Dielectric function of thin metal films determined by combined transmission spectroscopic ellipsometry and intensity measurements
    5.
    发明授权
    Dielectric function of thin metal films determined by combined transmission spectroscopic ellipsometry and intensity measurements 有权
    通过组合透射光谱椭偏仪和强度测量法确定薄金属膜的介电函数

    公开(公告)号:US07167241B1

    公开(公告)日:2007-01-23

    申请号:US10884718

    申请日:2004-07-04

    IPC分类号: G01J4/00 G01B11/06

    CPC分类号: G01B11/0641 G01N21/211

    摘要: Determination of thin metal film dielectric function and layer thicknesses using simultaneous transmission spectroscopic ellipsometric (SE) and transmission intensity (T) measurements obtained in-situ to break correlation between thickness and optical constants of very thin absorbing films, preferably using only A.C. Components of ellipsometric and intensity characterizing electromagnetic radiation which transmits through said substrate and enters a detector.

    摘要翻译: 使用现场获得的同时透射光谱椭偏(SE)和透射强度(T)测量来确定薄金属膜介电函数和层厚度,以破坏非常薄的吸收膜的厚度和光学常数之间的相关性,优选仅使用椭圆的交流分量 以及表征通过所述衬底并进入检测器的电磁辐射的强度。