安装在所述测量光束上的第一反射表面 可移动物体以接收测量光束，安装在参考对象上以接收参考光束的第二反射表面;以及检测器，被布置为分别接收由第一和第二反射表面反射的第一和第二反射光束，并且被配置为提供 表示基于第一和第二光束的可移动物体的位置量的信号，其中辐射源和检测器安装在与可移动物体和参考对象不同的物体上。
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公开(公告)号：US07053980B2
公开(公告)日：2006-05-30
申请号：US10762568
申请日：2004-01-23
CPC分类号： G03F9/7096 , G03F7/70741 , G03F7/7075 , G03F7/70858 , G03F9/7011 , G03F9/7015
摘要： A lithographic apparatus equipped with an alignment system is presented herein. In one embodiment, the lithographic apparatus includes an illumination system that provides a beam of radiation, a patterning device that imparts the beam of radiation with a desired pattern in its cross-section and is supported by a support structure, a substrate holder that holds a substrate, a projection system that projects the patterned beam onto a target portion of the substrate, and a conditioned chamber. The apparatus also includes an actuator that introduces either the patterning device or the substrate into the conditioned chamber and an alignment system, which is disposed outside the conditioned chamber, that positions the patterning device or the substrate in alignment with the projected patterned beam of radiation.
摘要翻译： 本文介绍了配备有对准系统的光刻设备。 在一个实施例中，光刻设备包括提供辐射束的照明系统，在其横截面中赋予所需图案的辐射束并由支撑结构支撑的图案形成装置， 基板，将图案化的光束投射到基板的目标部分上的投影系统和调节室。 该装置还包括将图案形成装置或基板引入调节室的致动器以及设置在调节室外部的对准系统，其使图案形成装置或基板与投影的图案化的辐射束对准。
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公开(公告)号：US07978307B2
公开(公告)日：2011-07-12
申请号：US11417222
申请日：2006-05-04
申请人： Bastiaan Lambertus Wilhelmus Marinus Van De Ven , Johannes Adrianus Antonius Theodorus Dams , Jacob Willem Vink
发明人： Bastiaan Lambertus Wilhelmus Marinus Van De Ven , Johannes Adrianus Antonius Theodorus Dams , Jacob Willem Vink
CPC分类号： G03F7/70816 , F16C29/025 , F16C32/0603
摘要： A gas bearing has a first bearing part defining a first bearing surface and a second bearing part defining a second bearing surface. Between the first bearing surface and the second bearing surface there is a gap. A gas supply device supplies a gas to the gap. The first bearing part is at least partly ferromagnetic, and the second bearing part has at least one permanent magnet interacting with the first bearing part for pre-tensioning the gas bearing. The gas bearing may be part of a lithographic apparatus.
摘要翻译： 气体轴承具有限定第一轴承表面的第一轴承部分和限定第二轴承表面的第二轴承部件。 在第一支承面和第二支承面之间存在间隙。 气体供给装置向间隙供给气体。 第一轴承部分至少部分是铁磁性的，并且第二轴承部分具有与第一轴承部件相互作用的至少一个永磁体，用于预紧气体轴承。 气体轴承可以是光刻设备的一部分。
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公开(公告)号：US07839489B2
公开(公告)日：2010-11-23
申请号：US11812166
申请日：2007-06-15
CPC分类号： G03B27/42 , G03B27/62 , G03F7/707 , G03F7/70741 , G03F9/7003 , G03F9/7011 , G03F9/7088 , G03F9/7096
摘要： A system for use in a lithographic apparatus includes an assembly of a reticle and a reticle holder. The reticle includes a marker. The system also includes a position detector arranged to detect the reticle marker to position the reticle with respect to the reticle holder, and a storage container constructed and arranged to store the assembly during the positioning of the reticle with respect to the reticle holder. The reticle holder and the detector are arranged to be kinematically aligned with respect to each other.
摘要翻译： 用于光刻设备的系统包括光罩和光罩保持器的组件。 标线包括标记。 该系统还包括位置检测器，其布置成检测掩模版标记物以相对于光罩保持器定位光罩;以及存储容器，其被构造和布置成在掩模版相对于光罩保持器定位期间存储组件。 掩模版保持器和检测器被布置成相对于彼此以运动方式对准。
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公开(公告)号：US07466397B2
公开(公告)日：2008-12-16
申请号：US10894361
申请日：2004-07-20
CPC分类号： G03F7/707 , G03F7/70716 , G03F7/70741 , G03F7/70783 , G03F7/70825 , G03F7/709
摘要： A lithographic apparatus equipped with a patterning device safety mechanism, is presented herein. In one embodiment, the apparatus comprises an illumination system for providing a beam of radiation, a support structure for supporting a patterning device that serves to impart the beam of radiation with a pattern in its cross-section, a substrate holder for holding a substrate having a plurality of target portions, a projection system for projecting the patterned beam onto the substrate target portions, a connector for securing the patterning device relative to the support structure, and a safety mechanism configured to reduce uncontrolled displacement of the patterning device in case of failure of the connector.
摘要翻译： 本文介绍了一种配有图案形成装置安全机构的光刻设备。 在一个实施例中，该装置包括用于提供辐射束的照明系统，用于支撑图案形成装置的支撑结构，其用于使辐射束在其横截面上具有图案;衬底保持器，用于保持具有 多个目标部分，用于将图案化光束投影到基板目标部分上的投影系统，用于将图案形成装置相对于支撑结构固定的连接器，以及安全机构，其被配置为减少图案形成装置在失败时的不受控制的位移 的连接器。
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公开(公告)号：US07236233B2
公开(公告)日：2007-06-26
申请号：US10962751
申请日：2004-10-13
CPC分类号： G03F7/707
摘要： An assembly for use in a lithographic apparatus is disclosed. The assembly includes a reticle, and a reticle holder. The reticle holder is adjustable between a form closed reticle blocking state and a reticle releasing state. The reticle holder is arranged to (1) prevent movement of the reticle with respect to the reticle holder in at least one direction without friction when the reticle holder is in the form closed reticle blocking state, and (2) release the reticle when the reticle holder is in the reticle releasing state.
摘要翻译： 公开了一种用于光刻设备的组件。 组件包括掩模版和掩模版保持器。 标线架支架在形状闭合的掩模版阻挡状态和掩模版释放状态之间是可调节的。 所述标线架保持器布置为：（1）当所述标线架保持器处于封闭掩模版阻挡状态时，防止所述掩模版相对于所述标线架保持器在至少一个方向上的移动而不产生摩擦，并且（2）当所述标线片 支架处于分划板释放状态。
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公开(公告)号：US07123344B2
公开(公告)日：2006-10-17
申请号：US10671588
申请日：2003-09-29
CPC分类号： G03F7/70741
摘要： The invention relates to a lithographic apparatus including an illumination system for providing a projection beam of radiation, a support structure for supporting patterning means, the patterning means serving to impart the projection beam with a pattern in its cross-section, a dust-right storage container defining a storage space for storing patterning structures, wherein the storage container is arranged to be coupled with a transfer container such that the transfer container for exchanging patterning structures between the transfer container and the lithographic apparatus through a closeable passage between the transfer container and the storage container, a substrate table for holding a substrate and a projection system for projecting the patterned beam onto a target portion of the substrate. Furthermore, the invention relates to a method of using such an apparatus.
摘要翻译： 本发明涉及一种光刻设备，其包括用于提供投影辐射束的照明系统，用于支撑图案形成装置的支撑结构，用于使投影光束在其横截面上具有图案的图案形成装置，灰尘存储 容器限定用于存储图案形成结构的存储空间，其中所述存储容器布置成与转移容器联接，使得所述转移容器通过所述转移容器和所述转印容器之间的可关闭通道在所述转印容器和所述光刻设备之间交换图案形成结构， 存储容器，用于保持基板的基板台和用于将图案化的光束投影到基板的目标部分上的投影系统。 此外，本发明涉及使用这种装置的方法。
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8.发明授权Lithographic apparatus, method of deforming a substrate table and device manufacturing method 有权平版印刷装置，基板台的变形方法及装置的制造方法公开(公告)号：US09329501B2
公开(公告)日：2016-05-03
申请号：US13494638
申请日：2012-06-12
申请人： Yang-Shan Huang , Hans Butler , Jan Van Eijk , Sven Antoin Johan Hol , Engelbertus Antonius Fransiscus Van Der Pasch , Bastiaan Lambertus Wilhelmus Marinus Van De Ven , Johannes Petrus Martinus Bernardus Vermeulen , Theodorus Petrus Maria Cadee , Robbert Edgar Van Leeuwen
发明人： Yang-Shan Huang , Hans Butler , Jan Van Eijk , Sven Antoin Johan Hol , Engelbertus Antonius Fransiscus Van Der Pasch , Bastiaan Lambertus Wilhelmus Marinus Van De Ven , Johannes Petrus Martinus Bernardus Vermeulen , Theodorus Petrus Maria Cadee , Robbert Edgar Van Leeuwen
CPC分类号： G03F7/7085 , G03F7/70783
摘要： A lithographic apparatus includes a projection system, a substrate table, a plurality of sensors, an actuator and a controller. The projection system is configured to project a patterned beam of radiation onto a substrate. The substrate table is configured to support the substrate and to move relative to the projection system. The plurality of sensors is configured to measure a deformation of the substrate table. The actuator is configured to deform the substrate table. The controller is configured to control the actuator to deform the substrate table based on measurements made by the sensors. The plurality of sensors is located on a first side of the substrate table opposite to a second side of the substrate table facing the projection system. The plurality of sensors is substantially stationary relative to the projection system.
摘要翻译： 光刻设备包括投影系统，衬底台，多个传感器，致动器和控制器。 投影系统被配置为将图案化的辐射束投射到衬底上。 衬底台被配置为支撑衬底并相对于投影系统移动。 多个传感器被配置成测量衬底台的变形。 致动器构造成使基板台变形。 控制器被配置成基于由传感器进行的测量来控制致动器使基板台变形。 多个传感器位于与衬底台面对投影系统的第二侧相对的衬底台的第一侧上。 多个传感器相对于投影系统基本上是静止的。
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9.发明授权Alignment marker and lithographic apparatus and device manufacturing method using the same 有权对准标记和光刻设备及使用其的器件制造方法公开(公告)号：US07781237B2
公开(公告)日：2010-08-24
申请号：US11147114
申请日：2005-06-08
申请人： Gert-Jan Heerens , Anastasius Jacobus Anicetus Bruinsma , Jacob Fredrik Frisco Klinkhamer , Bastiaan Lambertus Wilhelmus Marinus Van De Ven , Hubert Adriaan Van Mierlo , Willem Arthur Vliegenthart
发明人： Gert-Jan Heerens , Anastasius Jacobus Anicetus Bruinsma , Jacob Fredrik Frisco Klinkhamer , Bastiaan Lambertus Wilhelmus Marinus Van De Ven , Hubert Adriaan Van Mierlo , Willem Arthur Vliegenthart
CPC分类号： G03F9/7065 , G03F9/7076 , G03F9/7088
摘要： An apparatus includes a first support structure configured to support an element that has an alignment marker provided with at least one height difference. The apparatus also includes an alignment sensor comprising a light source that is configured to provide a light beam that illuminates the alignment marker; and at least one detector configured to detect the at least one height difference of the alignment marker by analyzing the light beam reflected by the alignment marker. Such an apparatus may be used to align of the element with respect to the first support structure.
摘要翻译： 一种装置包括：第一支撑结构，其构造成支撑具有设置有至少一个高度差的对准标记的元件。 该装置还包括对准传感器，该对准传感器包括被配置为提供照射对准标记的光束的光源; 以及至少一个检测器，被配置为通过分析由所述对准标记物反射的光束来检测所述对准标记的所述至少一个高度差。 可以使用这样的装置来相对于第一支撑结构对准元件。
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公开(公告)号：US07084961B2
公开(公告)日：2006-08-01
申请号：US10740822
申请日：2003-12-22
CPC分类号： G03F7/707 , G03F7/70741 , G03F7/70825
摘要： A lithographic apparatus equipped with a patterning device safety mechanism, is presented herein. In one embodiment, the apparatus comprises an illumination system for providing a beam of radiation, a support structure for supporting a patterning device that serves to impart the beam of radiation with a pattern in its cross-section, a substrate holder for holding a substrate having a plurality of target portions, a projection system for projecting the patterned beam onto the substrate target portions, a connector for securing the patterning device relative to the support structure; and a safety mechanism configured to reduce uncontrolled displacement of the patterning device in case of failure of the connector.
摘要翻译： 本文介绍了一种配有图案形成装置安全机构的光刻设备。 在一个实施例中，该装置包括用于提供辐射束的照明系统，用于支撑图案形成装置的支撑结构，其用于使辐射束在其横截面上具有图案;衬底保持器，用于保持具有 多个目标部分，用于将图案化光束投影到基板目标部分上的投影系统，用于将图案形成装置相对于支撑结构固定的连接器; 以及安全机构，其构造成在连接器故障的情况下减少图案形成装置的不受控制的位移。
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