摘要:
the N-oxide forms, the pharmaceutically acceptable addition salts and the stereochemically isomeric forms thereof, wherein n represents an integer being 1 or 2; R1 and R2 each independently represents hydrogen C1-4alkyl, NR9R10, C1-4alkyloxy; or R1 and R2 taken together with the carbon atom with which they are attached form a C3-6cycloalkyl; and where n is 2, either R1 or R2 may be absent to form an unsaturated bond; R3 represents a C6-12cycloalkyl, preferably selected from cylo-octanyl and cyclohexyl or R3 represents a monovalent radical having one of the following formulae wherein said C6-12cycloalkyl or monovalent radical may optionally be substituted with one, or where possible two, three or more substituents selected from the group consisting of C1-4alkyl, C1-4alkyloxy, halo or hydroxy; Q represents Het1 or Ar2 wherein said C3-8cycloalkyl, Het1 or Ar2 are optionally substituted with one or where possible two or more substituents selected from halo, C1-4alkyl, C1-4alkyloxy, hydroxy, nitro, NR5R6, C1-4alkyloxy substituted with one or where possible two, three or more substituents each independently selected from hydroxycarbonyl, Het2 and NR7R8, and C1-4alkyl substituted with one or where possible two or three halo substituents, preferably trifluoromethyl; R5 and R6 each independently represent hydrogen, C1-4alkyl, or C1-4alkyl substituted with phenyl; R7 and R8 each independently represent hydrogen or C1-4alkyl; R9 and R10 each independently represent hydrogen, C1-4alkyl or C1-4alkyloxycarbonyl; L represents C1-4alkyl; Het1 represents a heterocycle selected from pyridinyl, thiophenyl, or 1,3-benzodioxolyl; Het2 represents piperidinyl, pyrrolidinyl or morpholinyl; Ar2 represents phenyl, naphtyl or indenyl.
摘要翻译:N-氧化物形式,其药学上可接受的加成盐及其立体化学异构形式,其中n表示1或2的整数; R 1和R 2各自独立地表示氢C 1-4烷基,NR 9 R 10,C 1-4烷氧基, 或者R 1和R 2与它们所连接的碳原子一起形成C 3-6环烷基; 并且其中n为2时,R 1或R 2可以不存在以形成不饱和键; R3表示C6-12环烷基,优选选自环辛基和环己基,或R3表示具有下列结构式之一的一价基团,其中所述C 6-12环烷基或一价基团可以任选地被一个取代,或在可能的情况下被两个,三个或更多个取代 选自C 1-4烷基,C 1-4烷氧基,卤素或羟基的取代基; Q表示Het1或Ar2,其中所述C 3-8环烷基,Het1或Ar2任选被一个或可能的两个或多个选自卤素,C 1-4烷基,C 1-4烷氧基,羟基,硝基,NR 5 R 6,被一个 或可能的两个,三个或更多个取代基,各自独立地选自羟基羰基,Het2和NR7R8,以及被一个或其中可能的两个或三个卤素取代基,优选三氟甲基取代的C 1-4烷基; R5和R6各自独立地表示氢,C1-4烷基或被苯基取代的C1-4烷基; R 7和R 8各自独立地表示氢或C 1-4烷基; R9和R10各自独立地表示氢,C1-4烷基或C1-4烷氧基羰基; L表示C 1-4烷基; Het1表示选自吡啶基,噻吩基或1,3-苯并二恶唑基的杂环; Het2表示哌啶基,吡咯烷基或吗啉基; Ar 2表示苯基,萘基或茚基。