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    Method and apparatus for endpoint detection using partial least squares
    1.
    发明授权
    Method and apparatus for endpoint detection using partial least squares 有权
    使用偏最小二乘法进行端点检测的方法和装置

    公开(公告)号：US07297287B2

    公开(公告)日：2007-11-20

    申请号：US10472436

    申请日：2002-03-25

    申请人： David Fatke ,  Hongyu Yue

    发明人： David Fatke ,  Hongyu Yue

    IPC分类号： H01L21/306

    CPC分类号： H01L22/20 ,  H01J37/32935 ,  H01J37/32963 ,  H01L2924/0002 ,  H01L2924/00

    摘要： An apparatus and method for detection of a feature etch completion within an etching reactor. The method includes determining a correlation matrix by recording first measured data regarding a first etch process over successive time intervals to form a first recorded data matrix, assembling a first endpoint signal matrix using target endpoint data for a specific etch process, performing a partial least squares analysis on the recorded data matrix and the first endpoint signal matrix to refine the recorded data matrix, and computing a correlation matrix based upon the refined recorded data matrix and the first endpoint signal matrix. The method further includes performing a second etch process to form a second recorded data matrix. The correlation matrix and the second recorded data matrix are analyzed to determine whether an endpoint of the second etch process has been achieved.

    摘要翻译： 用于检测蚀刻反应器内的特征蚀刻完成的装置和方法。 该方法包括通过在连续时间间隔上记录关于第一蚀刻处理的第一测量数据来形成相关矩阵以形成第一记录数据矩阵，使用用于特定蚀刻工艺的目标端点数据组装第一端点信号矩阵，执行偏最小二乘法 对所记录的数据矩阵和第一端点信号矩阵进行分析以细化记录的数据矩阵，以及基于精细记录的数据矩阵和第一端点信号矩阵来计算相关矩阵。 该方法还包括执行第二蚀刻工艺以形成第二记录数据矩阵。 分析相关矩阵和第二记录数据矩阵以确定是否已经实现了第二蚀刻工艺的端点。

    Method and apparatus for endpoint detection using partial least squares
    3.
    发明申请
    Method and apparatus for endpoint detection using partial least squares 有权
    使用偏最小二乘法进行端点检测的方法和装置

    公开(公告)号：US20050016947A1

    公开(公告)日：2005-01-27

    申请号：US10472436

    申请日：2002-03-25

    申请人： David Fatke ,  Hongyu Yue

    发明人： David Fatke ,  Hongyu Yue

    IPC分类号： H01L21/3065 ,  H01J37/32 ,  H01L21/66 ,  C23F1/00

    CPC分类号： H01L22/20 ,  H01J37/32935 ,  H01J37/32963 ,  H01L2924/0002 ,  H01L2924/00

    摘要： An apparatus and method for detection of a feature etch completion within an etching reactor. The method includes determining a correlation matrix by recording first measured data regarding a first etch process over successive time intervals to form a first recorded data matrix, assembling a first endpoint signal matrix using target endpoint data for a specific etch process, performing a partial least squares analysis on the recorded data matrix and the first endpoint signal matrix to refine the recorded data matrix, and computing a correlation matrix based upon the refined recorded data matrix and the first endpoint signal matrix. The method further includes performing a second etch process to form a second recorded data matrix. The correlation matrix and the second recorded data matrix are analyzed to determine whether an endpoint of the second etch process has been achieved.

    摘要翻译： 用于检测蚀刻反应器内的特征蚀刻完成的装置和方法。 该方法包括通过在连续时间间隔上记录关于第一蚀刻处理的第一测量数据来形成相关矩阵以形成第一记录数据矩阵，使用用于特定蚀刻工艺的目标端点数据组装第一端点信号矩阵，执行偏最小二乘法 对所记录的数据矩阵和第一端点信号矩阵进行分析以细化记录的数据矩阵，以及基于精细记录的数据矩阵和第一端点信号矩阵来计算相关矩阵。 该方法还包括执行第二蚀刻工艺以形成第二记录数据矩阵。 分析相关矩阵和第二记录数据矩阵以确定是否已经实现了第二蚀刻工艺的端点。