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公开(公告)号：US20080064592A1
公开(公告)日：2008-03-13
申请号：US11664711
申请日：2005-10-13
Applicant: Insoo Kim , Gang Kim , Young Choi , Woo Lee , Charles Smith Jr. , Young Kim
Inventor： Insoo Kim , Gang Kim , Young Choi , Woo Lee , Charles Smith Jr. , Young Kim
IPC: C02F1/42 , C01G23/047
CPC classification number: C01G23/053 , C01G23/04 , C01G23/0532 , C01G23/0536 , C01P2002/72 , C01P2002/84 , C01P2004/03 , C01P2004/64 , C09C1/3661
Abstract: A method for synthesizing TiO2, metal-doped TiO2, and metal-coated TiO2 particles of spherical form factor and needle type of which the average particle size is below 150 nm. The method of the invention is to synthesize Ti(OH)4, metal-doped Ti(OH)4 or metal-coated Ti(OH)4, and react the same by applying a pressure above the saturated vapor pressure at a temperature above 100° C. The pressure is achieved by means of the pressure of the vapor generated during the reaction inside of a closed reactor, by pressure applied from the outside, or a mixture of both. Gases to increase the pressure from outside are preferably inert gases such as Ar and N2 but are not limited to inert gases.
Abstract translation: 用于合成TiO 2，金属掺杂TiO 2和金属涂覆的球形形状和针型的TiO 2颗粒的方法，其中 平均粒径低于150nm。 本发明的方法是合成Ti（OH）4 N，金属掺杂的Ti（OH）4或金属涂覆的Ti（OH）4，并通过施加高于饱和的 在高于100℃的温度下的蒸汽压力。压力通过在封闭反应器内部的反应期间产生的蒸气的压力，通过从外部施加的压力或两者的混合物来实现。 从外部增加压力的气体优选为惰性气体，例如Ar和N 2，但不限于惰性气体。
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公开(公告)号：US5715610A
公开(公告)日：1998-02-10
申请号：US430034
申请日：1995-04-27
Applicant: William Charles Smith, Jr. , Donn Allan Lord
Inventor： William Charles Smith, Jr. , Donn Allan Lord
CPC classification number: H01L21/68728 , B08B11/02 , B08B3/02 , B08B3/04 , H01L21/67028 , H01L21/68764 , H01L21/68771 , Y10S134/902
Abstract: Method and apparatus for cleaning a workpiece such as a semiconductor element in which the element is placed on a chuck mounted on a rotation mechanism in which the rotation mechanism rotates around a first axis, and the element to be cleaned rotates around a second axis spaced from the first axis in a planetary manner. The cleaning process is programmed such that the element may be sprayed, immersed for a soak or pre-soak step, immersed while spinning, sprayed while spinning, and dried by heated gas, or any combination of these. The cleaning program is performed in a single chamber, which may be heated to a desired temperature.
Abstract translation: 用于清洁诸如半导体元件的工件的方法和设备，其中元件被放置在安装在旋转机构上的卡盘上，其中旋转机构围绕第一轴线旋转，并且待清洁的元件围绕第二轴线间隔开 第一轴以行星方式。 清洁过程被编程，使得元件可以被喷涂，浸渍浸泡或预浸渍步骤，浸渍同时旋转，在旋转时喷雾，并通过加热的气体或它们的任何组合进行干燥。 清洁程序在单个室中进行，其可以被加热到期望的温度。
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公开(公告)号：US5863348A
公开(公告)日：1999-01-26
申请号：US171953
申请日：1993-12-22
Applicant: William Charles Smith, Jr. , Donn Allan Lord
Inventor： William Charles Smith, Jr. , Donn Allan Lord
CPC classification number: H01L21/68728 , B08B11/02 , B08B3/02 , B08B3/04 , H01L21/67028 , H01L21/68764 , H01L21/68771 , Y10S134/902
Abstract: Method and apparatus for cleaning a workpiece such as a semiconductor element in which the element is placed on a chuck mounted on a rotation mechanism in which the rotation mechanism rotates around a first axis, and the element to be cleaned rotates around a second axis spaced from the first axis in a planetary manner. The cleaning process is programmed such that the element may be sprayed, immersed for a soak or pre-soak step, immersed while spinning, sprayed while spinning, and dried by heated gas, or any combination of these. The cleaning program is performed in a single chamber, which may be heated to a desired temperature.
Abstract translation: 用于清洁诸如半导体元件的工件的方法和设备，其中元件被放置在安装在旋转机构上的卡盘上，其中旋转机构围绕第一轴线旋转，并且待清洁的元件围绕第二轴线间隔开 第一轴以行星方式。 清洁过程被编程，使得元件可以被喷涂，浸渍浸泡或预浸渍步骤，浸渍同时旋转，在旋转时喷雾，并通过加热的气体或它们的任何组合进行干燥。 清洁程序在单个室中进行，其可以被加热到期望的温度。
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公开(公告)号：US20050144926A1
公开(公告)日：2005-07-07
申请号：US10509355
申请日：2003-04-07
Applicant: Takanori Kobayashi , William Smith , Charles Smith Jr. , Noritaka Morioka
Inventor： Takanori Kobayashi , William Smith , Charles Smith Jr. , Noritaka Morioka
CPC classification number: D07B1/0653 , D07B1/0613 , D07B1/062 , D07B1/0646 , D07B2201/2006 , D07B2201/2023 , D07B2201/2024 , D07B2201/2029 , D07B2201/2033 , D07B2201/2039 , D07B2201/206 , D07B2401/208 , D07B2501/2046 , D07B2801/12
Abstract: A tire cord having core filaments (10) performed into a helical configuration while maintaining the core filaments (10) in a parallel, side-by-side relationship. The core filaments (10) are not twisted or stranded together. High tensile strength sheath filaments (11) are also performed into a flattened helical configuration so that the sheath filaments (11) can be wrapped around the side-by-side core filaments such that the sheath filaments (11) do not put such tension on the core filaments (10) as to cause the core filaments (10) to bunch. The core filaments (10) are maintained in a flat side-by-side configuration so that no voids are formed and rubber can penetrate into the tire cord. The core filaments (10) may number from three to six and the sheath filaments (11) from one to seven. The cross-section of the tire cord is flattened and confined within an oval-shaped outer bound (21), the oval outer bound (21) being characterized by a major axis and a minor axis. It is desirable that the minor axis be no greater than 60% of the major axis to create the appropriate difference in the bending modulus of the tire cord in the horizontal versus the vertical direction.
Abstract translation: 一种具有芯丝（10）的轮胎帘线，其执行成螺旋状构造，同时保持芯丝（10）处于并排的并排关系。 芯丝（10）不扭曲或绞合在一起。 高抗拉强度的护套细丝（11）也被进行成扁平的螺旋结构，使得护套细丝（11）可以围绕并排芯丝卷绕，使得护套细丝（11）不会将这种张力放在 芯丝（10）使芯丝（10）束缚。 芯丝（10）保持平坦的并排构造，使得不形成空隙，并且橡胶可以渗透到轮胎帘线中。 芯丝（10）的数量可以从三到六，鞘细丝（11）从一到七。 轮胎帘线的横截面是扁平的并且被限制在椭圆形外边界（21）内，椭圆形外边界（21）的特征在于长轴和短轴。 期望短轴不大于长轴的60％，以产生在水平方向与垂直方向上的轮胎帘线的弯曲模量的适当差异。
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公开(公告)号：US5666985A
公开(公告)日：1997-09-16
申请号：US430031
申请日：1995-04-27
Applicant: William Charles Smith, Jr. , Donn Allan Lord
Inventor： William Charles Smith, Jr. , Donn Allan Lord
IPC: B08B3/02 , B08B3/04 , B08B11/02 , H01L21/00 , H01L21/687
CPC classification number: H01L21/68728 , B08B11/02 , B08B3/02 , B08B3/04 , H01L21/67028 , H01L21/68764 , H01L21/68771 , Y10S134/902
Abstract: Method and apparatus for cleaning a workpiece such as a semiconductor element in which the element is placed on a chuck mounted on a rotation mechanism in which the rotation mechanism rotates around a first axis, and the element to be cleaned rotates around a second axis spaced from the first axis in a planetary manner. The cleaning process is programmed such that the element may be sprayed, immersed for a soak or pre-soak step, immersed while spinning, sprayed while spinning, and dried by heated gas, or any combination of these. The cleaning program is performed in a single chamber, which may be heated to a desired temperature.
Abstract translation: 用于清洁诸如半导体元件的工件的方法和设备，其中元件被放置在安装在旋转机构上的卡盘上，其中旋转机构围绕第一轴线旋转，并且待清洁的元件围绕第二轴线间隔开 第一轴以行星方式。 清洁过程被编程，使得元件可以被喷涂，浸渍浸泡或预浸渍步骤，浸渍同时旋转，在旋转时喷雾，并通过加热的气体或它们的任何组合进行干燥。 清洁程序在单个室中进行，其可以被加热到期望的温度。
