公开(公告)号：US06853953B2

公开(公告)日：2005-02-08

申请号：US09924038

申请日：2001-08-07

Applicant: Jozef Brcka ,  Bill Jones ,  Gert Leusink ,  Jeffrey J. Long ,  Bill Oliver ,  Charles Tweed

Inventor： Jozef Brcka ,  Bill Jones ,  Gert Leusink ,  Jeffrey J. Long ,  Bill Oliver ,  Charles Tweed

IPC: C23C14/50 ,  C23C16/44 ,  H01L21/00 ,  H01L21/3065 ,  H01L21/683 ,  G06F11/30

CPC classification number: H01L21/6831 ,  H01L21/67109 ,  H01L21/67253

Abstract: A method for characterizing the performance of an electrostatic chuck prior to installing the chuck in the vacuum chamber of a semiconductor processing system in a production line. One or more characteristics of the electrostatic chuck are measured and compared with the known characteristics of a reference chuck. The comparison indicates the performance of the chuck and projects the performance of the chuck in an actual operating environment. The characteristics that are measured include the chuck impedance, the current-voltage characteristic of the chuck, the local plasma density proximate the support surface of the chuck, and the cooling or heating rate of the chuck.

Abstract translation: 在将卡盘安装在生产线中的半导体处理系统的真空室中之前，表征静电卡盘的性能的方法。 测量静电卡盘的一个或多个特性，并与参考卡盘的已知特性进行比较。 比较表明卡盘的性能，并在实际操作环境中投射卡盘的性能。 测量的特性包括卡盘阻抗，卡盘的电流 - 电压特性，靠近卡盘支撑表面的局部等离子体密度，以及卡盘的冷却或加热速率。