Quantitative Trait Loci Associated With Soybean Cyst Nematode Resistance and Uses Thereof
    3.
    发明申请
    Quantitative Trait Loci Associated With Soybean Cyst Nematode Resistance and Uses Thereof 审中-公开
    与大豆孢囊线虫抗性相关的定量性状位点及其用途

    公开(公告)号:US20110083224A1

    公开(公告)日:2011-04-07

    申请号:US12961684

    申请日:2010-12-07

    Applicant: David M. Webb

    Inventor: David M. Webb

    Abstract: A method for selecting a soybean cyst nematode resistant plant by marker assisted selection of quantitative trait loci associated with soybean cyst nematode resistance. The method employs nucleic acid markers genetically linked to quantitative trait loci to select the soybean cyst nematode resistant plant. Methods for identifying quantitative trait loci associated with soybean cyst nematode resistance in a plant.

    Abstract translation: 通过与大豆孢囊线虫抗性相关的数量性状位点的标记辅助选择来选择大豆孢子线虫抗性植物的方法。 该方法采用与数量性状基因座遗传连锁的核酸标记,选择大豆胞囊线虫抗性植物。 用于鉴定植物中与大豆孢囊线虫抗性相关的数量性状位点的方法。

    Quantitative trait loci associated with soybean cyst nematode resistance and uses thereof
    4.
    发明授权
    Quantitative trait loci associated with soybean cyst nematode resistance and uses thereof 有权
    与大豆孢囊线虫抗性相关的定量性状位点及其用途

    公开(公告)号:US07872171B2

    公开(公告)日:2011-01-18

    申请号:US10352418

    申请日:2003-01-28

    Applicant: David M. Webb

    Inventor: David M. Webb

    Abstract: A method for selecting a soybean cyst nematode resistant plant by marker assisted selection of quantitative trait loci associated with soybean cyst nematode resistance. The method employs nucleic acid markers genetically linked to quantitative trait loci to select the soybean cyst nematode resistant plant. Methods for identifying quantitative trait loci associated with soybean cyst nematode resistance in a plant.

    Abstract translation: 通过与大豆孢囊线虫抗性相关的数量性状位点的标记辅助选择来选择大豆孢子线虫抗性植物的方法。 该方法采用与数量性状基因座遗传连锁的核酸标记,选择大豆胞囊线虫抗性植物。 用于鉴定植物中与大豆孢囊线虫抗性相关的数量性状位点的方法。

    Apparatus and method for processing photosensitive sheets
    6.
    发明授权
    Apparatus and method for processing photosensitive sheets 失效
    用于处理感光片的设备和方法

    公开(公告)号:US4937607A

    公开(公告)日:1990-06-26

    申请号:US246860

    申请日:1988-09-20

    CPC classification number: G03D3/132

    Abstract: A processor for photosensitive sheet material which allows uniform initial exposure of the sheet material to developer solution. The processor includes a channel defined by an initial roller pair submerged in developer tank, third and fourth rollers above the rollers of the pair. The channel runs horizontally in the processor and has a stream of developer. The sheet to be developed travels downward through the stream and through the nip of the initial roller pair.

    Abstract translation: 用于感光片材的处理器,其允许片材材料均匀地初始暴露于显影剂溶液。 处理器包括由浸在显影剂罐中的初始辊对限定的通道,在该对辊的上方的第三和第四辊。 该通道在处理器中水平运行,并具有开发者流。 待开发的片材通过流动并通过初始辊对的辊隙向下行进。

    Degradable LRU circuit
    7.
    发明授权
    Degradable LRU circuit 失效
    可降级LRU电路

    公开(公告)号:US4361878A

    公开(公告)日:1982-11-30

    申请号:US200876

    申请日:1980-10-27

    CPC classification number: G06F12/126 G01R22/00 G06F2212/1032

    Abstract: A modified least recently used resolving network provides the capability of ignoring any one or more of the signals indicating use of the device in resolving the least recently used status of the devices.

    Abstract translation: 经修改的最近最少使用的解析网络提供忽略指示使用设备在解决设备的最近最少使用状态中的任何一个或多个信号的能力。

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