公开(公告)号：US20070293050A1

公开(公告)日：2007-12-20

申请号：US11821422

申请日：2007-06-22

申请人： Sean Kang ,  Sangheon Lee ,  Wan-Lin Chen ,  Eric Hudson ,  S.M. Sadjadi ,  Gan Zhao

发明人： Sean Kang ,  Sangheon Lee ,  Wan-Lin Chen ,  Eric Hudson ,  S.M. Sadjadi ,  Gan Zhao

IPC分类号： H01L21/302 ,  H01L21/311 ,  H01L21/461 ,  H01L33/00

CPC分类号： H01L21/76802 ,  H01L21/0337 ,  H01L21/31116 ,  H01L21/31144 ,  H01L21/76816

摘要： A feature in a layer is provided. A photoresist layer is formed over the layer. The photoresist layer is patterned to form photoresist features with photoresist sidewalls, where the photoresist features have a first critical dimension. A conformal layer is deposited over the sidewalls of the photoresist features to reduce the critical dimensions of the photoresist features. Features are etched into the layer, wherein the layer features have a second critical dimension, which is less than the first critical dimension.

公开(公告)号：US07767050B2

公开(公告)日：2010-08-03

申请号：US11728589

申请日：2007-03-26

申请人： James R. Meier ,  Greg E. Gindele ,  Gan Zhao ,  Anthony L. Lokken ,  Chadwick M. Johnson ,  Matthew K. Dunham

发明人： James R. Meier ,  Greg E. Gindele ,  Gan Zhao ,  Anthony L. Lokken ,  Chadwick M. Johnson ,  Matthew K. Dunham

IPC分类号： B44C1/17 ,  B32B37/00 ,  B32B38/14 ,  B32B41/00 ,  B32B43/00 ,  B30B9/20 ,  B30B3/00 ,  B29C65/02 ,  B29C65/24

CPC分类号： B32B37/226 ,  B29C65/48 ,  B29C66/45 ,  B29C66/71 ,  B29C66/8226 ,  B29C66/83413 ,  B29C66/91212 ,  B29C66/91231 ,  B29C66/91421 ,  B29C66/961 ,  B29K2067/00 ,  B32B37/0053 ,  B32B37/025 ,  B32B37/12 ,  B32B38/0004 ,  B32B38/1841 ,  B32B2309/70 ,  B32B2367/00 ,  B32B2425/00 ,  Y10T156/1741

摘要： A laminating roller assembly comprises a frame, a movable support supported by the frame, a laminating roller and a lift mechanism. The laminating roller is attached to the movable support. The lift mechanism is attached to the frame and is configured to move the movable support and the attached laminating roller relative to the frame. Additional embodiments of the invention are directed to a credential substrate laminator and a method of laminating a credential substrate using a credential substrate laminator.

摘要翻译： 层压辊组件包括框架，由框架支撑的可移动支撑件，层压辊和提升机构。 层压辊连接到可移动支撑件。 升降机构附接到框架并且构造成相对于框架移动可移动支撑件和附接的层压辊。 本发明的另外的实施例涉及一种凭证衬底层压机和使用凭证衬底层压机层压证书衬底的方法。

公开(公告)号：US20080236728A1

公开(公告)日：2008-10-02

申请号：US11728589

申请日：2007-03-26

申请人： James R. Meier ,  Greg E. Gindele ,  Gan Zhao ,  Anthony L. Lokken ,  Chadwick M. Johnson ,  Matthew K. Dunham

发明人： James R. Meier ,  Greg E. Gindele ,  Gan Zhao ,  Anthony L. Lokken ,  Chadwick M. Johnson ,  Matthew K. Dunham

IPC分类号： B32B5/00

CPC分类号： B32B37/226 ,  B29C65/48 ,  B29C66/45 ,  B29C66/71 ,  B29C66/8226 ,  B29C66/83413 ,  B29C66/91212 ,  B29C66/91231 ,  B29C66/91421 ,  B29C66/961 ,  B29K2067/00 ,  B32B37/0053 ,  B32B37/025 ,  B32B37/12 ,  B32B38/0004 ,  B32B38/1841 ,  B32B2309/70 ,  B32B2367/00 ,  B32B2425/00 ,  Y10T156/1741

摘要： A laminating roller assembly comprises a frame, a movable support supported by the frame, a laminating roller and a lift mechanism. The laminating roller is attached to the movable support. The lift mechanism is attached to the frame and is configured to move the movable support and the attached laminating roller relative to the frame. Additional embodiments of the invention are directed to a credential substrate laminator and a method of laminating a credential substrate using a credential substrate laminator.

摘要翻译： 层压辊组件包括框架，由框架支撑的可移动支撑件，层压辊和提升机构。 层压辊连接到可移动支撑件。 升降机构附接到框架并且构造成相对于框架移动可移动支撑件和附接的层压辊。 本发明的另外的实施例涉及一种凭证衬底层压机和使用凭证衬底层压机层压证书衬底的方法。

公开(公告)号：US20050048785A1

公开(公告)日：2005-03-03

申请号：US10648953

申请日：2003-08-26

申请人： Sean Kang ,  Sangheon Lee ,  Wan-Lin Chen ,  Eric Hudson ,  S. Sadjadi ,  Gan Zhao

发明人： Sean Kang ,  Sangheon Lee ,  Wan-Lin Chen ,  Eric Hudson ,  S. Sadjadi ,  Gan Zhao

IPC分类号： H01L21/033 ,  H01L21/311 ,  H01L21/768 ,  H01L21/302 ,  H01L21/461 ,  H01L33/00

CPC分类号： H01L21/76802 ,  H01L21/0337 ,  H01L21/31116 ,  H01L21/31144 ,  H01L21/76816

摘要： A feature in a layer is provided. A photoresist layer is formed over the layer. The photoresist layer is patterned to form photoresist features with photoresist sidewalls, where the photoresist features have a first critical dimension. A conformal layer is deposited over the sidewalls of the photoresist features to reduce the critical dimensions of the photoresist features. Features are etched into the layer, wherein the layer features have a second critical dimension, which is less than the first critical dimension.

摘要翻译： 提供了一个图层中的一个特征。 在该层上形成光致抗蚀剂层。 光致抗蚀剂层被图案化以形成具有光致抗蚀剂侧壁的光致抗蚀剂特征，其中光致抗蚀剂特征具有第一临界尺寸。 在光致抗蚀剂特征的侧壁上沉积保形层以减少光致抗蚀剂特征的临界尺寸。 将特征蚀刻到层中，其中层特征具有小于第一临界尺寸的第二临界尺寸。