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    Method of manufacturing trench isolation
    2.
    发明授权
    Method of manufacturing trench isolation 失效
    制造沟槽隔离的方法

    公开(公告)号：US5387539A

    公开(公告)日：1995-02-07

    申请号：US79673

    申请日：1993-06-18

    申请人： Hong S. Yang ,  Sung K. Kwon

    发明人： Hong S. Yang ,  Sung K. Kwon

    IPC分类号： H01L21/76 ,  H01L21/762 ,  H01L21/302

    CPC分类号： H01L21/76229

    摘要： A method of manufacturing a trench isolation comprising the steps of sequentially forming a first oxide layer a nitride layer and a first photoresist layer, forming a narrow trench and a wide trench, forming a first thermal oxide layer in the side and bottom face of trenches, forming a second oxide layer, depositing a first polysilicon oxide layer filling in the narrow trench by growing the first polysilicon layer growing into a second silicon layer, forming a third oxide layer, coating a second photoresist on the wide trench, and etching a third oxide layer. The present invention can provide a method of manufacturing a trench isolation which can prevent formation of voids in the narrow trench and the difference of height between narrow trench and wide trench, thereby preventing a conducting line short circuit and an increase of parasitic capacitance and a fall of the characteristic of the MOS transistor.

    摘要翻译： 一种制造沟槽隔离的方法，包括以下步骤：顺序地形成第一氧化物层氮化物层和第一光致抗蚀剂层，形成窄沟槽和宽沟槽，在沟槽的侧面和底面形成第一热氧化物层， 形成第二氧化物层，通过生长生长到第二硅层中的第一多晶硅层，形成第三氧化物层，在宽沟槽上涂覆第二光致抗蚀剂，以及蚀刻第三氧化物，沉积填充在窄沟槽中的第一多晶硅氧化物层 层。 本发明可以提供一种制造沟槽隔离的方法，其可以防止窄沟槽中的空隙形成和窄沟槽与宽沟槽之间的高度差，从而防止导线短路和寄生电容的增加以及下降 的MOS晶体管的特性。

    POSITION CONTROLLED DUAL MAGNETRON
    5.
    发明申请
    POSITION CONTROLLED DUAL MAGNETRON 有权
    位置控制双磁铁

    公开(公告)号：US20080099329A1

    公开(公告)日：2008-05-01

    申请号：US11553880

    申请日：2006-10-27

    申请人： Cristopher M. Pavloff ,  Winsor Lam ,  Tza-Jing Gung ,  Hong S. Yang ,  Ilyoung Richard Hong

    发明人： Cristopher M. Pavloff ,  Winsor Lam ,  Tza-Jing Gung ,  Hong S. Yang ,  Ilyoung Richard Hong

    IPC分类号： C23C14/00

    CPC分类号： C23C14/35 ,  H01J37/3408 ,  H01J37/3452 ,  H01J37/3455

    摘要： A dual magnetron for plasma sputtering including a source magnetron and an auxiliary magnetron, each of which rotate about the center of the target at respective radii. The positions of the magnetron can be moved in complementary radial directions between sputter deposition and target cleaning. The magnetrons have different characteristics of size, strength, and imbalance. The source magnetron is smaller, stronger, and unbalanced source magnetron and is positioned near the edge of the wafer in sputter deposition and etching. The auxiliary magnetron is larger, weak, and more balanced and used for cleaning the center of the target and guiding sputter ions from the source magnetron in sputter deposition. Each magnetron may have its plasma shorted out in its radially outer position.

    摘要翻译： 一种用于等离子体溅射的双磁控管，包括源磁控管和辅助磁控管，每个磁控管以相应的半径围绕靶的中心旋转。 磁控管的位置可以在溅射沉积和目标清洁之间沿互补的径向移动。 磁控管具有不同的尺寸，强度和不平衡特性。 源极磁控管是较小，较强和不平衡的源磁控管，并且在溅射沉积和蚀刻中位于晶片边缘附近。 辅助磁控管较大，弱且更均衡，用于清洁靶的中心并在溅射沉积中引导来自源磁控管的溅射离子。 每个磁控管可以使其等离子体在其径向外部位置短路。

    Mechanism for continuously varying radial position of a magnetron
    6.
    发明申请
    Mechanism for continuously varying radial position of a magnetron 有权
    连续变化磁控管径向位置的机理

    公开(公告)号：US20100243440A1

    公开(公告)日：2010-09-30

    申请号：US12794452

    申请日：2010-06-04

    申请人： Keith A. Miller ,  Anantha K. Subramani ,  Maurice E. Ewert ,  Tza Jing Gung ,  Hong S. Yang ,  Vincent E. Burkhart

    发明人： Keith A. Miller ,  Anantha K. Subramani ,  Maurice E. Ewert ,  Tza Jing Gung ,  Hong S. Yang ,  Vincent E. Burkhart

    IPC分类号： C23C14/35

    CPC分类号： H01J37/3455 ,  C23C14/35 ,  H01J37/3408

    摘要： A continuously variable multi-position magnetron that is rotated about a central axis in back of a sputtering target at a freely selected radius. The position is dynamically controlled from the outside, for example, through a hydraulic actuator connected between a pivoting arm supporting the magnetron and an arm fixed to the shaft, by two coaxial shafts independent controllable from the outside and supporting the magnetron through a frog-leg mechanism, or a cable connected between the pivoting arms and moved by an external slider. The magnetron can be rotated at two, three, or more discrete radii or be moved in a continuous spiral pattern.

    摘要翻译： 一种连续可变的多位磁控管，其以可自由选择的半径在溅射靶的背面绕中心轴旋转。 该位置从外部动态地控制，例如通过连接在支撑磁控管的枢转臂和固定到轴的臂之间的液压致动器，通过两个独立可从外部控制的同轴轴并且通过青蛙支撑磁控管 机构或连接在枢转臂之间并由外部滑块移动的电缆。 磁控管可以以两个，三个或更多个离散的半径旋转或以连续的螺旋图案移动。

    Position controlled dual magnetron
    7.
    发明授权
    Position controlled dual magnetron 有权
    位置控制双磁控管

    公开(公告)号：US07767064B2

    公开(公告)日：2010-08-03

    申请号：US11553880

    申请日：2006-10-27

    申请人： Cristopher M. Pavloff ,  Winsor Lam ,  Tza-Jing Gung ,  Hong S. Yang ,  Ilyoung Richard Hong

    发明人： Cristopher M. Pavloff ,  Winsor Lam ,  Tza-Jing Gung ,  Hong S. Yang ,  Ilyoung Richard Hong

    IPC分类号： C23C14/00

    CPC分类号： C23C14/35 ,  H01J37/3408 ,  H01J37/3452 ,  H01J37/3455

    摘要： A dual magnetron for plasma sputtering including a source magnetron and an auxiliary magnetron, each of which rotate about the center of the target at respective radii. The positions of the magnetron can be moved in complementary radial directions between sputter deposition and target cleaning. The magnetrons have different characteristics of size, strength, and imbalance. The source magnetron is smaller, stronger, and unbalanced source magnetron and is positioned near the edge of the wafer in sputter deposition and etching. The auxiliary magnetron is larger, weak, and more balanced and used for cleaning the center of the target and guiding sputter ions from the source magnetron in sputter deposition. Each magnetron may have its plasma shorted out in its radially outer position.

    摘要翻译： 一种用于等离子体溅射的双磁控管，包括源磁控管和辅助磁控管，每个磁控管以相应的半径围绕靶的中心旋转。 磁控管的位置可以在溅射沉积和目标清洁之间沿互补的径向移动。 磁控管具有不同的尺寸，强度和不平衡特性。 源极磁控管是较小，较强和不平衡的源磁控管，并且在溅射沉积和蚀刻中位于晶片边缘附近。 辅助磁控管较大，弱且更均衡，用于清洁靶的中心并在溅射沉积中引导来自源磁控管的溅射离子。 每个磁控管可以使其等离子体在其径向外部位置短路。

    Multi-track magnetron exhibiting more uniform deposition and reduced rotational asymmetry
    8.
    发明授权
    Multi-track magnetron exhibiting more uniform deposition and reduced rotational asymmetry 有权
    多轨磁控管具有更均匀的沉积和减小的旋转不对称性

    公开(公告)号：US07186319B2

    公开(公告)日：2007-03-06

    申请号：US11029641

    申请日：2005-01-05

    申请人： Hong S. Yang ,  Tza-Jing Gung ,  Jian-Xin Lei ,  Ted Guo

    发明人： Hong S. Yang ,  Tza-Jing Gung ,  Jian-Xin Lei ,  Ted Guo

    IPC分类号： C23C14/35

    CPC分类号： H01J37/3408 ,  H01J37/3405

    摘要： A multi-track magnetron having a convolute shape and asymmetric about the target center about which it rotates. A plasma track is formed as a closed loop between opposed inner and outer magnetic poles, preferably as two or three radially arranged and spirally shaped counter-propagating tracks with respect to the target center and preferably passing over the rotation axis. The pole shape may be optimized to produce a cumulative track length distribution conforming to the function L=arn. After several iterations of computerized optimization, the pole shape may be tested for sputtering uniformity with different distributions of magnets in the fabricated pole pieces. If the uniformity remains unsatisfactory, the design iteration is repeated with a different n value, different number of tracks, or different pole widths. The optimization reduces azimuthal sidewall asymmetry and improves radial deposition uniformity.

    摘要翻译： 具有卷绕形状且围绕其旋转的目标中心不对称的多轨磁控管。 等离子体轨道形成为相对的内部和外部磁极之间的闭合回路，优选地相对于目标中心并且优选地通过旋转轴线而形成为两个或三个径向布置且螺旋形的反向传播轨迹。 极点形状可以被优化以产生符合函数L = ar 的累积轨迹长度分布。 经过数次迭代的计算机化优化，可以测试极点形状，使其在制造的极片中具有不同的磁体分布的溅射均匀性。 如果均匀性不能令人满意，则使用不同的n值，不同数量的轨道或不同的极宽重复设计迭代。 优化可减少方位角侧壁不对称性，提高径向沉积均匀性。

    Iron with Magnetic Heel Rest to Prevent Tipping
    10.
    发明申请
    Iron with Magnetic Heel Rest to Prevent Tipping 有权
    熨斗与磁性脚跟防止倾倒

    公开(公告)号：US20120023790A1

    公开(公告)日：2012-02-02

    申请号：US12844753

    申请日：2010-07-27

    申请人： Hong S. Yang

    发明人： Hong S. Yang

    IPC分类号： D06F75/40 ,  D06F79/00 ,  D06F75/36

    CPC分类号： D06F75/40 ,  D06F75/36

    摘要： A hand-held cloth iron becomes very hot while in use. Even when cool, it is heavy and has sharp corners. Any of these characteristics can cause injury or damage if the iron falls. An improved iron includes a heel rest connected to the rear of the iron body. One or more permanent magnet pieces embedded in the heel rest produce a magnetic pull force between the magnets and the ferromagnetic steel top of an ironing board when the iron is stood on its heel. The magnets are strong enough to stabilize the iron, even on a board with a padded cover, without impractically impeding the operator's normal ironing motions. The magnetic rear plate can either be coplanar or slightly recessed with respect to the outer surface of the heel rest, and the amount of recess can be made adjustable by mechanical means so that the magnetic pull force between the magnetic heel rest and the ferromagnetic steel top of an ironing board can be adjusted by a user to suit his or her preference.

    摘要翻译： 手持布铁在使用时变得很热。 即使很酷，它很重，有尖角。 如果铁坠落，这些特性中的任何一种都会造成伤害或损坏。 改进的熨斗包括连接到熨斗本体后部的脚后跟。 一块或多块永久性的磁铁片嵌入到脚后跟中，当熨斗放在脚跟上时，会在磁铁和熨衣板的铁磁性钢制顶部之间产生磁拉力。 这些磁铁足够坚固，即使在带有衬垫盖的电路板上也不会妨碍操作员的正常熨烫运动。 磁性后板可以相对于后跟的外表面共面或稍微凹陷，并且可以通过机械装置使凹陷量可调，使得磁脚跟和铁磁钢顶之间的磁拉力 熨烫板可以由用户调整以适应他或她的喜好。