公开(公告)号：US06468362B1

公开(公告)日：2002-10-22

申请号：US09644177

申请日：2000-08-23

申请人： Youfel Chen ,  Brian J Brown ,  Boris Fishkin ,  Fred C Redeker

发明人： Youfel Chen ,  Brian J Brown ,  Boris Fishkin ,  Fred C Redeker

IPC分类号： B08B300

CPC分类号： B08B1/04 ,  B08B3/02 ,  B08B3/04 ,  H01L21/02052 ,  H01L21/67034

摘要： A method and an apparatus that uses a surfactant to clean a hydrophobic wafer is provided. In a first aspect, the method may clean and dry a wafer without applying pure DI water to the wafer. In a second aspect, the method may clean a wafer by applying pure DI water to the wafer only for a short duration of time such that the DI water application ceases prior to or as soon as a surfactant solution is rinsed from the wafer thereafter the wafer is dried. In a further aspect a hydrophobic wafer is maintained wetted with surfactant as it is transferred between cleaning apparatuses and is rinsed via diluted surfactant or via a brief DI water spray and is thereafter dried.

摘要翻译： 提供了使用表面活性剂来清洁疏水性晶片的方法和装置。 在第一方面，该方法可以清洁和干燥晶片，而不对晶片施加纯净的DI水。 在第二方面，该方法可以通过仅在短时间内将纯DI水施加到晶片来清洁晶片，使得在从晶片冲洗表面活性剂溶液之前或之后立即停止DI水应用，之后晶片 被干燥。 在另一方面，当疏水性晶片在清洁装置之间转移时，保持用表面活性剂润湿，并通过稀释的表面活性剂或通过短暂的DI水喷雾冲洗，然后干燥。

公开(公告)号：US06464799B1

公开(公告)日：2002-10-15

申请号：US09580881

申请日：2000-05-30

申请人： Alexander Lerner ,  Brian J. Brown ,  Boris Fishkin ,  Jonathan S. Frankel

发明人： Alexander Lerner ,  Brian J. Brown ,  Boris Fishkin ,  Jonathan S. Frankel

IPC分类号： B08B310

CPC分类号： B08B3/00 ,  B08B3/12 ,  G05D9/12 ,  G05D21/02 ,  G05D23/19 ,  G05D27/02 ,  H01L21/67253

摘要： An improved method and apparatus for adjusting chemistry concentrations and temperatures within a substrate processing tank is provided. A first aspect may include checking the fluid level within the tank, and, if the level is higher than a predetermined upper level, bleeding an amount of fluid from the tank; if the level is lower than a predetermined lower level, flowing an amount of fluid to the tank, and if the level is between the predetermined upper and lower levels, bleeding an amount of fluid from the tank and flowing an amount of fluid to the tank. A second aspect may include flowing water into the tank at a flow rate at least equivalent to the flow rate of water required to achieve a chemistry spike of a predetermined concentration and volume prior to beginning the flow of chemicals. A third aspect may include a method and apparatus for heating or cooling chemistry to a predetermined temperature as the chemistry is recirculated.

摘要翻译： 提供了用于调整基板处理槽内的化学浓度和温度的改进方法和装置。 第一方面可以包括检查罐内的液位，并且如果液位高于预定的上限，则从罐中排出一定量的流体; 如果水平低于预定的较低水平，则将一定量的流体流向罐，并且如果水平在预定的上下水平之间，则从罐中排出一定量的流体并将一定量的流体流向罐 。 第二方面可以包括以至少等于在开始化学品流动之前实现预定浓度和体积的化学峰值所需的水的流速至少等于流量的水流入罐中。 第三方面可以包括当化学物质再循环时将化学物质加热或冷却至预定温度的方法和装置。

公开(公告)号：US06345630B2

公开(公告)日：2002-02-12

申请号：US09738797

申请日：2000-12-15

申请人： Boris Fishkin ,  Jianshe Tang ,  Brian J. Brown

发明人： Boris Fishkin ,  Jianshe Tang ,  Brian J. Brown

IPC分类号： B08B310

CPC分类号： H01L21/67051 ,  H01L21/67046 ,  Y10S134/902

摘要： An inventive edge cleaning device is provided for cleaning the edge a thin disc such as a semiconductor wafer. The inventive edge cleaning device has a sonic nozzle positioned so as to direct a liquid jet at the edge surface of the thin disc. Preferably the sonic nozzle is radially spaced from the thin disc's edge so that scrubbing, spin rinsing or spin cleaning may be simultaneously performed on the major surfaces of the thin disc as the thin disc edge is cleaned by the sonic nozzle. The liquid jet may include deionized water, NH4OH, KOH, TMAH, HF, citric acid, a surfactant, or other similar cleaning solutions, and the nozzle may remain stationary as the thin disc rotates or the nozzle may scan the circumference of the thin disc to clean the entire edge of the thin disc.

摘要翻译： 提供了一种创新的边缘清洁装置，用于清洁边缘诸如半导体晶片的薄盘。 本发明的边缘清洁装置具有定位成在薄盘的边缘表面处引导液体射流的声波喷嘴。 优选地，声波喷嘴与薄盘的边缘径向间隔开，使得当由声波喷嘴清洁薄盘边缘时，可以在薄盘的主表面上同时进行洗涤，旋转漂洗或旋转清洁。 液体射流可以包括去离子水，NH 4 OH，KOH，TMAH，HF，柠檬酸，表面活性剂或其他类似的清洁溶液，并且当薄盘旋转时喷嘴可以保持静止，或者喷嘴可以扫描薄盘的圆周 以清洁薄片的整个边缘。

公开(公告)号：US06280299B1

公开(公告)日：2001-08-28

申请号：US09505577

申请日：2000-02-16

申请人： Daniel Kennedy ,  Boris Fuksshimov ,  Victor Belitsky ,  Boris Fishkin ,  Kyle Brown ,  Tom Osterheld ,  Jeff Beeler ,  Ginetto Addiego

发明人： Daniel Kennedy ,  Boris Fuksshimov ,  Victor Belitsky ,  Boris Fishkin ,  Kyle Brown ,  Tom Osterheld ,  Jeff Beeler ,  Ginetto Addiego

IPC分类号： B24B5702

CPC分类号： B24B53/017 ,  B24B37/04 ,  B24B57/02

摘要： The present invention provides a method and apparatus for delivering one or more rinse agents to a surface, such as a polishing pad surface and preferably one or more polishing fluids. The invention also provides a method of cleaning one or more surfaces, such as a polishing pad surface and a substrate surface, by delivering a spray of one or more rinse agents to the surface and, preferably, causing the rinse agent to flow across the surface from a central region to an outer region where unwanted debris and material is collected.

摘要翻译： 本发明提供了一种用于将一种或多种漂洗剂递送到诸如抛光垫表面，优选一种或多种抛光流体的表面的方法和装置。 本发明还提供了一种通过将一种或多种漂洗剂的喷雾递送到表面来清洁一个或多个表面（例如抛光垫表面和基材表面）的方法，并且优选地使冲洗剂流过表面 从中心区域到外部区域，其中收集有不需要的碎屑和材料。

公开(公告)号：US06276371B1

公开(公告)日：2001-08-21

申请号：US09589463

申请日：2000-06-07

申请人： Boris Fishkin ,  Brian J. Brown ,  Jianshe Tang

发明人： Boris Fishkin ,  Brian J. Brown ,  Jianshe Tang

IPC分类号： B08B312

CPC分类号： H01L21/67057 ,  Y10S134/902

摘要： A method and apparatus for cleaning wafer edges is provided. The inventive wafer cleaner employs a transducer equal in length to the diameter of a wafer to be cleaned, and positioned to direct sonic energy in line with the wafer's edge. Supporting and rotating mechanisms are positioned along the wafer's edge, outside of the transducer's high energy field, and preferably such that approximately 50 percent of the wafer is positioned between the wafer supports and the transducer. Therefore, minimal sonic energy is blocked from reaching the wafer's surface. The transducer dimensions relative to the wafer, and the positioning of the wafer supports relative to the transducer enable the system to achieve an approximately 50 percent edge cleaning duty cycle as the wafer is rotated.

摘要翻译： 提供了一种用于清洁晶片边缘的方法和装置。 本发明的晶片清洁器采用与要清洁的晶片的直径相等的换能器，并定位成引导与晶片边缘一致的声能。 支撑和旋转机构沿着晶片的边缘定位在换能器的高能场外部，并且优选地使得大约50％的晶片位于晶片支架和换能器之间。 因此，最小的声能被阻止到达晶片的表面。 相对于晶片的换能器尺寸以及晶片支撑件相对于换能器的定位使得系统能够在晶片旋转时实现大约50％的边缘清洁占空比。

公开(公告)号：US06220259B1

公开(公告)日：2001-04-24

申请号：US09191059

申请日：1998-11-11

申请人： Brian J. Brown ,  Boris Fishkin

发明人： Brian J. Brown ,  Boris Fishkin

IPC分类号： B08B310

CPC分类号： H01L21/67057 ,  B08B3/12 ,  Y10S134/902

摘要： A sonic cleaning tank is provided that transmits energy from a side-wall-mounted transducer, parallel to a wafer, and reflects the sonic energy out of the plane of the wafer via an angled side wall positioned on the side of the wafer opposite the transducer. The angled side wall preferably forms a vertical V. Internal partitions may be optionally employed to partition reflected energy from the wafer. By configuring the relative angles and positions of tank walls and internal partitions, the path of reflected energy is advantageously controlled. Multiple reflections ensure that any reflected energy which impacts the wafer is sufficiently attenuated so as not to interfere with wafer cleaning.

摘要翻译： 提供了一种声音清洁槽，其从侧壁安装的换能器平行于晶片传输能量，并通过位于与传感器相对的晶片侧的成角度的侧壁将声波能量反射离开晶片的平面 。 成角度的侧壁优选地形成垂直的V.可以任选地使用内部分隔件来分隔来自晶片的反射能量。 通过配置罐壁和内部隔板的相对角度和位置，有利地控制反射能量的路径。 多重反射确保影响晶片的任何反射能量被充分衰减，以免干扰晶片清洗。

公开(公告)号：US06202658B1

公开(公告)日：2001-03-20

申请号：US09191061

申请日：1998-11-11

申请人： Boris Fishkin ,  Jianshe Tang ,  Brian J. Brown

发明人： Boris Fishkin ,  Jianshe Tang ,  Brian J. Brown

IPC分类号： B08B310

CPC分类号： H01L21/67051 ,  H01L21/67046 ,  Y10S134/902

摘要： An inventive edge cleaning device is provided for cleaning the edge a thin disc such as a semiconductor wafer. The inventive edge cleaning device has a sonic nozzle positioned so as to direct a liquid jet at the edge surface of the thin disc. Preferably the sonic nozzle is radially spaced from the thin disc's edge so that scrubbing, spin rinsing or spin cleaning may be simultaneously performed on the major surfaces of the thin disc as the thin disc edge is cleaned by the sonic nozzle. The liquid jet may include de-ionized water, NH4OH, KOH, TMAH, HF, citric acid, a surfactant, or other similar cleaning solutions, and the nozzle may remain stationary as the thin disc rotates or the nozzle may scan the circumference of the thin disc to clean the entire edge of the thin disc.

摘要翻译： 提供了一种创新的边缘清洁装置，用于清洁边缘诸如半导体晶片的薄盘。 本发明的边缘清洁装置具有定位成在薄盘的边缘表面处引导液体射流的声波喷嘴。 优选地，声波喷嘴与薄盘的边缘径向间隔开，使得当由声波喷嘴清洁薄盘边缘时，可以在薄盘的主表面上同时进行洗涤，旋转漂洗或旋转清洁。 液体射流可以包括去离子水，NH 4 OH，KOH，TMAH，HF，柠檬酸，表面活性剂或其它类似的清洁溶液，并且当薄盘旋转时喷嘴可以保持静止，或者喷嘴可以扫描 薄光盘清洁光盘的整个边缘。

公开(公告)号：US06027574A

公开(公告)日：2000-02-22

申请号：US216359

申请日：1998-12-18

申请人： Boris Fishkin ,  John S. Hearne ,  Robert B. Lowrance

发明人： Boris Fishkin ,  John S. Hearne ,  Robert B. Lowrance

IPC分类号： F26B5/00 ,  F26B9/06 ,  F26B21/00 ,  H01L21/00 ,  H01L21/304 ,  H01L21/687 ,  B08B3/04 ,  B08B5/00

CPC分类号： H01L21/68728 ,  H01L21/67034 ,  Y10S134/902

摘要： A method of removing liquid on a substrate, the method comprising the steps of placing the substrate in a fluid reservoir having a surface level, maintaining a partial pressure of vapor over the fluid surface level, lowering the fluid surface level of the reservoir while adding fluid, whereby the liquid flows off the substrate, and holding the substrate at different holding points, while lowering the fluid surface level so that the lowering surface level does not pass across a holding point that is being used to hold the substrate.

摘要翻译： 一种在衬底上去除液体的方法，该方法包括以下步骤：将衬底放置在具有表面水平的流体储存器中，保持蒸气的分压超过流体表面水平，降低储存器的流体表面水平，同时加入流体 从而液体流出基板，并且将基板保持在不同的保持点，同时降低流体表面水平，使得下降表面水平不通过用于保持基板的保持点。

公开(公告)号：US6011622A

公开(公告)日：2000-01-04

申请号：US876524

申请日：1997-06-16

申请人： Boris Fishkin ,  Phil Salzman

发明人： Boris Fishkin ,  Phil Salzman

IPC分类号： G01J9/02 ,  G01N15/00 ,  G01N15/02 ,  G01N15/14 ,  G01N21/15 ,  G01N21/21 ,  G01N21/49 ,  G01N21/53 ,  H01L21/02 ,  G01N21/85

CPC分类号： G01N21/15 ,  G01N21/53

摘要： An improved particle monitoring sensor is described which uses a variety of techniques to prolong the effective life of the optical surfaces within the particle monitoring'sensor. Substantially inert purging gas is directed over the particle monitoring sensor windows, which are normally exposed to a harsh operating environment. The surfaces of these windows are heated by heating elements in direct thermal contact with the windows. In addition, a restrictive slit is placed over the detector window to reduce the exposed area and to increase the velocity of gas flowing over the window surface. While this slit reduces the detector's field of view, the signal loss is reduced by using a linearly polarized light source and aligning the elongated slit's major axis with the direction of polarization.

摘要翻译： 描述了改进的粒子监测传感器，其使用各种技术来延长粒子监测传感器内的光学表面的有效寿命。 基本上惰性的吹扫气体被引导通过通常暴露于苛刻的操作环境的颗粒监测传感器窗口。 这些窗户的表面由与窗户直接热接触的加热元件加热。 另外，在检测器窗口上放置限制性狭缝以减少暴露面积并增加在窗表面上流动的气体的速度。 虽然该狭缝减小了检测器的视野，但是通过使用线性偏振光源并且将细长狭缝的长轴与极化方向对准来减少信号损失。

公开(公告)号：US5083865A

公开(公告)日：1992-01-28

申请号：US522606

申请日：1990-05-11

申请人： Patrick Kinney ,  Boris Fishkin ,  Jun Zhao ,  Anand Gupta ,  Robert Bendler

发明人： Patrick Kinney ,  Boris Fishkin ,  Jun Zhao ,  Anand Gupta ,  Robert Bendler

IPC分类号： G01N15/00 ,  G01N15/14 ,  G01N21/15 ,  G01N21/53 ,  G01N21/88 ,  G01N21/956 ,  H01L21/02 ,  H01L21/205 ,  H01L23/29 ,  H01L23/31

CPC分类号： G01N21/53 ,  G01N2021/155 ,  G01N2021/157 ,  G01N21/15

摘要： A particle monitor for a processing chamber exhaust line is disclosed which incorporates exhaust line heating, purge gas flow over surfaces such as optical windows in the exhaust gas line, and a thermally and electrically insulating particle monitor mounting arrangement. The features collectively protect the particle monitor from electrical disturbance and from the heated inlet and maintain the optical surfaces clean and free of depositions from the exhaust gas flow for an extended period. The arrangement also suppresses etching of the optical surfaces.