公开(公告)号：US06456382B2

公开(公告)日：2002-09-24

申请号：US09870734

申请日：2001-06-01

申请人： Hiroshi Ichihara ,  Takashi Gemma ,  Shigeru Nakayama ,  Hajime Ichikawa

发明人： Hiroshi Ichihara ,  Takashi Gemma ,  Shigeru Nakayama ,  Hajime Ichikawa

IPC分类号： G01B902

CPC分类号： G01M11/0271 ,  G01B9/02039 ,  G01B9/02057 ,  G01B9/02072 ,  G01B11/2441 ,  G01M11/0214 ,  G01M11/025 ,  G01M11/0264 ,  G03F7/706

摘要： A method of manufacturing a projection optical system (37) for projecting a pattern from a reticle to a photosensitive substrate, comprising a surface-shape-measuring step wherein the shape of an optical test surface (38) of an optical element (36) which is a component in the projection optical system is measured by causing interference between light from the optical surface (38) and light from an aspheric reference surface (70) while the optical test surface (38) and said reference surface (70) are held in integral fashion in close mutual proximity. A wavefront-aberration-measuring step is included, wherein the optical element is assembled in the projection optical system and the wavefront aberration of the projection optical system is measured. A surface correction calculation step is also included wherein the amount by which the shape of the optical test surface should be corrected is calculated based on wavefront aberration data obtained at the wavefront-aberration-measuring step and surface shape data obtained from the surface-shape-measuring step. The method also includes a surface shape correction step wherein the shape of the optical test surface is corrected based on calculation performed at the surface correction calculation step. Surface shape measuring interferometer systems and wavefront-aberration-measuring interferometer systems (22J-22Q) used in performing the manufacturing method are also disclosed.

摘要翻译： 一种制造用于将图案从掩模版投影到感光基板的投影光学系统（37）的方法，包括表面形状测量步骤，其中光学元件（36）的光学测试表面（38）的形状 通过在将光学测试表面（38）和所述参考表面（70）保持在其中的同时来自光学表面（38）的光和来自非球面参考表面（70）的光之间的干涉来测量投影光学系统中的分量。 一体化的时尚紧密相邻。 包括波前像差测量步骤，其中光学元件组装在投影光学系统中，并且测量投影光学系统的波前像差。 还包括表面校正计算步骤，其中根据在波前像差测量步骤获得的波前像差数据和从表面形状测量步骤获得的表面形状数据来计算光学测试表面的形状应被校正的量， 测量步骤。 该方法还包括表面形状校正步骤，其中基于在表面校正计算步骤执行的计算来校正光学测试表面的形状。 还公开了用于执行制造方法的表面形状测量干涉仪系统和波前像差测量干涉仪系统（22J-22Q）。

公开(公告)号：US06344898B1

公开(公告)日：2002-02-05

申请号：US09396491

申请日：1999-09-14

申请人： Takashi Gemma ,  Hiroshi Ichihara ,  Hajime Ichikawa ,  Shigeru Nakayama ,  Bruce Jacobsen

发明人： Takashi Gemma ,  Hiroshi Ichihara ,  Hajime Ichikawa ,  Shigeru Nakayama ,  Bruce Jacobsen

IPC分类号： G01B902

CPC分类号： G01B9/02039 ,  G01B9/02007 ,  G01B9/02072 ,  G01B11/255 ,  G01J9/02

摘要： Apparatus and methods are disclosed for measuring the surface topography of a test surface, such as a spherical or aspherical surface of a refractive or reflective optical element. The test surface is measured by detecting the state of interference fringes generated by interference of a reference light beam and a measurement light beam that interacts (e.g., reflects from) the test surface. The reference and measurement beams are produced by a point light source having a reflective surface. The point light source is disposed between a source of input light and the test surface. The measurement beam (after interacting with the test surface) and the reference beam are caused to interfere with each other to produce a first interference-fringe state. The distance between the point light source and the test surface can be changed between production of the first interference-fringe state and production of a second interference-fringe state. The profile of the test surface is determined by analyzing the resulting interference fringes. A null element can be used to convert a spherical wavefront of the measurement beam into an aspherical wavefront corresponding to the aspherical test surface, or to convert an aspherical wavefront generated by reflection of a spherical wavefront from an aspherical test surface into a spherical or planar wavefront.

摘要翻译： 公开了用于测量测试表面（例如折射或反射光学元件的球面或非球面）的表面形貌的装置和方法。 通过检测由参考光束和与测试表面相互作用（例如反射）的测量光束产生的干涉条纹的状态来测量测试表面。 参考和测量光束由具有反射表面的点光源产生。 点光源设置在输入光源和测试表面之间。 使测量光束（与测试表面相互作用）和参考光束相互干涉以产生第一干涉条纹状态。 可以在产生第一干涉条纹状态和产生第二干涉条纹状态之间改变点光源与测试表面之间的距离。 通过分析所得到的干涉条纹来确定测试表面的轮廓。 可以使用空元素将测量光束的球面波前转换成对应于非球面测试表面的非球面波前，或者将通过球面波阵面的反射产生的非球面波阵面从非球面测试表面转换成球面或平面波阵面 。

公开(公告)号：US6100980A

公开(公告)日：2000-08-08

申请号：US54450

申请日：1998-04-03

申请人： Hajime Ichikawa

发明人： Hajime Ichikawa

IPC分类号： G01B11/02 ,  G01B11/24 ,  G01B9/02

CPC分类号： G01B11/2441 ,  G01B11/02

摘要： A magnification calibration apparatus includes an optical system optically coupled to an object surface for forming an image of the object surface, a detector for detecting the image of the object surface, and a movable support for supporting the object surface, the movable support being capable of laterally moving the object surface by a predetermined distance from a first lateral position to a second lateral position. The magnification calibration apparatus further includes a reference point recognition unit for, at each of the first and second lateral positions of the object surface, detecting the position of the image of an imaginary reference point on the object surface as a position in a detector coordinate system fixed to the detector in accordance with the image detected by the detector, and a computation unit for deriving a correspondence between an object coordinate system at the object surface and the detector coordinate system from the detected positions of the image in the detector coordinate system at the first and second lateral positions of the object surface and from the predetermined distance by which the object surface is moved from the first lateral position to the second lateral position by the movable support.

摘要翻译： 放大率校准装置包括光学耦合到物体表面以形成物体表面的图像的光学系统，用于检测物体表面的图像的检测器和用于支撑物体表面的可移动支撑件，可移动支撑件能够 将物体表面横向移动从第一横向位置到第二横向位置预定距离。 放大率校准装置还包括参考点识别单元，用于在物体表面的第一和第二横向位置的每一个处检测物体表面上的虚拟参考点的图像的位置作为检测器坐标系中的位置 根据检测器检测到的图像固定到检测器，以及计算单元，用于从检测器坐标系中的图像的检测位置导出物体表面处的物体坐标系与检测器坐标系之间的对应关系 物体表面的第一和第二横向位置以及物体表面由可移动支撑件从第一横向位置移动到第二横向位置的预定距离。

公开(公告)号：US5986760A

公开(公告)日：1999-11-16

申请号：US97578

申请日：1998-06-12

申请人： Shigeru Nakayama ,  Takashi Genma ,  Tetsuji Onuki ,  Masami Ebi ,  Hajime Ichikawa

发明人： Shigeru Nakayama ,  Takashi Genma ,  Tetsuji Onuki ,  Masami Ebi ,  Hajime Ichikawa

IPC分类号： G01B9/02 ,  G01B11/24 ,  G01B11/255 ,  G01M11/00 ,  G01M11/02 ,  G02B3/00 ,  G02B3/02

CPC分类号： G01M11/025 ,  G01B11/2441 ,  G01B11/255 ,  G01M11/0271

摘要： A method of measuring a surface shape of a target surface, and a lens manufacturing process for manufacturing a lens having a surface shape figured to high-precision. The method and process includes the steps of first, interferometrically measuring the surface shape of the target surface or the lens surface. Then second, measuring a surface shape of a prototype target surface. Then third, determining a rotationally symmetric error component of the difference between the target surface shape or the lens surface shape and the prototype target surface shape. Then fourth, expressing the rotationally symmetric error as a sum of two components, one being slowly varying and the other being a remainder. The slowly varying component is at least determined by performing the third step, while the remainder component is determined by performing the first step.

摘要翻译： 测量目标表面的表面形状的方法以及制造具有高精度的表面形状的透镜的透镜制造工艺。 该方法和方法包括以下步骤：首先干涉测量目标表面或透镜表面的表面形状。 然后第二，测量原型目标表面的表面形状。 然后，第三，确定目标表面形状或透镜表面形状与原型目标表面形状之间的差异的旋转对称误差分量。 然后第四，将旋转对称误差表示为两个分量的和，一个是缓慢变化的，另一个是余数。 至少通过执行第三步来确定缓慢变化的分量，而通过执行第一步来确定剩余分量。

公开(公告)号：US4988164A

公开(公告)日：1991-01-29

申请号：US332809

申请日：1989-04-03

申请人： Hajime Ichikawa

发明人： Hajime Ichikawa

IPC分类号： G02B1/11

CPC分类号： G02B1/115

摘要： An anti-reflective film for synthetic resin optical parts of elements. The film comprises a first SiO layer, a second SiO.sub.2 layer, a third CeO.sub.2 layer and a fourth SiO.sub.2 layer, each layer having a particular optical thickness at a wavelength of .lambda.=400-700 nm.

摘要翻译： 合成树脂光学元件抗反射膜。 该膜包括第一SiO层，第二SiO 2层，第三CeO 2层和第四SiO 2层，每个层在波长λ= 400-700nm处具有特定的光学厚度。

公开(公告)号：US4890245A

公开(公告)日：1989-12-26

申请号：US99297

申请日：1987-09-17

申请人： Masahiko Yomoto ,  Makoto Uehara ,  Hajime Ichikawa ,  Shigeru Kato

发明人： Masahiko Yomoto ,  Makoto Uehara ,  Hajime Ichikawa ,  Shigeru Kato

IPC分类号： G01J5/00 ,  G01J5/62

CPC分类号： G01J5/0003 ,  G01J5/0007 ,  G01J5/08 ,  G01J5/0834 ,  G01J5/0846 ,  G01J5/0871 ,  G01J5/0896 ,  G01J2005/0051 ,  G01J2005/0074

摘要： An apparatus and a method for detecting the temperature of a substrate, and for controlling the radiation-annealing of the substrate, for example, measures the intensity of infrared light from the substrate when the substrate is irradiated by measuring infrared light and also when the substrate is not irradiated by the infrared light. The temperature is calculated from the transmissivity and emissivity of the substrate, which are calculated from the intensity measurements.

摘要翻译： 用于检测基板的温度，并且用于控制基板的放射线退火的装置和方法，例如，当通过测量红外光照射基板时，测量来自基板的红外光的强度，以及当基板 不被红外线照射。 温度由基板的透射率和发射率计算，由强度测量计算。

公开(公告)号：US5982490A

公开(公告)日：1999-11-09

申请号：US18529

申请日：1998-02-04

申请人： Hajime Ichikawa ,  Takahiro Yamamoto

发明人： Hajime Ichikawa ,  Takahiro Yamamoto

IPC分类号： G01B11/30 ,  G01J9/02 ,  G01B9/02

CPC分类号： G01J9/02 ,  G01B11/30

摘要： A method is provided for deriving an absolute surface profile of an object having a rotationally symmetric component and a rotationally asymmetric component using a detection system for measuring a relative surface profile of the object with respect to a predetermined reference surface. The method includes the steps of positioning the object to a first predetermined position relative to the detection system, rotating the object around a predetermined measurement axis of rotation at the first predetermined position, acquiring data indicating the relative surface profile of the object with respect to the predetermined reference surface at each of a plurality of rotational positions of the object during the rotating step, averaging the data acquired in the acquiring step over the plurality of rotational positions to derive a rotationally averaged data, and processing the rotationally averaged data and the data indicating the relative surface profile of the object at at least one of the plurality of rotational positions of the object to derive the rotationally asymmetric component of the absolute surface profile of the object. The method further includes the steps of translating the object to a second predetermined position relative to the detection system, acquiring data indicating the relative surface profile of the object at the second predetermined position, and processing the data indicating the relative surface profile of the object at the second predetermined position and at least one of the rotationally averaged data and the data indicating the relative surface profile at at least one of the plurality of rotational positions of the object to derive the rotationally symmetric component of the absolute surface profile of the object, the data processing using a polynomial best fitting method for the data indicating the relative surface profile at the second predetermined position.

摘要翻译： 提供了一种用于使用用于测量物体相对于预定参考表面的相对表面轮廓的检测系统来导出具有旋转对称分量和旋转非对称分量的物体的绝对表面轮廓的方法。 该方法包括以下步骤：将物体相对于检测系统定位在第一预定位置，使物体围绕预定的测量旋转轴线在第一预定位置旋转，获取指示物体相对于第一预定位置的相对表面轮廓的数据 在所述旋转步骤期间在所述物体的多个旋转位置的每一个处的预定参考表面对所述多个旋转位置中的所述获取步骤中获取的数据求平均以导出旋转平均数据，并且处理所述旋转平均数据和指示 在物体的多个旋转位置中的至少一个旋转位置处的物体的相对表面轮廓，以导出物体的绝对表面轮廓的旋转非对称分量。 该方法还包括以下步骤：将物体相对于检测系统平移到第二预定位置，获取指示物体在第二预定位置处的相对表面轮廓的数据，以及处理指示物体的相对表面轮廓的数据 所述第二预定位置和所述旋转平均数据和所述数据中的至少一个指示所述对象的所述多个旋转位置中的至少一个的相对表面轮廓以导出所述物体的绝对表面轮廓的旋转对称分量， 使用多项式最佳拟合方法对表示第二预定位置处的相对表面轮廓的数据进行数据处理。

公开(公告)号：US4599272A

公开(公告)日：1986-07-08

申请号：US648729

申请日：1984-09-07

申请人： Hajime Ichikawa

发明人： Hajime Ichikawa

IPC分类号： C03C17/22 ,  C03C17/34 ,  C08J7/06 ,  C23C14/06 ,  C23C14/50 ,  G01P15/125 ,  G02B1/04 ,  B32B27/36

CPC分类号： G02B1/115 ,  C03C17/22 ,  C03C17/3417 ,  C03C17/3435 ,  C03C17/3452 ,  C23C14/06 ,  C23C14/505 ,  C03C2217/29 ,  C03C2218/151 ,  Y10T428/31507 ,  Y10T428/31667

摘要： An anti-reflection coating for an optical component and a method of forming the same are disclosed. The anti-reflection coating is formed on a substrate for an optical component by subjecting a mixture of an evaporating material and 10-30% of SiO.sub.2 to vacuum evaporation at room temperature without heating the substrate. When the anti-reflection coating is a single layer, a mixture of MgF.sub.2 and 10-30% of SiO.sub.2 is used as the evaporating material. When the anit-reflection coating is a multi-layer structure, a mixture of a fluoride or a silicon oxide and 10-30% of SiO.sub.2 for a first layer, and a mixture of a fluoride or an oxide and 10-30% of SiO.sub.2 for middle and last layers are used as the evaporating material.

摘要翻译： 公开了一种用于光学部件的防反射涂层及其形成方法。 通过使蒸发材料的混合物和10-30％的SiO 2的混合物在室温下进行真空蒸发，而不加热基板，在防光涂层的基板上形成防反射涂层。 当防反射涂层是单层时，使用MgF 2和10-30％SiO 2的混合物作为蒸发材料。 当反射反射涂层是多层结构时，氟化物或氧化硅与10-30％的SiO 2的混合物用于第一层，以及氟化物或氧化物和10-30％的SiO 2的混合物 用于中间层和最后层用作蒸发材料。

公开(公告)号：US20130054243A1

公开(公告)日：2013-02-28

申请号：US13498738

申请日：2010-09-28

申请人： Hajime Ichikawa

发明人： Hajime Ichikawa

IPC分类号： G10L15/00

CPC分类号： G06F3/167 ,  G06F3/0482 ,  G10L15/26 ,  H04M1/72522 ,  H04M2250/74

摘要： Provided is an electronic device and control method, wherein a simple interface upon utilizing voice recognition can be attained. A cellular phone (1) is provided with a voice recognition unit (30), an execution unit (40) that executes a prescribed application, and an OS (50) that controls the voice recognition unit (30) and the executing unit (40). The executing unit (40) will make an assessment, upon receiving an instruction from the OS (50) to start up the prescribed application, of whether the start-up instruction was based on a result of voice recognition conducted by the voice recognition unit (30) or not, and will select the content to be processed according to the result of this assessment.

摘要翻译： 提供了一种电子设备和控制方法，其中可以实现利用语音识别的简单接口。 蜂窝电话（1）设置有语音识别单元（30），执行规定应用的执行单元（40）和控制语音识别单元（30）和执行单元（40）的OS（50） ）。 执行单元（40）在接收到来自OS（50）的启动规定的应用程序的指示时，进行评估是否基于由语音识别单元执行的语音识别的结果 30），并根据评估结果选择要处理的内容。

公开(公告)号：US6032377A

公开(公告)日：2000-03-07

申请号：US3887

申请日：1998-01-07

申请人： Hajime Ichikawa ,  Takahiro Yamamoto

发明人： Hajime Ichikawa ,  Takahiro Yamamoto

IPC分类号： G01B9/02 ,  B24B13/00 ,  G01B11/24 ,  G01B11/255 ,  G01B21/20

CPC分类号： G01B11/255

摘要： A non-spherical surface shape measuring device and method that measures the shapes of object surfaces that have rotationally symmetrical non-spherical surface shapes on the basis of relative deviation values from the shape of a reference surface, the non-spherical surface shape measuring device includes a measuring means for obtaining relative deviation values between a reference surface and an object surface by measuring corresponding sampling points on the surfaces of the reference surface and the object surface and storing predetermined coefficients of variables prior to measurement. A first operating means approximates the partial differential coefficients for the predetermined variables and models the relative displacement, between the object surface and the reference surface and the XY-coordinates of the sampling points, into functional equivalents of the partial differential coefficients. A second operating means approximates the relative displacement between the object surface and the reference surface and a third operating means corrects the relative deviation values according to the relative displacement approximated by the second operating means.

摘要翻译： 非球面表面形状测量装置和方法，其基于与参考表面的形状的相对偏差值来测量具有旋转对称的非球形表面形状的物体表面的形状，非球面形状测量装置包括 测量装置，用于通过测量参考表面和物体表面的相应采样点，并在测量之前存储预定的变量系数，来获得参考表面和物体表面之间的相对偏差值。 第一操作装置近似于预定变量的偏微分系数，并将对象表面和参考表面之间的相对位移和采样点的XY坐标建模成为偏微分系数的功能等价物。 第二操作装置近似于物体表面和参考表面之间的相对位移，第三操作装置根据由第二操作装置近似的相对位移校正相对偏差值。