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公开(公告)号:US4673477A
公开(公告)日:1987-06-16
申请号:US825958
申请日:1986-02-04
申请人: Subbiah Ramalingam , Cai B. Qi , Kyunghoon Kim
发明人: Subbiah Ramalingam , Cai B. Qi , Kyunghoon Kim
CPC分类号: H01J37/32055 , C23C14/325 , H01J37/32623 , H01J37/3266
摘要: A method and apparatus for vacuum arc deposition of material on a surface of an object uses a vacuum chamber accommodating the active surface of the cathode and an anode. A power supply connected to the anode and cathode establishes an electric arc. The track of the arc is controlled with a magnetic field established with a permanent magnet that is moved in a closed path relative to the cathode. A solenoid modifies the main magnetic field produced on the active surface of the cathode.
摘要翻译: 用于在物体表面上真空电弧沉积材料的方法和装置使用容纳阴极和阳极的有效表面的真空室。 连接到阳极和阴极的电源建立电弧。 用与永久磁铁建立的磁场来控制电弧的轨迹,永磁体相对于阴极在闭合路径中移动。 螺线管改变在阴极的有源表面上产生的主磁场。