Electrolytic capacitor and method of manufacturing the same
    1.
    发明授权
    Electrolytic capacitor and method of manufacturing the same 有权
    电解电容器及其制造方法

    公开(公告)号:US08767377B2

    公开(公告)日:2014-07-01

    申请号:US13549640

    申请日:2012-07-16

    IPC分类号: H01G9/02 H01G4/32

    摘要: An electrolytic capacitor includes a capacitor element and an electrolyte solution impregnated into the capacitor element. The capacitor element includes an anode foil, cathode foil, separator, and a solid electrolytic layer. The anode foil has a dielectric layer on its surface, and the cathode foil confronts the anode foil. The separator is interposed between the anode foil and the cathode foil. The solid electrolytic layer is formed on the surfaces of the anode foil, cathode foil, and separator as an aggregate of fine particles of conductive polymer. The separator has an air-tightness not greater than 2.0 s/100 ml. Sizes of the fine particles measure not greater than 100 nm in diameter, and the fine particles are contained in an amount ranging from 0.3 mg/cm2 to 1.2 mg/cm2 converted to amounts per unit area of the anode foil.

    摘要翻译: 电解电容器包括电容器元件和浸入电容元件的电解液。 电容器元件包括阳极箔,阴极箔,隔板和固体电解质层。 阳极箔在其表面上具有介电层,阴极箔面对阳极箔。 分离器介于阳极箔和阴极箔之间。 固体电解质层形成在阳极箔,阴极箔和隔膜的表面上,作为导电聚合物的细颗粒的聚集体。 隔膜具有不大于2.0s / 100ml的气密性。 细颗粒的尺寸直径不大于100nm,微粒的含量为0.3mg / cm 2至1.2mg / cm 2,转化为阳极箔的每单位面积的量。

    Plasma processing apparatus
    2.
    发明授权
    Plasma processing apparatus 有权
    等离子体处理装置

    公开(公告)号:US08608902B2

    公开(公告)日:2013-12-17

    申请号:US12686060

    申请日:2010-01-12

    IPC分类号: H01L21/306 C23C16/00

    摘要: A vertical plasma processing apparatus for performing a plasma process on a plurality of target objects together at a time includes an activation mechanism configured to turn a process gas into plasma. The activation mechanism includes a vertically elongated plasma generation box attached to a process container at a position corresponding to a process field and confining a plasma generation area airtightly communicating with the process field, an ICP electrode disposed outside the plasma generation box and extending in a longitudinal direction of the plasma generation box, and an RF power supply connected to the ICP electrode. The ICP electrode includes a separated portion separated from a wall surface of the plasma generation box by a predetermined distance.

    摘要翻译: 一次在一起对多个目标物体进行等离子体处理的垂直等离子体处理装置包括将处理气体转换为等离子体的启动机构。 激活机构包括垂直延长的等离子体生成箱,其在对应于处理场的位置处附接到处理容器,并限制与过程场气密地通信的等离子体产生区域; ICP电极,设置在等离子体生成箱的外部并且沿纵向延伸 等离子体生成箱的方向,以及与ICP电极连接的RF电源。 ICP电极包括与等离子体发生箱的壁面隔开预定距离的分离部分。

    FILM FORMATION APPARATUS FOR SEMICONDUCTOR PROCESS AND METHOD FOR USING THE SAME
    3.
    发明申请
    FILM FORMATION APPARATUS FOR SEMICONDUCTOR PROCESS AND METHOD FOR USING THE SAME 有权
    用于半导体工艺的膜形成装置及其使用方法

    公开(公告)号:US20120263888A1

    公开(公告)日:2012-10-18

    申请号:US13530941

    申请日:2012-06-22

    申请人: Hiroyuki MATSUURA

    发明人: Hiroyuki MATSUURA

    IPC分类号: C23C16/34 C23C16/50 C23C16/52

    摘要: A method is provided for using a film formation apparatus including a process container having an inner surface, which contains as a main component a material selected from the group consisting of quartz and silicon carbide. The method includes performing a film formation process to form a silicon nitride film on a product target substrate inside the process container, and then, unloading the product target substrate from the process container. Thereafter, the method includes supplying an oxidizing gas into the process container with no product target substrate accommodated therein, thereby performing an oxidation process to change by-product films deposited on the inner surface of the process container into a composition richer in oxygen than nitrogen, at a part of the by-product films from a surface thereof to a predetermined depth.

    摘要翻译: 提供了一种使用成膜装置的方法,该成膜装置包括具有内表面的处理容器,该内表面含有选自石英和碳化硅的材料作为主要成分。 该方法包括进行成膜工艺以在处理容器内部的产品目标基材上形成氮化硅膜,然后从处理容器卸载产品目标衬底。 此后,该方法包括将氧化气体供应到处理容器中,其中没有容纳产品目标衬底,从而进行氧化处理以将沉积在处理容器内表面上的副产物膜变成比氮气更富氧的组合物, 在副产物膜的一部分从其表面到预定深度。

    SUBSTRATE SUPPORT INSTRUMENT, AND VERTICAL HEAT TREATMENT APPARATUS AND DRIVING METHOD THEREOF
    4.
    发明申请
    SUBSTRATE SUPPORT INSTRUMENT, AND VERTICAL HEAT TREATMENT APPARATUS AND DRIVING METHOD THEREOF 审中-公开
    基板支撑仪器及垂直热处理装置及其驱动方法

    公开(公告)号:US20120258414A1

    公开(公告)日:2012-10-11

    申请号:US13441519

    申请日:2012-04-06

    CPC分类号: H01L21/67303 H01L21/67309

    摘要: A substrate support instrument includes a first support instrument portion and a second support instrument portion detachably combined with each other. Each of the first support instrument portion and second support instrument portion includes: a ceiling plate and a bottom plate facing each other upward and downward; a support pillar disposed in plurality along a peripheral edge portion of each of the ceiling plate and bottom plate, and configured to connect the ceiling plate and the bottom plate; and a support part disposed at a position corresponding to each of the support pillars, and configured to support a bottom of each substrate. In the support part, a height position is set such that a substrate supported in the first support instrument portion and a substrate supported in the second support instrument portion are alternately arranged, when the first support instrument portion is combined with the second support instrument portion.

    摘要翻译: 基板支撑器具包括可拆卸地组合的第一支撑器具部分和第二支撑器具部分。 第一支撑器具部分和第二支撑器具部分中的每一个包括:顶板和底板,它们彼此上下相对; 支撑柱,其沿着顶板和底板的每个的周缘部分多个设置,并且被构造成连接顶板和底板; 以及支撑部,其设置在与每个支撑柱对应的位置,并且被配置为支撑每个基板的底部。 在支撑部分中,当第一支撑器具部分与第二支撑器具部分组合时,设置高度位置使得支撑在第一支撑器具部分中的基底和支撑在第二支撑器具部分中的基底交替地布置。

    LOADING UNIT AND PROCESSING SYSTEM
    5.
    发明申请
    LOADING UNIT AND PROCESSING SYSTEM 审中-公开
    加载单元和处理系统

    公开(公告)号:US20120251967A1

    公开(公告)日:2012-10-04

    申请号:US13408514

    申请日:2012-02-29

    申请人: Hiroyuki MATSUURA

    发明人: Hiroyuki MATSUURA

    IPC分类号: F27D1/00 B65G25/00

    摘要: A loading unit is provided under a processing unit for performing a thermal treatment process on a substrate, loads/unloads a substrate holding mechanism by which substrates are held to the processing unit, and transfers the substrates to the substrate holding mechanism. The loading unit includes a loading case provided to be connected to the processing unit and surrounds the entire processing unit; an elevator mechanism that has a holding arm for holding a lower portion of the substrate holding mechanism and moves up/down the substrate holding mechanism; a substrate transfer mechanism which transfers the substrates to the substrate holding mechanism; and a substrate holding mechanism accommodating recess portion provided in a lower portion of the loading case corresponding to the lower portion of the substrate holding mechanism and is provided to protrude downward to accommodate a lower end portion of the substrate holding mechanism.

    摘要翻译: 在用于对基板进行热处理处理的处理单元下方设置有加载单元,对基板保持机构进行加载/卸载,将基板保持在处理单元上,并将基板传送到基板保持机构。 装载单元包括设置成连接到处理单元并围绕整个处理单元的装载箱; 电梯机构,其具有用于保持所述基板保持机构的下部并且使所述基板保持机构上下移动的保持臂; 将基板传送到基板保持机构的基板输送机构; 以及基板保持机构容纳凹部,其设置在所述装载壳体的与所述基板保持机构的下部对应的下部,并且设置成向下方突出以容纳所述基板保持机构的下端部。

    SUBSTRATE TRANSFER APPARATUS AND SUBSTRATE TRANSFER METHOD
    6.
    发明申请
    SUBSTRATE TRANSFER APPARATUS AND SUBSTRATE TRANSFER METHOD 审中-公开
    基板传输装置和基板传输方法

    公开(公告)号:US20120249992A1

    公开(公告)日:2012-10-04

    申请号:US13433769

    申请日:2012-03-29

    IPC分类号: G03B27/58

    CPC分类号: H01L21/68707

    摘要: A substrate transfer apparatus includes: a transfer base; a plate-like holding member which is configured to hold a substrate and which is horizontally movable back and forth with respect to the transfer base; a piezoelectric body mounted to the holding member and which, when a voltage is applied thereto, contracts or elongates to apply a bending stress to the holding member; and a power supply configured to apply a voltage to the piezoelectric body so as to apply a bending stress, which counteracts deflection that has occurred in the holding member, is applied to the holding member.

    摘要翻译: 基板转印装置包括:转印基底; 板状保持构件,其被配置为保持基板并相对于所述转印基座来回水平移动; 安装在所述保持构件上的压电体,当施加电压时,所述压电体收缩或伸长以对所述保持构件施加弯曲应力; 以及被配置为向所述压电体施加电压以施加与所述保持构件中发生的偏转抵抗的弯曲应力的电源施加到所述保持构件。

    Air conditioner control device
    8.
    发明授权
    Air conditioner control device 有权
    空调控制装置

    公开(公告)号:US08033125B2

    公开(公告)日:2011-10-11

    申请号:US12306757

    申请日:2007-07-04

    摘要: A control device includes a microcomputer and a storage element. The microcomputer is configured to execute an inspection operation mode in which an air conditioner is operated in inspection process in a manufacturing site, and a normal operation mode in which the air conditioner is operated at an installation site. When the operation state of the air conditioner fails to satisfy predetermined conditions, the microcomputer is configured to confirm that there is an error, and abnormally stop the air conditioner. When the air conditioner is abnormally stopped, the microcomputer is configured to cause the storage element to store predetermined operation information obtained during a period until abnormal stoppage of the air conditioner and to store the operation mode being executed at the time of occurrence of the error in the air conditioner.

    摘要翻译: 控制装置包括微型计算机和存储元件。 微型计算机被配置为执行在制造现场的检查过程中空调器运行的检查操作模式以及在安装地点操作空调的正常操作模式。 当空调器的运行状态不能满足预定条件时,微型计算机被配置为确认存在错误并且异常地停止空调。 当空调器异常停止时,微型计算机被配置为使存储元件存储在空调的异常停止期间获得的预定操作信息,并将在错误发生时执行的操作模式存储在 空调。

    Delay interferometer and demodulator
    10.
    发明授权
    Delay interferometer and demodulator 有权
    延迟干涉仪和解调器

    公开(公告)号:US07848662B2

    公开(公告)日:2010-12-07

    申请号:US11797436

    申请日:2007-05-03

    CPC分类号: H04L27/223 H04B10/66

    摘要: A delay interferometer and a demodulator including the delay interferometer and a balanced photodetector are provided. A half mirror splits an optical signal into first and second split beams of light which travel on first and second optical paths, respectively. A first reflector being disposed on the first optical path reflects the first split beam of light toward the half mirror. The second reflector being disposed on the second optical path reflects the second split beam of light toward the half mirror. At least one phase compensator being disposed between the half mirror and at least one of the first and second reflectors includes a medium that exhibits thermooptic effect and has temperature dependency of refractive index. The half mirror couples the first and second split beams of light to generate at least first and second coupled beams of light.

    摘要翻译: 提供了延迟干涉仪和包括延迟干涉仪和平衡光电检测器的解调器。 半镜分别将光信号分离成在第一和第二光路上行进的第一和第二分束光束。 设置在第一光路上的第一反射器将第一分束光朝向半反射镜反射。 设置在第二光路上的第二反射器将第二分束光朝向半反射镜反射。 设置在半反射镜和第一反射器和第二反射器中的至少一个之间的至少一个相位补偿器包括呈现光光效应并且具有折射率的温度依赖性的介质。 半反射镜耦合第一和第二分束光以产生至少第一和第二耦合光束。