Pedicure spa station with separate integrated drain
    4.
    发明授权
    Pedicure spa station with separate integrated drain 有权
    修脚水疗站与独立的集成排水

    公开(公告)号:US08726430B2

    公开(公告)日:2014-05-20

    申请号:US13186099

    申请日:2011-07-19

    IPC分类号: A47K3/022

    CPC分类号: A47C15/00 A47C1/10 A47C1/11

    摘要: A pedicure spa station platform that includes a raised platform having a front and a rear, and a seat area on the top surface of the platform for attaching a seat or chair. The platform has a basin tray for holding a basin. The basin tray area is positioned in front of the seat mount location. A well entrance is located between the seat area and the basin tray. The well has a sidewall with a front portion and a back portion, and a drain positioned in the sidewall. The sidewall forms a rim near the front portion (the well entrance). A vertical riser is positioned in front of the basin tray, and the vertical riser terminates in a footrest, where the footrest extends in part over and above the basin tray. The foot rest is movable with respect to the raised platform.

    摘要翻译: 一个修脚温泉站平台,其包括具有前部和后部的凸起平台以及用于附接座椅或座椅的平台顶表面上的座位区域。 平台有一个盆盆,用于容纳盆地。 盆盆区域位于座椅安装位置的前方。 一个良好的入口位于座位区域和盆地托盘之间。 井具有侧壁,其具有前部和后部,以及位于侧壁中的排水口。 侧壁在前部(井口)附近形成边缘。 垂直提升管位于盆盘前面,垂直提升管终止于搁脚板中,搁脚板部分在盆盘上方和上方延伸。 脚踏板相对于升高的平台是可移动的。