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    METHOD OF POLISHING A METAL SURFACE OF A BARRIER DOOR OF A GATE VALVE USED IN A SEMICONDUCTOR CLUSTER TOOL ARCHITECTURE
    2.
    发明申请
    METHOD OF POLISHING A METAL SURFACE OF A BARRIER DOOR OF A GATE VALVE USED IN A SEMICONDUCTOR CLUSTER TOOL ARCHITECTURE 有权
    在半导体集群工具架构中使用的门阀的栅栏门的金属表面抛光方法

    公开(公告)号：US20130199705A1

    公开(公告)日：2013-08-08

    申请号：US13482278

    申请日：2012-05-29

    申请人： Dean J. Larson ,  James A. Woodward

    发明人： Dean J. Larson ,  James A. Woodward

    IPC分类号： B32B38/10

    CPC分类号： F16K51/02 ,  B24B15/00 ,  B24B29/00 ,  F16K3/0263

    摘要： The method of preserving the anodized finish of a barrier door of a process module includes bonding a seal to a metal surface, anodizing the metal surface, and then using a CNC machine to polish the metal surface without damaging the seal. The metal surface is polished by traversing a polishing path along the metal surface with a polishing head maintaining frictional contact with the metal surface. The integrity of the seal is preserved by bounding the polishing head to skirt the edge of the seal by following the polishing path.

    摘要翻译： 保持处理模块的隔离门的阳极氧化处理的方法包括将密封件接合到金属表面，阳极氧化金属表面，然后使用CNC机器抛光金属表面而不损坏密封件。 通过沿着金属表面横穿抛光路径抛光金属表面，抛光头与金属表面保持摩擦接触。 通过遵循抛光路径来限制抛光头以密封密封件的边缘来保持密封的完整性。

    GAS SWITCHING SECTION INCLUDING VALVES HAVING DIFFERENT FLOW COEFFICIENT'S FOR GAS DISTRIBUTION SYSTEM
    4.
    发明申请
    GAS SWITCHING SECTION INCLUDING VALVES HAVING DIFFERENT FLOW COEFFICIENT'S FOR GAS DISTRIBUTION SYSTEM 有权
    气体切换部分包括具有不同流量系数的气体分配系统的阀门

    公开(公告)号：US20120070997A1

    公开(公告)日：2012-03-22

    申请号：US13310951

    申请日：2011-12-05

    申请人： Dean J. Larson

    发明人： Dean J. Larson

    IPC分类号： H01L21/3065 ,  C23C16/455

    CPC分类号： H01L21/3065 ,  C23C16/45561 ,  F16K19/00 ,  H01J37/3244 ,  H01J37/32449 ,  H01L21/31138 ,  H01L21/31144 ,  H01L21/312 ,  Y10T29/49 ,  Y10T137/0491 ,  Y10T137/877

    摘要： A gas switching system for a gas distribution system for supplying different gas compositions to a chamber, such as a plasma processing chamber of a plasma processing apparatus, is provided. The chamber can include multiple zones, and the gas switching section can supply different gases to the multiple zones. The switching section can switch the flows of one or more gases, such that one gas can be supplied to the chamber while another gas can be supplied to a by-pass line, and then switch the gas flows.

    摘要翻译： 提供了一种用于将等离子体处理装置等离子体处理室内的不同气体成分供给到气室的气体分配系统。 该室可以包括多个区域，并且气体切换部分可以向多个区域供应不同的气体。 开关部分可以切换一种或多种气体的流动，使得一个气体可以供应到腔室，而另一种气体可以被供给到旁路管线，然后切换气体流动。

    Quartz guard ring centering features
    5.
    发明授权
    Quartz guard ring centering features 有权

    公开(公告)号：US08084705B2

    公开(公告)日：2011-12-27

    申请号：US12967717

    申请日：2010-12-14

    申请人： Dean J. Larson ,  Daniel Brown ,  Keith Comendant ,  Victor Wang

    发明人： Dean J. Larson ,  Daniel Brown ,  Keith Comendant ,  Victor Wang

    IPC分类号： B23K10/00

    CPC分类号： H01J37/3255 ,  H01J37/32009 ,  H01J37/32568 ,  Y10T29/49002

    摘要： An electrode assembly and method of centering an outer ring around an electrode assembly in a plasma reaction chamber used in semiconductor substrate processing. The method includes positioning the outer ring around an outer surface of a backing member of the electrode assembly, and inserting at least one centering element between the outer ring and the backing member. The centering element can be a plurality of spring-loaded centering elements received in a cavity on the outer surface of the backing member, the centering elements having a first end adapted to contact the outer ring and a second end adapted to receive a spring. The outer ring surrounds an outer surface of the backing member, such that the plurality of spring-loaded centering elements are positioned between the outer surface of the backing member and an inner surface of the outer ring.

    Quartz guard ring
    6.
    发明申请
    Quartz guard ring 有权
    石英护环

    公开(公告)号：US20080099448A1

    公开(公告)日：2008-05-01

    申请号：US11701430

    申请日：2007-02-02

    申请人： Dean J. Larson ,  Daniel Brown ,  Saurabh J. Ullal

    发明人： Dean J. Larson ,  Daniel Brown ,  Saurabh J. Ullal

    IPC分类号： B23K9/00

    CPC分类号： H01J37/3255 ,  H01J37/32009 ,  H01J37/32568

    摘要： An electrode assembly for a plasma reaction chamber used in semiconductor substrate processing. The assembly includes an upper electrode, a backing member attachable to an upper surface of the upper electrode, and an outer ring. The outer ring surrounds an outer surface of the backing member and is located above the upper surface of the upper electrode.

    摘要翻译： 用于等离子体反应室的电极组件，用于半导体衬底处理。 组件包括上电极，可附接到上电极的上表面的背衬构件和外环。 外环围绕背衬构件的外表面并且位于上电极的上表面上方。

    QUARTZ GUARD RING CENTERING FEATURES
    8.
    发明申请
    QUARTZ GUARD RING CENTERING FEATURES 有权
    QUARTZ GUARD戒指中心特点

    公开(公告)号：US20110083318A1

    公开(公告)日：2011-04-14

    申请号：US12967717

    申请日：2010-12-14

    申请人： Dean J. Larson ,  Daniel Brown ,  Keith Comendant ,  Victor Wang

    发明人： Dean J. Larson ,  Daniel Brown ,  Keith Comendant ,  Victor Wang

    IPC分类号： B23P11/00

    CPC分类号： H01J37/3255 ,  H01J37/32009 ,  H01J37/32568 ,  Y10T29/49002

    摘要： An electrode assembly and method of centering an outer ring around an electrode assembly in a plasma reaction chamber used in semiconductor substrate processing. The method includes positioning the outer ring around an outer surface of a backing member of the electrode assembly, and inserting at least one centering element between the outer ring and the backing member. The centering element can be a plurality of spring-loaded centering elements received in a cavity on the outer surface of the backing member, the centering elements having a first end adapted to contact the outer ring and a second end adapted to receive a spring. The outer ring surrounds an outer surface of the backing member, such that the plurality of spring-loaded centering elements are positioned between the outer surface of the backing member and an inner surface of the outer ring.

    摘要翻译： 一种电极组件和使外环围绕用于半导体衬底处理的等离子体反应室中的电极组件对中的方法。 该方法包括将外环围绕电极组件的背衬构件的外表面定位，并且在外环和背衬构件之间插入至少一个定心元件。 定心元件可以是容纳在背衬构件的外表面上的空腔中的多个弹簧加载的定心元件，定心元件具有适于接触外圈的第一端和适于容纳弹簧的第二端。 外环围绕背衬构件的外表面，使得多个弹簧加载的定心元件位于背衬构件的外表面和外环的内表面之间。

    Quartz guard ring centering features
    9.
    发明授权
    Quartz guard ring centering features 有权
    石英护环中心功能

    公开(公告)号：US07875824B2

    公开(公告)日：2011-01-25

    申请号：US11701507

    申请日：2007-02-02

    申请人： Dean J. Larson ,  Daniel Brown ,  Keith Comendant ,  Victor Wang

    发明人： Dean J. Larson ,  Daniel Brown ,  Keith Comendant ,  Victor Wang

    IPC分类号： B23K10/00

    CPC分类号： H01J37/3255 ,  H01J37/32009 ,  H01J37/32568 ,  Y10T29/49002

    摘要： An electrode assembly and method of centering an outer ring around an electrode assembly in a plasma reaction chamber used in semiconductor substrate processing. The method includes positioning the outer ring around an outer surface of a backing member of the electrode assembly, and inserting at least one centering element between the outer ring and the backing member. The centering element can be a plurality of spring-loaded centering elements received in a cavity on the outer surface of the backing member, the centering elements having a first end adapted to contact the outer ring and a second end adapted to receive a spring. The outer ring surrounds an outer surface of the backing member, such that the plurality of spring-loaded centering elements are positioned between the outer surface of the backing member and an inner surface of the outer ring.

    摘要翻译： 一种电极组件和使外环围绕用于半导体衬底处理的等离子体反应室中的电极组件对中的方法。 该方法包括将外环围绕电极组件的背衬构件的外表面定位，并且在外环和背衬构件之间插入至少一个定心元件。 定心元件可以是容纳在背衬构件的外表面上的空腔中的多个弹簧加载的定心元件，定心元件具有适于接触外圈的第一端和适于容纳弹簧的第二端。 外环围绕背衬构件的外表面，使得多个弹簧加载的定心元件位于背衬构件的外表面和外环的内表面之间。

    FILM ADHESIVE FOR SEMICONDUCTOR VACUUM PROCESSING APPARATUS
    10.
    发明申请
    FILM ADHESIVE FOR SEMICONDUCTOR VACUUM PROCESSING APPARATUS 有权
    用于半导体真空处理设备的胶膜粘合剂

    公开(公告)号：US20100304571A1

    公开(公告)日：2010-12-02

    申请号：US12746810

    申请日：2008-12-18

    申请人： Dean J. Larson ,  Tom Stevenson ,  Victor Wang

    发明人： Dean J. Larson ,  Tom Stevenson ,  Victor Wang

    IPC分类号： H01L21/3065 ,  H01L21/306 ,  C23F1/08 ,  B05C13/00 ,  C23C14/34 ,  C23C16/00 ,  B32B37/02 ,  B32B38/04 ,  B32B38/10

    CPC分类号： H01L21/67069 ,  B32B37/12 ,  H01L21/67103 ,  H01L21/68757 ,  Y10T156/10 ,  Y10T156/1062 ,  Y10T428/31504

    摘要： A bonded assembly to reduce particle contamination in a semiconductor vacuum chamber such as a plasma processing apparatus is provided, including an elastomeric sheet adhesive bond between mating surfaces of a component and a support member to accommodate thermal stresses. The elastomeric sheet comprises a silicone adhesive to withstand a high shear strain of ≧800% at a temperature range between room temperature and 300° C. such as heat curable high molecular weight dimethyl silicone with optional fillers. The sheet form has bond thickness control for parallelism of bonded surfaces. The sheet adhesive may be cut into pre-form shapes to conform to regularly or irregularly shaped features, maximize surface contact area with mating parts, and can be installed into cavities. Installation can be manually, manually with installation tooling, or with automated machinery. Composite layers of sheet adhesive having different physical properties can be laminated or coplanar.

    摘要翻译： 提供了一种用于减少诸如等离子体处理装置的半导体真空室中的颗粒污染的粘合组件，包括在部件的配合表面和支撑构件之间的弹性片粘合剂粘合以适应热应力。 弹性体片材包括硅氧烷粘合剂，以在室温和300℃之间的温度范围内承受≥800％的高剪切应变，例如具有任选填料的可热固化的高分子量二甲基硅氧烷。 片材形式具有用于粘结表面平行度的粘结厚度控制。 片状粘合剂可以被切割成预成型形状以符合规则或不规则形状的特征，使与配合部件的表面接触面积最大化，并且可以安装到空腔中。 安装可以手动，手动安装工具或自动化机械。 具有不同物理性质的片状粘合剂的复合层可以层压或共面。