公开(公告)号：US4452665A

公开(公告)日：1984-06-05

申请号：US541221

申请日：1983-10-12

申请人： Hiroyuki Hiraoka

发明人： Hiroyuki Hiraoka

IPC分类号： C23C14/12 ,  C23F1/00 ,  C23F1/02 ,  G03F1/20 ,  G03F7/09 ,  H01L21/027 ,  H01L21/302 ,  H01L21/3065 ,  H01L21/311 ,  B44C1/22 ,  B29C17/08 ,  C03C15/00 ,  C03C25/06

CPC分类号： G03F1/20 ,  G03F7/094 ,  H01L21/31138

摘要： A polymeric halocarbon is used as an etch barrier for plasma etching in a process to make high resolution, high aspect ratio polymer patterns.

摘要翻译： 在制造高分辨率，高纵横比聚合物图案的方法中，聚合卤化碳被用作等离子体蚀刻的蚀刻阻挡层。

公开(公告)号：US07511206B2

公开(公告)日：2009-03-31

申请号：US11267314

申请日：2005-11-07

申请人： Hiroyuki Hiraoka ,  Yosuke Shiratori ,  Masahide Yamamoto ,  Shigeo Itoh ,  Kenji Nawamaki

发明人： Hiroyuki Hiraoka ,  Yosuke Shiratori ,  Masahide Yamamoto ,  Shigeo Itoh ,  Kenji Nawamaki

IPC分类号： D01F9/127

CPC分类号： B82Y30/00 ,  B82Y10/00 ,  B82Y40/00 ,  C01B32/162 ,  C23C16/26 ,  C23C16/509 ,  D01F9/127 ,  H01J2201/30469 ,  Y10S977/742 ,  Y10S977/844 ,  Y10S977/952

摘要： The present invention provides carbon nanotubes perpendicularly and densely deposited over a wide area of a substrate. The carbon nanotubes are manufactured by supplying alternating-current power at a specific frequency between an anode and a cathode disposed in a reactor, and causing plasma to be generated between the anode and the cathode by introducing mixed gas containing an aliphatic hydrocarbon having 1-5 carbon atoms and hydrogen or mixed gas containing an aromatic hydrocarbon and hydrogen. The substrate is disposed between the anode and the cathode and held at a distance two times or less of the mean free path of a hydrocarbon cation from the anode.

摘要翻译： 本发明提供了在基底的广泛区域上垂直且密集地沉积的碳纳米管。 通过在设置在反应器中的阳极和阴极之间以特定频率提供交流电力，并通过引入含有1-5个脂肪族烃的混合气体在阳极和阴极之间产生等离子体来制造碳纳米管 碳原子和氢或含有芳烃和氢的混合气体。 基板设置在阳极和阴极之间并保持与阳离子从阳极平均自由程的两倍或更小的距离。

公开(公告)号：US20060054491A1

公开(公告)日：2006-03-16

申请号：US11267314

申请日：2005-11-07

申请人： Hiroyuki Hiraoka ,  Yosuke Shiratori ,  Masahide Yamamoto ,  Shigeo Itoh ,  Kenji Nawamaki

发明人： Hiroyuki Hiraoka ,  Yosuke Shiratori ,  Masahide Yamamoto ,  Shigeo Itoh ,  Kenji Nawamaki

IPC分类号： H05F3/00 ,  C01B15/01

CPC分类号： B82Y30/00 ,  B82Y10/00 ,  B82Y40/00 ,  C01B32/162 ,  C23C16/26 ,  C23C16/509 ,  D01F9/127 ,  H01J2201/30469 ,  Y10S977/742 ,  Y10S977/844 ,  Y10S977/952

摘要： The present invention provides carbon nanotubes perpendicularly and densely deposited over a wide area of a substrate. The carbon nanotubes are manufactured by supplying alternating-current power at a specific frequency between an anode and a cathode disposed in a reactor, and causing plasma to be generated between the anode and the cathode by introducing mixed gas containing an aliphatic hydrocarbon having 1-5 carbon atoms and hydrogen or mixed gas containing an aromatic hydrocarbon and hydrogen. The substrate is disposed between the anode and the cathode and held at a distance two times or less of the mean free path of a hydrocarbon cation from the anode.

公开(公告)号：US4999280A

公开(公告)日：1991-03-12

申请号：US324849

申请日：1989-03-17

申请人： Hiroyuki Hiraoka

发明人： Hiroyuki Hiraoka

IPC分类号： G03F7/11 ,  G03F7/38 ,  G03F7/40 ,  H01L21/027

CPC分类号： G03F7/405

摘要： Photoresist images are made resistant to reactive ion etching by treating them with a poly(dimethylsilazane).

公开(公告)号：US4875124A

公开(公告)日：1989-10-17

申请号：US182535

申请日：1988-04-18

申请人： Heidi L. Dickstein ,  Hiroyuki Hiraoka ,  James H. Lee

发明人： Heidi L. Dickstein ,  Hiroyuki Hiraoka ,  James H. Lee

IPC分类号： G11B5/17 ,  G11B5/31

CPC分类号： G11B5/31

摘要： A thin film magnetic head is provided in which the electrical insulation surrounding the conductive coil comprises a photosensitive resin which has been crosslinked by a thermally activated crosslinking agent or promotor. The addition of the thermally activated crosslinking agent or promotor greatly reduces both the cure temperature and cure time and results in enhanced dimensional stability without any deleterious effects.

公开(公告)号：US4690838A

公开(公告)日：1987-09-01

申请号：US899589

申请日：1986-08-25

申请人： Hiroyuki Hiraoka ,  Jeffrey W. Labadie ,  James H. Lee ,  Scott A. MacDonald ,  Carlton G. Willson

发明人： Hiroyuki Hiraoka ,  Jeffrey W. Labadie ,  James H. Lee ,  Scott A. MacDonald ,  Carlton G. Willson

IPC分类号： H01L21/302 ,  G03F7/40 ,  H01L21/027 ,  H01L21/3065 ,  G03C5/00 ,  B05D3/04

CPC分类号： G03F7/405

摘要： The reactive ion etching and thermal flow resistance of a resist image is enhanced by contacting the resist image with an alkyl metal compound of magnesium or aluminum.

公开(公告)号：US4464460A

公开(公告)日：1984-08-07

申请号：US508644

申请日：1983-06-28

申请人： Hiroyuki Hiraoka ,  Donald C. Hofer ,  Robert D. Miller ,  Lester A. Pederson ,  Carlton G. Willson

发明人： Hiroyuki Hiraoka ,  Donald C. Hofer ,  Robert D. Miller ,  Lester A. Pederson ,  Carlton G. Willson

IPC分类号： G03C5/00 ,  G03F7/075 ,  G03F7/09 ,  G03F7/26 ,  H01L21/027

CPC分类号： G03F7/094 ,  G03F7/0754

摘要： A process for making an image oxygen-reactive ion etch barrier using a polysilane that is resistant to resistive ion etching and is also a positive acting resist.

摘要翻译： 使用耐电阻离子蚀刻的聚硅烷制造图像氧反应离子蚀刻阻挡层的方法，也是正性抗蚀剂。

公开(公告)号：US4507331A

公开(公告)日：1985-03-26

申请号：US560638

申请日：1983-12-12

申请人： Hiroyuki Hiraoka

发明人： Hiroyuki Hiraoka

IPC分类号： H01L21/027 ,  G03F7/075 ,  G03F7/09 ,  G03F7/20 ,  G03F7/26 ,  G03F7/30 ,  H01L21/30 ,  H01L21/311 ,  B05D3/06

CPC分类号： H01L21/31138 ,  G03F7/094 ,  H01L21/31144

摘要： A dry process for forming a positive tone micro pattern by coating a substrate with an organic polymer film then with a film of an oxygen etch barrier, selected from the group consisting of films of organometallic, including organosilicon compounds and metals, exposing the etch barrier film to a low energy proton beam in a patternwise manner, and developing the pattern by means of oxygen reactive ion etching.

摘要翻译： 一种用于通过用有机聚合物膜涂覆基底然后用氧蚀刻屏障的膜选择由有机金属的膜（包括有机硅化合物和金属）暴露蚀刻阻挡膜而形成正色调微图案的干法 以图案方式连接到低能量质子束，并通过氧反应离子蚀刻显影图案。

公开(公告)号：US4482427A

公开(公告)日：1984-11-13

申请号：US612189

申请日：1984-05-21

申请人： Hiroyuki Hiraoka

发明人： Hiroyuki Hiraoka

IPC分类号： H01L21/302 ,  H01L21/3065 ,  H01L21/311 ,  H05K3/00 ,  B44C1/22 ,  B29C17/08 ,  C03C15/00 ,  C03C25/06

CPC分类号： H01L21/31138 ,  H05K3/0017

摘要： A dry process for forming via holes with sloped walls by oxygen reactive ion etching through a perforated mask.

摘要翻译： 用于通过穿孔掩模通过氧反应离子蚀刻形成具有倾斜壁的通孔的干法。

公开(公告)号：US4379826A

公开(公告)日：1983-04-12

申请号：US298138

申请日：1981-08-31

申请人： James Economy ,  Roy J. Gritter ,  Hiroyuki Hiraoka

发明人： James Economy ,  Roy J. Gritter ,  Hiroyuki Hiraoka

IPC分类号： G03C1/72 ,  C08G8/00 ,  G03F7/039 ,  G03C1/58 ,  G03C5/00 ,  G03C5/22 ,  G03C5/34

CPC分类号： G03F7/039

摘要： The sensitivity of a positive working electron beam resist is increased by using as the resist material a resin which is a condensation product of formaldehyde with a phenol or a cresol having a chloro substituent ortho to the hydroxyl group on its aromatic ring.

摘要翻译： 通过使用作为抗氧化剂材料的树脂作为抗氧化剂材料，通过使用甲醛与苯酚或其芳环上具有羟基的氯取代基的甲酚的缩合产物来提高正电加工电子束抗蚀剂的灵敏度。