Method of etching molybdenum metal from substrates
    1.
    发明授权
    Method of etching molybdenum metal from substrates 失效
    从基材上蚀刻钼金属的方法

    公开(公告)号:US06221269B1

    公开(公告)日:2001-04-24

    申请号:US09233384

    申请日:1999-01-19

    IPC分类号: C03C1500

    摘要: A method is provided for etching and removing extraneous molybdenum or debris on ceramic substrates such as semiconductor devices and also for molybdenum etching in the fabrication of molybdenum photomasks. The method employs a multi-step process using an acidic aqueous solution of a ferric salt to remove (etch) the molybdenum debris followed by contacting the treated substrate with an organic quaternary ammonium hydroxide to remove any molybdenum black oxides which may have formed on the exposed surface of treated molybdenum features in ceramic substrates. The method is environmentally safe and the waste solutions may be easily waste treated for example by precipitating the ferric salts as ferric hydroxide and removing anions such as sulfate by precipitation with lime. The method replaces the currently used method of employing ferricyanide salts which create serious hazardous waste disposal and environmental problems.

    摘要翻译: 提供了一种用于在陶瓷衬底(例如半导体器件)上蚀刻和去除外来的钼或碎片以及在钼光掩模的制造中用于钼蚀刻的方法。 该方法采用多步法,使用酸式的铁盐水溶液去除(蚀刻)钼碎片,随后将经处理的底物与有机季铵氢氧化物接触以除去可能形成于暴露的钼黑氧化物 处理的钼特征在陶瓷衬底中的表面。 该方法是环境安全的,并且废溶液可以容易地被废物处理,例如通过将铁盐沉淀为氢氧化铁并通过用石灰沉淀除去诸如硫酸盐的阴离子。 该方法取代了目前使用的铁氰化物盐的方法,造成严重的危险废物处理和环境问题。