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6 条记录 (耗时 0.011 秒)

    Curable and cured organosilicon compositions
    1.
    发明授权
    Curable and cured organosilicon compositions 失效
    可固化和固化的有机硅组合物

    公开(公告)号：US5391678A

    公开(公告)日：1995-02-21

    申请号：US983450

    申请日：1992-12-03

    申请人： John K. Bard ,  Richard L. Brady ,  Raymond T. Leibfried, Sr. ,  Dekai Loo

    发明人： John K. Bard ,  Richard L. Brady ,  Raymond T. Leibfried, Sr. ,  Dekai Loo

    IPC分类号： C08G77/50 ,  C08L83/14 ,  C08G77/04

    CPC分类号： C08L83/14 ,  C08G77/50

    摘要： Curable compositions including epoxy-functional compounds and polyenes, as well as cyclic polysiloxanes, and/or tetrahedral siloxysilanes, and/or linear polysiloxanes; along with, or instead of these polyenes and silicon compositions, crosslinkable prepolymers prepared from such polyenes and silicon compounds may be included. A curing agent, and yet additionally, a curing accelerator, may also be included. These compositions can be thermally cured, in the presence of hydrosilation catalysts.

    摘要翻译： 包括环氧官能化合物和多烯，以及环状聚硅氧烷和/或四面体硅氧烷硅烷，和/或线性聚硅氧烷的可固化组合物; 连同或替代这些多烯和硅组合物，可以包括由这种多烯和硅化合物制备的可交联预聚物。 还可以包括固化剂，另外还包括固化促进剂。 在硅氢化催化剂存在下，这些组合物可以热固化。

    Liquid photoimagable resist which is resistant to blocking
    4.
    发明授权
    Liquid photoimagable resist which is resistant to blocking 失效
    液体可光阻抗蚀剂，耐粘连

    公开(公告)号：US06342332B1

    公开(公告)日：2002-01-29

    申请号：US08562316

    申请日：1996-02-05

    申请人： Dekai Loo ,  Richard T. Mayes

    发明人： Dekai Loo ,  Richard T. Mayes

    IPC分类号： G03C176

    CPC分类号： H05K3/0079 ,  G03F7/031 ,  H05K3/0076 ,  H05K2203/0759 ,  H05K2203/1105

    摘要： A liquid applied photoresist composition is disclosed which exhibits a favorable balance of photospeed and overall physical properties. The photoresist composition includes a binder, a multifunctional monomer, a photoinitiator, and a solvent. The photoinitiator is present in the photoresist in an amount of greater than about 10% by weight of the photoresist without solvent. The photoresist when applied is relatively resistant to blocking when applied to a substrate. A process for producing a negative resist image on a surface using the photoresist is also disclosed.

    摘要翻译： 公开了一种液体涂敷的光致抗蚀剂组合物，其表现出良好的光速平衡和整体物理性能。 光致抗蚀剂组合物包括粘合剂，多官能单体，光引发剂和溶剂。 光致抗蚀剂中存在的光引发剂的量大于不含溶剂的光致抗蚀剂的约10重量％。 当施加到光刻胶上时，光致抗蚀剂在施加到基底上时相对于阻挡相对抗性。还公开了使用光致抗蚀剂在表面上产生负性抗蚀剂图像的方法。