摘要:
Multiple rays such as scattered lights and fluorescent lights emitted radially in a variety of directions from each bright point in a measurement area enter an objective lens, where the multiple rays are converted into a parallel beam. The parallel beam is reflected by both a reference mirror unit and an oblique mirror unit, and the reflected beams pass through an imaging lens to form an interference image on a light-receiving surface of a detection unit. The detection of the light intensity of the interference image on the light-receiving surface enables an acquisition of the interferogram (the waveform of the change of imaging intensity) in which the light intensity continuously changes. By Fourier-converting the interferogram, spectral characteristics can be obtained which show the relative intensities for each wavelength of the lights emitted from one bright point of an object to be measured.
摘要:
A linearly polarized light reaches a sample S through a polarizer and receives a retardation from the sample S. Then, the light reaches a movable mirror unit and a fixed mirror unit of a phase shifter through a first polarizing plate and a second polarizing plate. Then, the reflected measurement lights pass through an analyzer, and are caused by an imaging lens to form an interference image on the light-receiving surface of a detector. At this time, an optical path length difference between a beam reflected on the movable mirror unit and a beam reflected on the fixed mirror unit is continuously changed the movable mirror unit. Hence, the imaging intensity of the interference image detected by the detector continuously changes producing a synthetic waveform similar to an interferogram. The synthetic waveform is Fourier-transformed, to obtain an amplitude per wavelength and a birefringent phase difference per wavelength.
摘要:
A defect inspection apparatus including: a first illumination optical system which is configured to illuminate the inspection area on a sample surface from a normal line direction or a direction near thereof with respect to said sample surface; a second illumination optical system which is configured to illuminate said inspection area from a slant direction with respect to said sample surface; a detection optical system having a plurality of first detectors which are located, in front of, on the sides of, and behind said inspection area, respectively, with respect to the illumination direction of said second illumination optical system, and where the regular reflected light component, from said sample surface, by illumination light of said second illumination optical system, is not converged; and a signal processing system which is configured to inspect a defect, upon basis of signals obtained from said plurality of first detectors.
摘要:
The invention provides a surface inspection apparatus and a method for inspecting the surface of a sample that are capable of inspecting discriminatingly between the scratch of various configuration and the adhered foreign object that occur on the surface of a work target when the work target (for example, an insulating film on a semiconductor substrate) is subjected to polishing process such as CMP or grinding process in semiconductor manufacturing process or magnetic head manufacturing process. In the invention, the scratch and foreign object that occur on the polished or ground surface of the sample is epi-illuminated and slant-illuminated by use of approximately same light flux, the difference between the scattered light intensity emitted from the shallow scratch and that from the foreign object when epi-illumination is applied and slant illumination is applied to thereby discriminate between the shallow scratch and the foreign object, and the directionality of the scattered light when the epi-illumination is applied and the slant illumination is applied is detected to thereby discriminate between the linear scratch and the foreign object.
摘要:
Multiple rays such as scattered lights and fluorescent lights emitted radially in a variety of directions from each bright point in a measurement area enter an objective lens, where the multiple rays are converted into a parallel beam. The parallel beam is reflected by both a reference mirror unit and an oblique mirror unit, and the reflected beams pass through an imaging lens to form an interference image on a light-receiving surface of a detection unit. The detection of the light intensity of the interference image on the light-receiving surface enables an acquisition of the interferogram (the waveform of the change of imaging intensity) in which the light intensity continuously changes. By Fourier-converting the interferogram, spectral characteristics can be obtained which show the relative intensities for each wavelength of the lights emitted from one bright point of an object to be measured.
摘要:
An apparatus for detecting defects, including: a table unit which mounts a specimen to be inspected having a linearly moving stage and a rotationally moving stage; a first illumination optical unit which illuminates an inspection region of a surface of the specimen from a normal direction or in the vicinity of the normal direction while the specimen is rotating by the rotationally moving stage and moving in one direction by the linearly moving stage; a second illumination optical unit which illuminates the inspection region from a first elevation angle toward the inspection region while the specimen is rotating and moving; a first detection optical unit which detects light reflected from the inspection region by the illumination of the first illumination optical unit or the second illumination optical unit with plural detectors arranged in plural portions of a second elevation angle toward the inspection region; a second detection optical unit which detects light reflected from the inspection region by the illumination of the first illumination optical unit or the second illumination optical unit with plural detectors arranged in plural portions of a third elevation angle toward the inspection region; and a signal processor which processes signals outputted from the plural detectors of the first detection optical unit and the plural detectors of the second detection optical unit, wherein the plural detectors of the first detection optical unit and the plural detectors of the second detection optical unit are photomultipliers, and the signal processor processes the signals which are selected from the signals outputted from the plural detectors arranged in plural portions of the second elevation angle and the plural detectors arranged in plural portions of the third elevation angle.
摘要:
An apparatus for detecting defects, including: a first illumination optical unit which illuminates from a normal direction or in the vicinity of the normal direction; a second illumination optical unit which illuminates from a first elevation angle; a first detection optical unit which detects light reflected by the illumination of the first illumination optical unit or the second illumination optical unit with plural detectors; a second detection optical unit which detects light reflected by the illumination of the first illumination optical unit or the second illumination optical unit with plural detectors; wherein the plural detectors of the first detection optical unit and the plural detectors of the second detection optical unit are photomultipliers, and the signal processor processes the signals outputted from the photomultipliers and are adjusted to balance in sensitivities.
摘要:
A linearly polarized light reaches a sample S through a polarizer and receives a retardation from the sample S. Then, the light reaches a movable mirror unit and a fixed mirror unit of a phase shifter through a first polarizing plate and a second polarizing plate. Then, the reflected measurement lights pass through an analyzer, and are caused by an imaging lens to form an interference image on the light-receiving surface of a detector. At this time, an optical path length difference between a beam reflected on the movable mirror unit and a beam reflected on the fixed mirror unit is continuously changed the movable mirror unit. Hence, the imaging intensity of the interference image detected by the detector continuously changes producing a synthetic waveform similar to an interferogram. The synthetic waveform is Fourier-transformed, to obtain an amplitude per wavelength and a birefringent phase difference per wavelength.
摘要:
An apparatus for detecting defects, including: a first illumination optical unit which illuminates from a normal direction or in the vicinity of the normal direction; a second illumination optical unit which illuminates from a first elevation angle; a first detection optical unit which detects light reflected by the illumination of the first illumination optical unit or the second illumination optical unit with plural detectors; a second detection optical unit which detects light reflected by the illumination of the first illumination optical unit or the second illumination optical unit with plural detectors; wherein the plural detectors of the first detection optical unit and the plural detectors of the second detection optical unit are photomultipliers, and the signal processor processes the signals outputted from the photomultipliers and are adjusted to balance in sensitivities.
摘要:
A device for measuring thickness of an object has a vibration generator for generating vibrations in the object, a vibration detector for detecting vibrations generated in the object by the vibration generator and a frequency analyzer for calculating resonance frequency of the object. The vibration generator includes a light-emitting part which emits light towards the object to irradiate and to be absorbed by the object. A plurality of vibration detectors may be used and the frequency analyzer may include a sound speed analyzer for calculating speed of sound inside the object from vibrations detected by these plurality of vibration detectors.