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1.发明申请公开(公告)号：US20110200321A1
公开(公告)日：2011-08-18
申请号：US13025300
申请日：2011-02-11
IPC分类号： G03B13/00
CPC分类号： G03B27/52 , G03F7/3021 , H01L21/6715 , H01L21/67178 , H01L21/6719 , H01L21/67745 , H01L21/67748 , H01L21/68742 , H01L21/68785
摘要： There is provided a coating and developing apparatus that develops a substrate of which surface is coated with resist and exposed to lights. The coating and developing apparatus includes a developing module; a cleaning module; and a transfer mechanism configured to transfer a substrate developed by the developing module to the cleaning module. The developing module includes an airtightly sealed processing vessel configured to form a processing atmosphere; a temperature control plate provided in the processing vessel and mounts thereon the substrate and cools the substrate; and an atmosphere gas supply unit configured to supply an atmosphere gas including mist of a developing solution to a surface of the substrate within the processing vessel. The cleaning module includes a mounting table configured to mount thereon the substrate; and a cleaning solution supply unit configured to supply a cleaning solution to the substrate mounted on the mounting table.
摘要翻译： 提供了一种涂覆和显影装置，其显影其表面被抗蚀剂涂覆并暴露于光的基底。 涂料和显影装置包括显影模块; 清洁模块; 以及传送机构，其构造成将由显影模块显影的基板传送到清洁模块。 显影模块包括构造成形成处理气氛的气密密封处理容器; 设置在处理容器中并安装在其上的温度控制板并冷却基板; 以及气氛气体供给单元，被构造成将处理容器内的显影液的气雾气体气体供给至基板的表面。 清洁模块包括：安装台，其安装在其上; 以及清洗液供给单元，其构造成将清洗液供给到安装在所述安装台上的基板。
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公开(公告)号：US08337104B2
公开(公告)日：2012-12-25
申请号：US13024430
申请日：2011-02-10
IPC分类号： G03D5/00
CPC分类号： G03F7/3021
摘要： There is provided a developing apparatus and a developing method capable of rapidly forming a liquid film of a developing solution on an entire surface of a substrate while reducing a usage amount of the developing solution. The developing apparatus includes an airtightly sealed processing vessel that forms a processing atmosphere therein; a temperature control plate that is provided within the processing vessel and mounts the substrate thereon; an atmosphere gas supply unit that supplies an atmosphere gas including mist and vapor of a developing solution onto a surface of the substrate within the processing vessel; and a first temperature control unit that controls the temperature control plate to a temperature allowing the atmosphere gas to be condensed on the substrate. Here, an inner wall of the processing vessel is maintained at a temperature at which the atmosphere gas is hardly condensed on the inner wall.
摘要翻译： 提供了一种能够在减少显影液的使用量的同时在基板的整个表面上快速形成显影液的液膜的显影装置和显影方法。 显影装置包括在其中形成处理气氛的气密密封处理容器; 温度控制板，设置在处理容器内并将基板安装在其上; 气氛气体供给单元，其将包含显影液的雾和气体的气氛气体供给到所述处理容器内的所述基板的表面上; 以及第一温度控制单元，其将温度控制板控制为允许气氛气体在基板上冷凝的温度。 这里，处理容器的内壁保持在气氛气体几乎不凝结在内壁上的温度。
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公开(公告)号：US20110200953A1
公开(公告)日：2011-08-18
申请号：US13025490
申请日：2011-02-11
CPC分类号： G03F7/3021
摘要： There is provided a developing apparatus capable of achieving high throughput. The developing apparatus includes an airtightly sealed processing vessel that forms a processing atmosphere therein; an atmosphere gas supply unit that supplies an atmosphere gas containing mist of a developing solution into the processing vessel in order to form a liquid film of the developing solution on a surface of a substrate loaded into the processing vessel; and a drying unit that dries the substrate in order to stop a developing process by the liquid film. A reaction between a resist and the developing solution can be stopped. Therefore, a developing process can be performed in parallel with a cleaning process performed by a cleaning module and high throughput is achieved.
摘要翻译： 提供了能够实现高产量的显影装置。 显影装置包括在其中形成处理气氛的气密密封处理容器; 气氛气体供给单元，其将含有显影液雾的气氛气体供给到处理容器中，以在装载到处理容器中的基板的表面上形成显影液的液膜; 以及干燥单元，其干燥基板以便通过液膜来停止显影处理。 可以停止抗蚀剂与显影液的反应。 因此，可以与由清洁模块执行的清洁处理并行执行显影处理，并且实现高生产率。
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公开(公告)号：US20110200952A1
公开(公告)日：2011-08-18
申请号：US13024430
申请日：2011-02-10
CPC分类号： G03F7/3021
摘要： There is provided a developing apparatus and a developing method capable of rapidly forming a liquid film of a developing solution on an entire surface of a substrate while reducing a usage amount of the developing solution. The developing apparatus includes an airtightly sealed processing vessel that forms a processing atmosphere therein; a temperature control plate that is provided within the processing vessel and mounts the substrate thereon; an atmosphere gas supply unit that supplies an atmosphere gas including mist and vapor of a developing solution onto a surface of the substrate within the processing vessel; and a first temperature control unit that controls the temperature control plate to a temperature allowing the atmosphere gas to be condensed on the substrate. Here, an inner wall of the processing vessel is maintained at a temperature at which the atmosphere gas is hardly condensed on the inner wall.
摘要翻译： 提供了一种能够在减少显影液的使用量的同时在基板的整个表面上快速形成显影液的液膜的显影装置和显影方法。 显影装置包括在其中形成处理气氛的气密密封处理容器; 温度控制板，设置在处理容器内并将基板安装在其上; 气氛气体供给单元，其将包含显影液的雾和气体的气氛气体供给到所述处理容器内的所述基板的表面上; 以及第一温度控制单元，其将温度控制板控制为允许气氛气体在基板上冷凝的温度。 这里，处理容器的内壁保持在气氛气体几乎不凝结在内壁上的温度。
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5.发明申请SUBSTRATE TREATMENT APPARATUS, SUBSTRATE TREATMENT METHOD, COATING AND DEVELOPING APPARATUS, COATING AND DEVELOPING METHOD, AND STORAGE MEDIUM 审中-公开基板处理设备，基板处理方法，涂装和开发设备，涂装和开发方法以及存储介质公开(公告)号：US20100233638A1
公开(公告)日：2010-09-16
申请号：US12720072
申请日：2010-03-09
CPC分类号： H01L21/67748 , H01L21/67109 , H01L21/6715
摘要： The substrate treatment apparatus includes a heating plate that heats the substrate prepared by coating a surface of the substrate with a resist and exposing the resist-coated substrate to light; a surface treatment liquid atomizing unit that atomizes a surface treatment liquid used to improve wettability of the substrate with a developer that is supplied onto the resist; a cooling unit that cools the substrate heated by the heating plate; and a surface treatment liquid supply unit that supplies the atomized surface treatment liquid onto the substrate for a portion of the period from the time when the substrate is heated until the cooling means terminates the cooling of the substrate.
摘要翻译： 基板处理装置包括加热板，其加热通过用抗蚀剂涂布基板的表面而制备的基板，并将抗蚀剂涂覆的基板曝光; 表面处理液体雾化单元，其用提供给抗蚀剂的显影剂使用于改善基材的润湿性的表面处理液雾化; 冷却单元，其冷却由所述加热板加热的所述基板; 以及表面处理液体供给单元，其从基板被加热直到冷却单元终止基板的冷却的期间的一部分，将雾化表面处理液供给到基板上。
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公开(公告)号：US07237846B1
公开(公告)日：2007-07-03
申请号：US11350763
申请日：2006-02-10
申请人： Hiroshi Arima
发明人： Hiroshi Arima
IPC分类号： B60N2/00
CPC分类号： B60N2/6009
摘要： A resin side cover for covering a side frame member of seat cushion frame of automotive seat, which includes outer and inner cover elements. First and second female engagement elements are respectively provided to forward and backward regions of the outer cover element, whereas first and second male engagement elements of resin material are respectively provided to a forward region of the side frame member and the inner cover element. The first female engagement element has an engagement portion defined therein at a predetermined position. The first male engagement element has a latch element defined therein at a point corresponding to such predetermined position, thus allowing the latch portion to be latchingly engageable with the engagement portion of the first female engagement element, while allowing the latch portion to be disengageable from that engagement portion by displacing the first female engagement element from the foregoing predetermined position.
摘要翻译： 一种用于覆盖汽车座椅的座垫框架的侧框架构件的树脂侧盖，其包括外盖元件和内盖元件。 第一和第二阴接合元件分别设置在外盖元件的前后区域，而树脂材料的第一和第二阳接合元件分别设置在侧框架元件和内盖元件的前部区域。 第一阴接合元件在预定位置具有限定在其中的接合部。 第一阳接合元件在对应于该预定位置的点处具有限定在其中的闩锁元件，从而允许闩锁部分能够与第一阴接合元件的接合部分闩锁地接合，同时允许闩锁部分与该第一阴接合元件可接合 接合部分通过从上述预定位置移位第一阴接合元件。
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公开(公告)号：US08333522B2
公开(公告)日：2012-12-18
申请号：US13025490
申请日：2011-02-11
IPC分类号： G03D5/00
CPC分类号： G03F7/3021
摘要： There is provided a developing apparatus capable of achieving high throughput. The developing apparatus includes an airtightly sealed processing vessel that forms a processing atmosphere therein; an atmosphere gas supply unit that supplies an atmosphere gas containing mist of a developing solution into the processing vessel in order to form a liquid film of the developing solution on a surface of a substrate loaded into the processing vessel; and a drying unit that dries the substrate in order to stop a developing process by the liquid film. A reaction between a resist and the developing solution can be stopped. Therefore, a developing process can be performed in parallel with a cleaning process performed by a cleaning module and high throughput is achieved.
摘要翻译： 提供了能够实现高产量的显影装置。 显影装置包括在其中形成处理气氛的气密密封处理容器; 气氛气体供给单元，其将含有显影液雾的气氛气体供给到处理容器中，以在装载到处理容器中的基板的表面上形成显影液的液膜; 以及干燥单元，其干燥基板以便通过液膜来停止显影处理。 可以停止抗蚀剂与显影液的反应。 因此，可以与由清洁模块执行的清洁处理并行执行显影处理，并且实现高生产率。
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8.发明申请SUBSTRATE CLEANING METHOD, SUBSTRATE CLEANING APPARATUS AND STORAGE MEDIUM FOR SUBSTRATE CLEANING 审中-公开基板清洗方法，基板清洗装置和基板清洗存储介质公开(公告)号：US20120111373A1
公开(公告)日：2012-05-10
申请号：US13288255
申请日：2011-11-03
申请人： Hiroshi ARIMA , Yuichi YOSHIDA , Kousuke YOSHIHARA
发明人： Hiroshi ARIMA , Yuichi YOSHIDA , Kousuke YOSHIHARA
CPC分类号： G03F7/422 , H01L21/67051
摘要： A method for cleaning a surface of a substrate having a circuit pattern formed thereon, includes: forming a liquid film on the surface by feeding a cleaning solution onto the center of the surface while rotating the substrate with the substrate kept horizontal; forming a dry region by discharging gas to the center while moving a position of feed of the cleaning solution on the surface by a distance from the center toward the periphery of the substrate with the substrate being rotated; moving the position of feed of the cleaning solution on the surface toward the periphery at a speed equal to a speed at which the dry region is expanded toward the periphery while rotating the substrate; and controlling temperature of the cleaning solution to form the liquid film such that the temperature becomes higher than process atmosphere temperature on the surface during feed of the cleaning solution.
摘要翻译： 一种用于清洗其上形成有电路图案的基板的表面的方法，包括：通过在将基板保持水平的同时旋转基板的同时将清洁溶液馈送到表面的中心而在表面上形成液膜; 通过在基板旋转的同时将清洁溶液的进料位置从基板的中心向外周移动到表面上的方式将气体排出到中心而形成干燥区域; 在旋转基板的同时，以与干燥区域朝向周边膨胀的速度相等的速度将清洁溶液的表面朝向周边移动的位置; 以及控制清洁溶液的温度以形成液膜，使得在清洁溶液的进料期间温度变得高于表面上的处理气氛温度。
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公开(公告)号：US20100244514A1
公开(公告)日：2010-09-30
申请号：US12410706
申请日：2009-03-25
申请人： Hiroshi ARIMA
发明人： Hiroshi ARIMA
IPC分类号： A47C31/00
CPC分类号： B60N2/20
摘要： An arrangement of operation unit in one upper corner portion of seat back of automotive seat is disclosed, in which an operating lever of the operation unit is accommodated in a housing fixed to a connecting bracket disposed in such one upper corner portion, and a shape retaining bracket is fixed to the connecting bracket to retain the peripheral edge region of opening of a trim cover assembly through which an operating lever of the operation unit projects outwardly. The peripheral edge region is inserted between the shape regaining bracket and a bezel, and further, the connecting bracket, housing and trim cover assembly are connected with one another at a connecting point, thereby effectively retaining the peripheral edge region of opening of the trim cover assembly in a predetermined shape conforming to outer contour of the one upper corner portion of seat back.
摘要翻译： 公开了一种在汽车座椅的座椅靠背的一个上角部分中的操作单元的布置，其中操作单元的操作杆被容纳在固定到设置在这样的一个上角部中的连接托架的壳体中，并且形状保持 支架固定在连接支架上，以保持装饰罩组件的周边边缘区域，操作单元的操作杆通过该边缘区域向外伸出。 外围边缘区域被插入在形状恢复支架和边框之间，此外，连接托架，壳体和装饰盖组件在连接点处彼此连接，从而有效地保持装饰盖的开口的周边边缘区域 组装成符合座椅靠背的一个上角部的外轮廓的预定形状。
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公开(公告)号：US08398319B2
公开(公告)日：2013-03-19
申请号：US12718104
申请日：2010-03-05
IPC分类号： G03D5/00
CPC分类号： G03F7/3021 , H01L21/6715
摘要： A developing apparatus including a substrate holder that holds a substrate horizontally; means for atomizing a surface treatment liquid used to improve wettability of the substrate with a developer; a first spray nozzle that sprays the atomized surface treatment liquid onto the substrate; and a developer supply nozzle that supplies a developer onto the substrate to which the substrate treatment liquid has been sprayed. The surface tension of the atomized surface treatment liquid with respect to the substrate is lower than the surface tension of the surface treatment liquid with respect to the substrate. The atomization suppresses the fact that the surface treatment liquid gathers on a certain portion of the surface of the substrate. The surface treatment liquid can be easily supplied onto the entire surface of the substrate, and improve wettability of the substrate with the developer.
摘要翻译： 一种显影装置，包括：水平保持基板的基板支架; 用于使用显影剂使用于改善基材的润湿性的表面处理液体雾化的装置; 将雾化的表面处理液体喷射到基板上的第一喷嘴; 以及将显影剂供给到已经喷射了基板处理液的基板上的显影剂供给喷嘴。 雾化表面处理液相对于基材的表面张力低于表面处理液相对于基材的表面张力。 雾化抑制了表面处理液体聚集在基材表面的某一部分上的事实。 可以容易地将表面处理液体提供到基板的整个表面上，并且改善基板与显影剂的润湿性。
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