Abstract:
A method for patterning and forming very small structures on a substrate such as a wafer. The process uses a difference in surface energy between a mask and the substrate to selectively deposit a hard mask material such as a metal onto the surface of the substrate. The mask can be formed extremely thin, such as only an atomic mono-layer thick, and can be patterned by ion beam photolithography. The pattern can, therefore, be formed with extremely high resolution. The thin mask layer can be constructed of various materials and can be constructed of perfluoropolyether diacrylate (PDA), which can be dip coated to and exposed to form a desirable positive photoresist mask layer.
Abstract:
A method according to one embodiment comprises detecting a change in a rotational velocity of a magnetic disk or a spindle coupled to the magnetic disk, the change being caused by head-disk contact. A method for detecting head-disk contact according to another embodiment comprises measuring a rotational velocity of a magnetic disk or a spindle coupled to the magnetic disk; detecting a change in the rotational velocity, the change being caused by head-disk contact; and correlating the change in rotational velocity with the head-disk contact.
Abstract:
A method and system for determining contact potential voltages between a slider body and a hard disk of a hard disk drive. In embodiments of the present invention, at least one continuous negative direct current (DC) voltage is applied between a slider body and a hard disk of a hard disk drive. Then, at least one continuous positive direct current (DC) voltage is applied between the slider body and the hard disk. A contact potential voltage between the slider body and the hard disk is then determined in response to the applying of the direct current voltages.
Abstract:
A magnetic recording disk drive achieves continuous contact recording with a head-suspension assembly that compensates for the moment generated from an adhesive force between the head carrier or slider and the disk. The slider pivot point, which is the point where the load force is applied to the flexure that supports the slider, is located closer to the front end of the slider than the net force applied by the air-bearing surface of the slider when the disk is rotating at its operational speed. This assures that the net air-bearing force generates a moment about the pivot point to partially counteract the flexure moment and the moment generated from the adhesive force between the disk and the slider's contact pad.
Abstract:
Reactive monomers of cyanate esters are vapor deposited onto thin film disks used for magnetic recording. The monomer films are then irradiated with ultraviolet (UV) light to polymerize the deposited monomer to form a solid, robust polycyanate ester overlayer on the disk that becomes smoother, more corrosion resistant and, when lubricated, more durable than disks without the overlayer. The polycyanate ester overlayer can either replace the conventional carbon overcoat or allow a substantially thinner carbon overcoat to be used.
Abstract:
A magnetic recording disk with pre-patterned surface features of elevated lands and recessed grooves or trenches, like a discrete-track media (DTM) or bit-patterned media (BPM) disk, has a planarized surface. A multilayered disk overcoat is used to protect the recording layer, and at least one of the overcoat layers functions as a stop layer for terminating a chemical-mechanical polishing (CMP) process that substantially planarizes the disk. All of the layers of the multilayered overcoat are located above the lands, but none of the overcoat layers, or a number of layers less than the number of layers over the lands, is located above the recesses.
Abstract:
A method for patterning and forming very small structures on a substrate such as a wafer. The process uses a difference in surface energy between a mask and the substrate to selectively deposit a hard mask material such as a metal onto the surface of the substrate. The mask can be formed extremely thin, such as only an atomic mono-layer thick, and can be patterned by ion beam photolithography. The pattern can, therefore, be formed with extremely high resolution. The thin mask layer can be constructed of various materials and can be constructed of perfluoropolyether diacrylate (PDA), which can be dip coated to and exposed to form a desirable positive photoresist mask layer.
Abstract:
A method for patterning and forming very small structures on a substrate such as a wafer. The process uses a difference in surface energy between a mask and the substrate to selectively deposit a hard mask material such as a metal onto the surface of the substrate. The mask can be formed extremely thin, such as only an atomic mono-layer thick, and can be patterned by ion beam photolithography. The pattern can, therefore, be formed with extremely high resolution. The thin mask layer can be constructed of various materials and can be constructed of perfluorpolyether diacrylate (PDA), which can be dip coated to and exposed to form a desirable positive photoresist mask layer.
Abstract:
A magnetic recording disk drive has a negative-pitch slider in near-contact or continuous-contact with the disk during reading and writing of data. When the disk is rotating at its operating speed, the slider has its upstream or leading portion located closer to the disk surface than its downstream or trailing portion. Both the leading and trailing portions have air-bearing surfaces that enable the slider to be partially supported above the disk surface. A contact pad that provides no substantial air-bearing support is located at the leading portion and supports or contains the magnetic elements of the read/write head. The contact pad protrudes beyond the air-bearing surface of the leading portion and is in contact with the disk. For near-contact recording the contact pad partially wears away during an initial wear-in period. For continuous-contact recording the contact pad is wear-resistant and remains in substantially continuous contact with the disk during reading and writing of data.
Abstract:
A slider-disk interface tester for measuring the friction force at the interface uses a “negative-pitch” slider in contact with a rotating disk. The tester includes a base that supports a motor for rotating the disk and an actuator for supporting the slider and moving it to a desired radial location on the disk surface. The slider is connected to the actuator by a rigid arm and a suspension like the suspension used in disk drives. When the disk is rotating, the negative-pitch slider has its upstream or leading portion in contact with the disk surface and its downstream or trailing portion not in contact with the disk surface. A contact pad is located at the leading portion of the slider and is in contact with the disk surface. The tester includes a friction-force sensor and associated measurement circuitry, such as strain gauge, piezoelectric and temperature sensors, and is located at one of several locations on the rigid arm, suspension or slider.