Integrated circuit devices having corrosion resistant fuse regions and methods of fabricating the same
    2.
    发明申请
    Integrated circuit devices having corrosion resistant fuse regions and methods of fabricating the same 审中-公开
    具有耐腐蚀熔丝区的集成电路器件及其制造方法

    公开(公告)号:US20070114635A1

    公开(公告)日:2007-05-24

    申请号:US11651264

    申请日:2007-01-09

    IPC分类号: H01L29/00 H01L21/331

    摘要: Integrated circuit devices are provided including an integrated circuit substrate and first through fourth spaced apart lower interconnects on the integrated circuit substrate. The third and fourth spaced apart lower interconnects are parallel to the first and second lower interconnects. A first fuse is provided on the first and second lower interconnects between the first and second lower interconnects and is electrically coupled to the first and second lower interconnects. A second fuse is provided spaced apart from the first fuse and on the third and fourth lower interconnects. The second fuse is between the third and fourth lower interconnects and is electrically coupled to the third and fourth lower interconnects. Related methods of fabricating integrated circuit devices are also provided.

    摘要翻译: 提供集成电路器件,其包括集成电路衬底和集成电路衬底上的第一至第四间隔开的下部互连。 第三和第四间隔开的下互连平行于第一和第二下互连。 第一保险丝设置在第一和第二下互连之间的第一和第二下互连上,并且电耦合到第一和第二下互连。 第二保险丝设置成与第一保险丝隔开并且在第三和第四下部互连上。 第二保险丝在第三和第四下部互连之间,并且电耦合到第三和第四下部互连。 还提供了制造集成电路器件的相关方法。