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1.发明授权Precursors to fluoroalkanol-containing olefin monomers, and associated methods of synthesis and use 有权含氟链烷醇的烯烃单体的前体，以及相关的合成和使用方法公开(公告)号：US07767866B2
公开(公告)日：2010-08-03
申请号：US12402680
申请日：2009-03-12
CPC分类号： C07C69/653 , C07C31/42 , C07C35/48 , C07C35/52 , C07C69/65 , C07C2601/04 , C07C2601/08 , C07C2602/42
摘要： The invention provides alkene fluoroalkanol and fluorinated polyol precursors to fluoroalkanol-substituted α,β-unsaturated esters. The fluoroalkanol-substituted α,β-unsaturated esters are olefins that can be readily polymerized to provide fluoroalkanol-substituted polymers useful in lithographic photoresist compositions. Also provided are methods for synthesizing the alkene fluoroalkanol and fluorinated polyol precursors.
摘要翻译： 本发明提供了烯烃氟烷醇和含氟烷醇取代的α，β-不饱和酯的氟化多元醇前体。 氟烷醇取代的α，β-不饱和酯是可以容易地聚合以提供可用于平版光刻胶组合物中的氟烷醇取代的聚合物的烯烃。 还提供了用于合成烯烃氟烷醇和氟化多元醇前体的方法。
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2.发明申请Precursors to Fluoroalkanol-Containing Olefin Monomers, and Associated Methods of Synthesis and Use 失效含氟链烷醇的烯烃单体的前体及其合成和使用的相关方法公开(公告)号：US20090054700A1
公开(公告)日：2009-02-26
申请号：US12253083
申请日：2008-10-16
IPC分类号： C07C33/42
CPC分类号： C07C33/44 , C07C33/423 , C07C69/653 , C07C69/753 , C07C2601/10 , C07C2601/16 , C07C2602/42
摘要： The invention provides alkene fluoroalkanol and fluorinated polyol precursors to fluoroalkanol-substituted α,β-unsaturated esters. The fluoroalkanol-substituted α,β-unsaturated esters are olefins that can be readily polymerized to provide fluoroalkanol-substituted polymers useful in lithographic photoresist compositions. Also provided are methods for synthesizing the alkene fluoroalkanol and fluorinated polyol precursors.
摘要翻译： 本发明提供氟链烷醇取代的α，β-不饱和酯的烯烃氟烷醇和氟化多元醇前体。 氟烷醇取代的α，β-不饱和酯是可以容易地聚合以提供用于平版印刷光刻胶组合物的氟代烷醇取代的聚合物的烯烃。 还提供了用于合成烯烃氟烷醇和氟化多元醇前体的方法。
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公开(公告)号：US06730452B2
公开(公告)日：2004-05-04
申请号：US09771261
申请日：2001-01-26
IPC分类号： G03F7039
CPC分类号： G03F7/0392 , G03F7/0046 , G03F7/0382 , G03F7/0397 , Y10S430/108
摘要： A lithographic photoresist composition is provided that can be used as a chemical amplification photoresist. In a preferred embodiment, the composition is substantially transparent to deep ultraviolet radiation, i.e., radiation of a wavelength less than 250 nm, including 157 nm, 193 nm and 248 nm radiation, and has improved sensitivity and resolution. The composition comprises a fluorinated vinylic polymer, particularly a fluorinated methacrylate, a fluorinated methacrylonitrile, or a fluorinated methacrylic acid, and a photoacid generator. The polymer may be a homopolymer or a copolymer. A process for using the composition to generate resist images on a substrate is also provided, i.e., in the manufacture of integrated circuits or the like.
摘要翻译： 提供可用作化学扩增光致抗蚀剂的平版光刻胶组合物。 在优选的实施方案中，组合物对深紫外辐射即波长小于250nm（包括157nm，193nm和248nm辐射）的辐射基本上是透明的，并具有改进的灵敏度和分辨率。 组合物包含氟化乙烯基聚合物，特别是氟化甲基丙烯酸酯，氟化甲基丙烯腈或氟化甲基丙烯酸，以及光酸产生剂。 聚合物可以是均聚物或共聚物。 还提供了使用该组合物在衬底上产生抗蚀剂图像的方法，即在集成电路等的制造中。
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公开(公告)号：US5895263A
公开(公告)日：1999-04-20
申请号：US770620
申请日：1996-12-19
申请人： Kenneth Raymond Carter , Daniel Joseph Dawson , Richard Anthony DiPietro , Craig Jon Hawker , James Lupton Hedrick , Robert Dennis Miller , Do Yeung Yoon
发明人： Kenneth Raymond Carter , Daniel Joseph Dawson , Richard Anthony DiPietro , Craig Jon Hawker , James Lupton Hedrick , Robert Dennis Miller , Do Yeung Yoon
IPC分类号： H01L21/316 , H01L21/768 , H01L21/28
CPC分类号： H01L21/31695 , H01L21/02126 , H01L21/02203 , H01L21/02216 , H01L21/02282 , H01L21/7682
摘要： The invention relates to a process for forming an integrated circuit device comprising (i) a substrate; (ii) metallic circuit lines positioned on the substrate and (iii) a dielectric material positioned on the circuit lines. The dielectric material comprises porous organic polysilica.
摘要翻译： 本发明涉及一种形成集成电路器件的方法，该器件包括：（i）衬底; （ii）位于基板上的金属电路线，和（iii）位于电路线上的电介质材料。 电介质材料包括多孔有机聚硅氧烷。
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5.发明申请公开(公告)号：US20090177017A1
公开(公告)日：2009-07-09
申请号：US12402680
申请日：2009-03-12
CPC分类号： C07C69/653 , C07C31/42 , C07C35/48 , C07C35/52 , C07C69/65 , C07C2601/04 , C07C2601/08 , C07C2602/42
摘要： The invention provides alkene fluoroalkanol and fluorinated polyol precursors to fluoroalkanol-substituted α,β-unsaturated esters. The fluoroalkanol-substituted α,β-unsaturated esters are olefins that can be readily polymerized to provide fluoroalkanol-substituted polymers useful in lithographic photoresist compositions. Also provided are methods for synthesizing the alkene fluoroalkanol and fluorinated polyol precursors.
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6.发明申请公开(公告)号：US20090036717A1
公开(公告)日：2009-02-05
申请号：US12253039
申请日：2008-10-16
IPC分类号： C07C33/42
CPC分类号： C07C33/44 , C07C33/423 , C07C69/653 , C07C69/753 , C07C2601/10 , C07C2601/16 , C07C2602/42
摘要： The invention provides alkene fluoroalkanol and fluorinated polyol precursors to fluoroalkanol-substituted α,β-unsaturated esters. The fluoroalkanol-substituted α,β-unsaturated esters are olefins that can be readily polymerized to provide fluoroalkanol-substituted polymers useful in lithographic photoresist compositions. Also provided are methods for synthesizing the alkene fluoroalkanol and fluorinated polyol precursors.
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7.发明授权Precursors to fluoroalkanol-containing olefin monomers, and associated methods of synthesis and use 失效含氟链烷醇的烯烃单体的前体，以及相关的合成和使用方法公开(公告)号：US07442828B2
公开(公告)日：2008-10-28
申请号：US11844806
申请日：2007-08-24
IPC分类号： C07C69/013 , C07C35/14
CPC分类号： C07C69/653 , C07C31/42 , C07C35/48 , C07C35/52 , C07C69/65 , C07C2601/04 , C07C2601/08 , C07C2602/42
摘要： The invention provides alkene fluoroalkanol and fluorinated polyol precursors to fluoroalkanol-substituted α,β-unsaturated esters. The fluoroalkanol-substituted α,β-unsaturated esters are olefins that can be readily polymerized to provide fluoroalkanol-substituted polymers useful in lithographic photoresist compositions. Also provided are methods for synthesizing the alkene fluoroalkanol and fluorinated polyol precursors.
摘要翻译： 本发明提供氟链烷醇取代的α，β-不饱和酯的烯烃氟烷醇和氟化多元醇前体。 氟烷醇取代的α，β-不饱和酯是可以容易地聚合以提供用于平版印刷光刻胶组合物的氟代烷醇取代的聚合物的烯烃。 还提供了用于合成烯烃氟烷醇和氟化多元醇前体的方法。
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8.发明授权公开(公告)号：US08716535B2
公开(公告)日：2014-05-06
申请号：US12253083
申请日：2008-10-16
CPC分类号： C07C33/44 , C07C33/423 , C07C69/653 , C07C69/753 , C07C2601/10 , C07C2601/16 , C07C2602/42
摘要： The invention provides alkene fluoroalkanol and fluorinated polyol precursors to fluoroalkanol-substituted α,β-unsaturated esters. The fluoroalkanol-substituted α,β-unsaturated esters are olefins that can be readily polymerized to provide fluoroalkanol-substituted polymers useful in lithographic photoresist compositions. Also provided are methods for synthesizing the alkene fluoroalkanol and fluorinated polyol precursors.
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9.发明授权Precursors to fluoroalkanol-containing olefin monomers, and associated methods of synthesis and use 失效含氟链烷醇的烯烃单体的前体，以及相关的合成和使用方法公开(公告)号：US07495135B2
公开(公告)日：2009-02-24
申请号：US10729511
申请日：2003-12-04
CPC分类号： C07C33/44 , C07C33/423 , C07C69/653 , C07C69/753 , C07C2601/10 , C07C2601/16 , C07C2602/42
摘要： The invention provides alkene fluoroalkanol and fluorinated polyol precursors to fluoroalkanol-substituted α,β-unsaturated esters. The fluoroalkanol-substituted α,β-unsaturated esters are olefins that can be readily polymerized to provide fluoroalkanol-substituted polymers useful in lithographic photoresist compositions. Also provided are methods for synthesizing the alkene fluoroalkanol and fluorinated polyol precursors.
摘要翻译： 本发明提供氟链烷醇取代的α，β-不饱和酯的烯烃氟烷醇和氟化多元醇前体。 氟烷醇取代的α，β-不饱和酯是可以容易地聚合以提供用于平版印刷光刻胶组合物的氟代烷醇取代的聚合物的烯烃。 还提供了用于合成烯烃氟烷醇和氟化多元醇前体的方法。
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公开(公告)号：US20080166669A1
公开(公告)日：2008-07-10
申请号：US12050589
申请日：2008-03-18
IPC分类号： G03F7/30
CPC分类号： G03F7/0392 , G03F7/001 , G03F7/031 , G03F7/2004 , Y10S430/115 , Y10S430/127
摘要： A method of creating patterned objects using a class of lithographic photoresist combinations is disclosed which is suitable for use with visible light and does not require a post-exposure bake step. The disclosed photoresists are preferably chemical amplification photoresists and contain a photosensitizer having the structure of formula (I): where Ar1 and Ar2 are independently selected from monocyclic aryl and monocyclic heteroaryl, R1 and R2 may be the same or different, and have the structure —X—R3 where X is O or S and R3 is C1-C6 hydrocarbyl or heteroatom-containing C1-C6 hydrocarbyl, and R4 and R5 are independently selected from the group consisting of hydrogen and —X—R3, or, if ortho to each other, may be taken together to form a five- or six-membered aromatic ring, with the proviso that any heteroatom contained within Ar1, Ar2, or R3 is O or S. The use of the disclosed photoresists, particularly for the manufacture of holographic diffraction gratings, is also disclosed.
摘要翻译： 公开了一种使用一类光刻胶组合物形成图形物体的方法，其适用于可见光并且不需要曝光后烘烤步骤。 所公开的光致抗蚀剂优选是化学放大光致抗蚀剂，并含有具有式（I）结构的光敏剂：其中Ar 1和Ar 2独立地选自单环芳基和单环杂芳基 R 1和R 2可以相同或不同，并且具有结构-XR 3，其中X是O或S，R“ SUP> 3是C 1 -C 6烃基或含杂原子的C 1 -C 6 N >烃基，R 4和R 5独立地选自氢和-XR 3 O 3，或者如果各自的邻位 另一个可以一起形成五元或六元芳环，条件是含有Ar 1，Ar 2或R 0的任何杂原子 > 3 是O或S.还公开了所公开的光致抗蚀剂的使用，特别是用于制造全息衍射光栅。
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