摘要:
The present disclosure provides a method and system for characterizing a pattern loading effect. A method may include performing a reflectivity measurement on a semiconductor wafer and determining an anneal process technique based on the reflectivity measurement. The determining the anneal process technique may include determining a spatial distance for a reflectivity change using a reflectivity map generated using the reflectivity measurement. This spatial distance is compared with the thermal diffusion length associated with each of the plurality of anneal process techniques. In an embodiment, a thermal profile map and/or a device performance map may be provided.
摘要:
A touch sensing three-dimensional (3D) display device includes a display panel and a touch sensing parallax integrated panel. The touch sensing parallax integrated panel located on the display panel includes a first substrate, a second substrate, a touch sensing structure, a display medium layer, a first parallax electrode layer, and a second parallax electrode layer. The second substrate is disposed opposite to the first substrate. The first substrate is located between the display panel and the second substrate. The touch sensing structure is located on the second substrate. The display medium layer is disposed between the first substrate and the second substrate. The first parallax electrode layer disposed on the first substrate is located between the display medium layer and the first substrate. The second parallax electrode layer disposed on the second substrate is located between the display medium layer and the second substrate.
摘要:
An image positioning method, a POI tagging method and an apparatus therefor are described. The method is particularly to define a range corresponding to a positioning value translated by a global positioning system. Further, a point-of-interest (POI) is tagged according to the defined range. In an exemplary example, if there is no positioning signal detected as photographing an image, a previously received positioning signal is used to be the positioning value for the image. According to the preferred embodiment of the tagging method, an image is taken firstly, and then it's to determine a positioning value for the image. In which the positioning value may be determined on the instant of photographing. Alternatively, the positioning value may be retrieved from the image's attribute through playback software. Thereby, a range associated with the positioning value is defined. A corresponding point-of-interest is tagged to the image's attribute afterward.
摘要:
A skewed image data detecting and correcting device includes a skew angle detecting module, and an image rotating correction module. A skewed image data detecting and correcting method includes the following steps. Firstly, a binary digitizing operation is performed to obtain a binary image data. The binary image data is rotated by multiple different rotating angles, thereby obtaining multiple rotated binary image data. The pixel numbers of all horizontal rows of the rotated binary image data are totalized, thereby obtaining multiple horizontal pixel number distribution curves. A high-pass filtering procedure is performed to filter off low-frequency noise, thereby obtaining multiple high-frequency signal curves. The square sums of respective high-frequency signal curves are calculated, thereby obtaining multiple index values. Afterward, a rotating correction operation is performed on the image data according to the rotating angle corresponding to a maximum of the index values, thereby obtaining a corrected image data.
摘要:
A semiconductor device and a method of manufacturing are provided. In some embodiments, a backside annealing process such that a first heat source is placed along a backside of the substrate. In other embodiments, the first heat source is used in combination with an anti-reflection dielectric (ARD) layer is deposited over the substrate. In yet other embodiments, a second heat source is placed along a front side of the substrate in addition to the first heat source placed on the backside of the substrate. In yet other embodiments, a heat shield may be placed between the substrate and the second heat source on the front side of the substrate. In yet further embodiments, a single heat source may be used on the front side of the substrate in combination with the ARD layer. A reflectivity scan may be performed to determine which anneal stage (RTA or MSA or both) to place thermal leveling solution.
摘要:
A system and method for generating an image appended with extra landscape information are disclosed. An image recorder is provided, and having a global-positioning system, an electronic compass, a gyro sensor, and an accelerometer for determining the space information as capturing an image. Under the determination, the space information can include a view angle, a direction, an elevation angle, and a coordinate. The information is used to compare with the content of a database, in order to obtain the landscape information of the image. After that, an image appended with the landscape information is generated. Thereby, the image appended with the landscape information may be used for generating a space map and be a liveview of the recorder.
摘要:
An adaptive frame rate modulation system and method thereof are described. A frame processing unit is employed to receive a first frame and a second frame for dividing the second frame into a plurality of second block frames. A frame change detection unit compares the first block frames with the second block frames correspondingly for detecting the change status between the first and second frames. A timing generator classifies the second block frames of the second frame to construct a plurality of frame rates based on the compared results of the first and second block frames. The timing generator further modulates the frame rates of the second frames.
摘要:
A forming section, commonly called wet part, of a fourdrinier machine includes a rotatable breast roll, a rotatable couch roll, a forming mesh disposed between said breast roll and said couch roll, wherein said forming mesh is tangent to a lower portion of said couch roll, a fabric mesh which is tangent to said couch roll, wherein the tangent point of said fabric mesh and said couch roll coincides with or is located front of the tangent point of said forming net and said couch roll, wherein said fabric mesh and said forming net are attached to part of the outer surface of said couch roll in an inner and outer manner, a dewatering unit disposed on the rear surface of said forming mesh, a headbox disposed above said breast roll for flowing pulp slurry to said forming mesh and a press roll disposed against on said couch roll to form a pressing zone between said press roll and said couch roll so as to press and dewater said wet fiber web formed on said forming mesh on the surface of said fabric mesh.
摘要:
A recycling method includes providing an EVA insole residual product including an EVA foam material, a film, and a cloth material, placing the EVA insole residual product into an oven, heating the EVA insole residual product to a temperature of 130±25° C., and detaching the cloth material from the EVA foam material. The film includes an EVA, and a tackifier. The EVA of the film has a mass proportion of 85-95%. The tackifier has a mass proportion of 5-15%. An antioxidant is appended into the film and has a mass proportion of 0.1% of the total mass of the EVA and the tackifier. After the cloth material is detached from the EVA foam material, the EVA foam material and the film are crushed and kneaded and are recycled.
摘要:
A semiconductor device having dislocations and a method of fabricating the semiconductor device is disclosed. The exemplary semiconductor device and method for fabricating the semiconductor device enhance carrier mobility. The method includes providing a substrate having an isolation feature therein and two gate stacks overlying the substrate, wherein one of the gate stacks is atop the isolation feature. The method further includes performing a pre-amorphous implantation process on the substrate. The method further includes forming a stress film over the substrate. The method also includes performing an annealing process on the substrate and the stress film.