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公开(公告)号：US09150491B2
公开(公告)日：2015-10-06
申请号：US13522292
申请日：2011-01-13
申请人： Masatoshi Echigo , Dai Oguro
发明人： Masatoshi Echigo , Dai Oguro
IPC分类号： C07C69/54 , C07C43/12 , C07C43/23 , C07C59/72 , C07C69/712 , C08F20/28 , C08F220/28 , C08K5/04 , G03F7/039
CPC分类号： C07C69/54 , C07C43/12 , C07C43/23 , C07C59/72 , C07C69/712 , C07C2601/14 , C08F20/28 , C08F220/28 , C08K5/04 , G03F7/0392 , G03F7/0397 , C08F2220/282 , C08F2220/283 , C08F220/20
摘要： A bicyclohexane derivative compound useful in the field of photoresist, the field of intermediate of drugs and pesticides, and the like, and a manufacturing method of the same are provided. A bicyclohexane derivative compound represented by the following general formula (II) is provided. (In formula (II), Y independently represents an alkyl group of 1 to 10 carbons, a halogen atom, an acyloxy group, an alkoxycarbonyl group or a hydroxyl group, X1 represents a halogen atom, m represents an integer of 0 to 11, and m represents an integer of 0 to 10.).
摘要翻译： 提供了可用于光致抗蚀剂领域的双环己烷衍生物化合物，药物和农药中间体领域等及其制备方法。 提供由以下通式（II）表示的双环己烷衍生物化合物。 （式（II）中，Y独立地表示碳数1〜10的烷基，卤素原子，酰氧基，烷氧基羰基或羟基，X1表示卤素原子，m表示0〜11的整数， m表示0〜10的整数。
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2.发明授权Cyclic compound, process for preparation thereof, radiation-sensitive composition, and method for formation of resist pattern 有权环状化合物，其制备方法，辐射敏感性组合物和形成抗蚀剂图案的方法公开(公告)号：US08748078B2
公开(公告)日：2014-06-10
申请号：US13393988
申请日：2010-08-30
申请人： Hiromi Hayashi , Masatoshi Echigo , Dai Oguro
发明人： Hiromi Hayashi , Masatoshi Echigo , Dai Oguro
CPC分类号： C07C37/20 , C07C39/17 , C07C47/546 , C07C2601/14 , C07C2603/92 , G03F7/038 , G03F7/0382
摘要： A cyclic compound represented by formula (1): wherein L, R1, R′, and m are as defined in the specification. The cyclic compound of formula (1) is highly soluble to a safety solvent, highly sensitive, and capable of forming resist patterns with good profile. Therefore, the cyclic compound is useful as a component of a radiation-sensitive composition.
摘要翻译： 由式（1）表示的环状化合物：其中L，R1，R'和m如说明书中所定义。 式（1）的环状化合物对安全性溶剂高度可溶，高度敏感，能够形成具有良好外观的抗蚀剂图案。 因此，环状化合物可用作辐射敏感性组合物的组分。
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3.发明授权Composition for forming base film for lithography and method for forming multilayer resist pattern 有权用于形成用于光刻的基底膜的组合物和用于形成多层抗蚀剂图案的方法公开(公告)号：US08592134B2
公开(公告)日：2013-11-26
申请号：US12746421
申请日：2008-12-01
申请人： Dai Oguro , Go Higashihara , Seiji Kita , Mitsuharu Kitamura , Masashi Ogiwara
发明人： Dai Oguro , Go Higashihara , Seiji Kita , Mitsuharu Kitamura , Masashi Ogiwara
IPC分类号： G03F7/00 , G03F7/11 , G03F7/32 , C08F283/00
摘要： A composition for forming an underlayer film for lithography for imparting excellent optical characteristics and etching resistance to an underlayer film for lithography, an underlayer film being formed of the composition and having a high refractive index (n) and a low extinction coefficient (k), being transparent, having high etching resistance, containing a significantly small amount of a sublimable component, and a method for forming a pattern using the underlayer film are provided. The composition for forming an underlayer film contains a naphthalene formaldehyde polymer having a specific unit obtained by reacting naphthalene and/or alkylnaphthalene with formaldehyde, and an organic solvent.
摘要翻译： 一种用于形成用于光刻的下层膜的组合物，用于赋予用于光刻的下层膜优异的光学特性和耐蚀刻性，由该组合物形成且具有高折射率（n）和低消光系数（k）的下层膜， 具有高耐腐蚀性，含有极少量的可升华成分的透明性，以及使用该下层膜形成图案的方法。 用于形成下层膜的组合物含有具有通过萘和/或烷基萘与甲醛反应获得的特定单元的萘甲醛聚合物和有机溶剂。
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4.发明申请CYCLIC COMPOUND, METHOD OF PRODUCING THE SAME, RADIATION SENSITIVE COMPOSITION, AND METHOD OF FORMING RESIST PATTERN 有权环化合物，其制造方法，辐射敏感性组合物和形成耐药性图案的方法公开(公告)号：US20120251947A1
公开(公告)日：2012-10-04
申请号：US13500715
申请日：2010-09-27
申请人： Hiromi Hayashi , Masatoshi Echigo , Dai Oguro
发明人： Hiromi Hayashi , Masatoshi Echigo , Dai Oguro
CPC分类号： G03F7/0382 , C07C37/20 , C08G8/04 , C07C39/17
摘要： This invention addresses problems to provide a cyclic compound having a high solubility in safety solvents and a high sensitivity and being good in the shape of the resulting resist pattern, a method of producing the same, a radiation sensitive composition comprising the same, and a method of forming a resist pattern using the radiation sensitive composition. As means for solving the problem, there are provided a cyclic compound having a specific structure, a radiation sensitive composition comprising the compound, and a method of forming a resist pattern using the composition.
摘要翻译： 本发明涉及提供在安全溶剂中具有高溶解度的环状化合物和高灵敏度并且所得抗蚀剂图案的形状良好的环状化合物的方法，其制备方法，包含其的辐射敏感组合物和方法 使用该辐射敏感组合物形成抗蚀剂图案。 作为解决问题的手段，提供了具有特定结构的环状化合物，包含该化合物的辐射敏感性组合物，以及使用该组合物形成抗蚀剂图案的方法。
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公开(公告)号：US20120238781A1
公开(公告)日：2012-09-20
申请号：US13423962
申请日：2012-03-19
申请人： Seiji Kita , Masashi Ogiwara , Mitsuharu Kitamura , Dai Oguro , Gou Higashihara
发明人： Seiji Kita , Masashi Ogiwara , Mitsuharu Kitamura , Dai Oguro , Gou Higashihara
CPC分类号： C07C45/68 , C07C67/14 , C07C69/753 , C07C2603/68 , C08G8/28 , G03F7/094 , C07C49/83
摘要： A modified dimethylnaphthalene formaldehyde resin obtained by modifying a polyfunctional dimethylnaphthalene formaldehyde resin having a constituent unit represented by the following general formula [1] in a molecule thereof with at least one member selected from the group consisting of a phenol represented by the following general formula [2], a naphthol represented by the following general formula [3] and a naphthol represented by the following general formula [4] provided that at least any of the naphthol represented by the general formula [3] or the naphthol represented by the general formula [4] must be included.
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6.发明申请公开(公告)号：US20110275840A1
公开(公告)日：2011-11-10
申请号：US13143612
申请日：2010-01-07
申请人： Takuya Minezaki , Takeshi Hirokane , Dai Oguro
发明人： Takuya Minezaki , Takeshi Hirokane , Dai Oguro
IPC分类号： C07D319/06
CPC分类号： C07D319/06
摘要： Disclosed is a glycol compound which is useful as a raw material and an intermediate for synthetic resins, additives for synthetic resins, medicines, cosmetics, food additives, surfactants and the like, further disclosed is a method for producing the compound.The above glycol compound is represented by the following Formula (1): wherein A represents a divalent linkage group comprising a condensed aromatic ring selected from the group consisting of naphthalene, anthracene, phenanthrene and pyrene; R represents an alkyl group having 1 to 12 carbon atoms, a substituted or unsubstituted aryl group having 6 to 10 carbon atoms or a halogen atom; n represents an integer of 0 to 4; and when n represents an integer of 2 to 4, plural R may be the same or different from each other.
摘要翻译： 公开了可用作原料的二醇化合物和合成树脂的中间体，合成树脂的添加剂，药物，化妆品，食品添加剂，表面活性剂等，进一步公开了该化合物的制造方法。 上述二醇化合物由下式（1）表示：其中A表示包含选自萘，蒽，菲和芘的稠合芳环的二价连接基团; R表示碳原子数1〜12的烷基，取代或未取代的碳原子数6〜10的芳基或卤素原子; n表示0〜4的整数， 当n表示2〜4的整数时，多个R可以相同也可以不同。
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7.发明申请公开(公告)号：US20110269976A1
公开(公告)日：2011-11-03
申请号：US13143677
申请日：2010-01-07
申请人： Takuya Minezaki , Takeshi Hirokane , Dai Oguro
发明人： Takuya Minezaki , Takeshi Hirokane , Dai Oguro
IPC分类号： C07D319/06
CPC分类号： C07D319/06 , G02B1/041
摘要： Disclosed is a glycol compound which is useful as a raw material and an intermediate for synthetic resins, additives for synthetic resins, medicines, cosmetics, food additives, surfactants and the like, further disclosed is a method for producing the compound.The glycol compound is represented by the following Formula (1): wherein R represents an alkyl group having 1 to 12 carbon atoms, a substituted or unsubstituted aryl group having 6 to 10 carbon atoms or a halogen atom; n represents an integer of 1 to 4; and when n represents an integer of 2 to 4, plural R may be the same or different from each other.
摘要翻译： 公开了可用作原料的二醇化合物和合成树脂的中间体，合成树脂的添加剂，药物，化妆品，食品添加剂，表面活性剂等，进一步公开了该化合物的制造方法。 二醇化合物由下式（1）表示：其中R表示碳原子数1〜12的烷基，取代或未取代的碳原子数6〜10的芳基或卤素原子; n表示1〜4的整数， 当n表示2〜4的整数时，多个R可以相同也可以不同。
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8.发明授权公开(公告)号：US08859787B2
公开(公告)日：2014-10-14
申请号：US13143677
申请日：2010-01-07
申请人： Takuya Minezaki , Takeshi Hirokane , Dai Oguro
发明人： Takuya Minezaki , Takeshi Hirokane , Dai Oguro
IPC分类号： C07D319/06 , G02B1/04
CPC分类号： C07D319/06 , G02B1/041
摘要： Disclosed is a glycol compound which is useful as a raw material and an intermediate for synthetic resins, additives for synthetic resins, medicines, cosmetics, food additives, surfactants and the like, further disclosed is a method for producing the compound.The glycol compound is represented by the following Formula (1): wherein R represents an alkyl group having 1 to 12 carbon atoms, a substituted or unsubstituted aryl group having 6 to 10 carbon atoms or a halogen atom; n represents an integer of 1 to 4; and when n represents an integer of 2 to 4, plural R may be the same or different from each other.
摘要翻译： 公开了可用作原料的二醇化合物和合成树脂的中间体，合成树脂的添加剂，药物，化妆品，食品添加剂，表面活性剂等，进一步公开了该化合物的制造方法。 二醇化合物由下式（1）表示：其中R表示碳原子数1〜12的烷基，取代或未取代的碳原子数6〜10的芳基或卤素原子; n表示1〜4的整数， 当n表示2〜4的整数时，多个R可以相同也可以不同。
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公开(公告)号：US08519177B2
公开(公告)日：2013-08-27
申请号：US13423996
申请日：2012-03-19
申请人： Seiji Kita , Masashi Ogiwara , Mitsuharu Kitamura , Dai Oguro , Gou Higashihara
发明人： Seiji Kita , Masashi Ogiwara , Mitsuharu Kitamura , Dai Oguro , Gou Higashihara
IPC分类号： C07C69/753 , C07C67/14
CPC分类号： C07C45/68 , C07C67/14 , C07C69/753 , C07C2603/68 , C08G8/28 , G03F7/094 , C07C49/83
摘要： A modified dimethylnaphthalene formaldehyde resin obtained by modifying a polyfunctional dimethylnaphthalene formaldehyde resin having a constituent unit represented by the following general formula [1] in a molecule thereof with at least one member selected from the group consisting of a phenol represented by the following general formula [2], a naphthol represented by the following general formula [3] and a naphthol represented by the following general formula [4] provided that at least any of the naphthol represented by the general formula [3] or the naphthol represented by the general formula [4] must be included.
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10.发明申请公开(公告)号：US20130030211A1
公开(公告)日：2013-01-31
申请号：US13522292
申请日：2011-01-13
申请人： Masatoshi Echigo , Dai Oguro
发明人： Masatoshi Echigo , Dai Oguro
IPC分类号： C07C69/708 , C07C69/533 , C07C39/06 , C07C43/12
CPC分类号： C07C69/54 , C07C43/12 , C07C43/23 , C07C59/72 , C07C69/712 , C07C2601/14 , C08F20/28 , C08F220/28 , C08K5/04 , G03F7/0392 , G03F7/0397 , C08F2220/282 , C08F2220/283 , C08F220/20
摘要： A bicyclohexane derivative compound useful in the field of photoresist, the field of intermediate of drugs and pesticides, and the like, and a manufacturing method of the same are provided. A bicyclohexane derivative compound represented by the following general formula (II) is provided. (In formula (II), Y independently represents an alkyl group of 1 to 10 carbons, a halogen atom, an acyloxy group, an alkoxycarbonyl group or a hydroxyl group, X1 represents a halogen atom, m represents an integer of 0 to 11, and m represents an integer of 0 to 10.)
摘要翻译： 提供了可用于光致抗蚀剂领域的双环己烷衍生物化合物，药物和农药中间体领域等及其制备方法。 提供由以下通式（II）表示的双环己烷衍生物化合物。 （式（II）中，Y独立地表示碳数1〜10的烷基，卤素原子，酰氧基，烷氧基羰基或羟基，X1表示卤素原子，m表示0〜11的整数， m表示0〜10的整数。）
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