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公开(公告)号:US12062531B2
公开(公告)日:2024-08-13
申请号:US17311963
申请日:2020-04-07
Inventor: Dominik Wagner
CPC classification number: H01J37/347 , C23C14/35 , H01J37/3405 , H01J37/3455 , H01J2237/332
Abstract: A method and a system for adjustable coating on a substrate using a magnetron sputtering apparatus are provided. The method comprises the steps of providing a magnetron assembly which comprises a plurality of magnets attached to a plurality of yokes and a plurality of actuating mechanisms (208), each operatively coupled to at least one of the plurality of yokes. The method further comprises automatically determining individual positions of each of the plurality of yokes of the magnetron assembly on the basis of at least one parameter, and adjusting individually positions of each of the plurality of yokes of the magnetron assembly in accordance with the automatically determined individual positions.