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公开(公告)号：US06852202B2
公开(公告)日：2005-02-08
申请号：US10418710
申请日：2003-04-17
CPC分类号： H01J37/3408 , H01J37/3455
摘要： A small unbalanced magnet assembly is scanned in a retrograde planetary or epicyclic path about the back of a target being plasma sputtered including an orbital rotation about the center axis of the target and a planetary rotation about another axis rotating about the target center axis. The magnet assembly may pass through the target center, thus allowing full target coverage. A geared planetary mechanism may include a rotating drive plate, a fixed center gear, and an idler and a follower gear rotatably supported in the drive plate supporting a cantilevered magnet assembly on the side of the drive plate facing the target. The erosion profile may be controlled by varying the rotation rate through the rotation cycle or by modulating the target power. A second planetary stage may be added or non-circular gears be used. Auxiliary electromagnetic coils may create a focusing magnetic field.
摘要翻译： 小型不平衡磁体组件以逆行星行星或行星路径围绕目标物的背面进行扫描，等离子体溅射包括围绕目标的中心轴线的轨道旋转和围绕围绕目标中心轴线旋转的另一轴线的行星旋转。 磁体组件可以穿过目标中心，从而允许完全的目标覆盖。 齿轮行星机构可以包括旋转驱动板，固定中心齿轮和惰轮以及可旋转地支撑在驱动板中的从动齿轮，该驱动板支撑在与驱动板对置的驱动板侧的悬臂磁体组件。 可以通过改变通过旋转周期的旋转速率或通过调节目标功率来控制侵蚀曲线。 可以添加第二行星级或使用非圆形齿轮。 辅助电磁线圈可产生聚焦磁场。
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公开(公告)号：US08647484B2
公开(公告)日：2014-02-11
申请号：US11558929
申请日：2006-11-12
申请人： Alan Alexander Ritchie , Donny Young , Ilyoung (Richard) Hong , Kathleen A. Scheible , Umesh Kelkar
发明人： Alan Alexander Ritchie , Donny Young , Ilyoung (Richard) Hong , Kathleen A. Scheible , Umesh Kelkar
IPC分类号： C23C14/34
CPC分类号： C23C14/3407 , H01J37/32477 , H01J37/34 , H01J37/3408 , H01J37/3423 , H01J37/3426 , H01J37/3435 , H01J37/3497
摘要： A sputtering chamber has a sputtering target comprising a backing plate and a sputtering plate. The backing plate has a groove. The sputtering plate comprises a cylindrical mesa having a plane, and an annular inclined rim surrounding the cylindrical mesa. In one version, the backing plate comprises a material having a high thermal conductivity and a low electrical resistivity. In another version, the backing plate comprises a backside surface with a single groove or a plurality of grooves.
摘要翻译： 溅射室具有包括背板和溅射板的溅射靶。 背板具有凹槽。 溅射板包括具有平面的圆柱形台面和围绕圆柱形台面的环形倾斜边缘。 在一个版本中，背板包括具有高导热性和低电阻率的材料。 在另一种形式中，背板包括具有单个凹槽或多个凹槽的背面。
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公开(公告)号：US20080099329A1
公开(公告)日：2008-05-01
申请号：US11553880
申请日：2006-10-27
IPC分类号： C23C14/00
CPC分类号： C23C14/35 , H01J37/3408 , H01J37/3452 , H01J37/3455
摘要： A dual magnetron for plasma sputtering including a source magnetron and an auxiliary magnetron, each of which rotate about the center of the target at respective radii. The positions of the magnetron can be moved in complementary radial directions between sputter deposition and target cleaning. The magnetrons have different characteristics of size, strength, and imbalance. The source magnetron is smaller, stronger, and unbalanced source magnetron and is positioned near the edge of the wafer in sputter deposition and etching. The auxiliary magnetron is larger, weak, and more balanced and used for cleaning the center of the target and guiding sputter ions from the source magnetron in sputter deposition. Each magnetron may have its plasma shorted out in its radially outer position.
摘要翻译： 一种用于等离子体溅射的双磁控管，包括源磁控管和辅助磁控管，每个磁控管以相应的半径围绕靶的中心旋转。 磁控管的位置可以在溅射沉积和目标清洁之间沿互补的径向移动。 磁控管具有不同的尺寸，强度和不平衡特性。 源极磁控管是较小，较强和不平衡的源磁控管，并且在溅射沉积和蚀刻中位于晶片边缘附近。 辅助磁控管较大，弱且更均衡，用于清洁靶的中心并在溅射沉积中引导来自源磁控管的溅射离子。 每个磁控管可以使其等离子体在其径向外部位置短路。
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公开(公告)号：US20070173059A1
公开(公告)日：2007-07-26
申请号：US11558928
申请日：2006-11-12
IPC分类号： H01L21/4763
CPC分类号： C23C14/3407 , H01J37/32477 , H01J37/34 , H01J37/3408 , H01J37/3423 , H01J37/3426 , H01J37/3435 , H01J37/3497
摘要： A process kit for a sputtering chamber comprises a deposition ring, cover ring, and a shield assembly, for placement about a substrate support in a sputtering chamber. The deposition ring comprising an annular band with an inner lip extending transversely, a raised ridge substantially parallel to the substrate support, an inner open channel, and a ledge radially outward of the raised ridge. A cover ring at least partially covers the deposition ring, the cover ring comprising an annular plate comprising a footing which rests on a surface about the substrate support, and downwardly extending first and second cylindrical walls.
摘要翻译： 用于溅射室的处理套件包括沉积环，盖环和屏蔽组件，用于放置在溅射室中的衬底支撑件周围。 沉积环包括具有横向延伸的内唇缘的环形带，基本上平行于基底支撑件的凸脊，内开口通道和径向向外突出的凸缘。 盖环至少部分地覆盖沉积环，盖环包括环形板，环形板包括搁置在基板支撑件周围的表面上的基脚以及向下延伸的第一和第二圆柱形壁。
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公开(公告)号：US08790499B2
公开(公告)日：2014-07-29
申请号：US11558928
申请日：2006-11-12
IPC分类号： C23C14/34
CPC分类号： C23C14/3407 , H01J37/32477 , H01J37/34 , H01J37/3408 , H01J37/3423 , H01J37/3426 , H01J37/3435 , H01J37/3497
摘要： A process kit for a sputtering chamber comprises a deposition ring, cover ring, and a shield assembly, for placement about a substrate support in a sputtering chamber. The deposition ring comprising an annular band with an inner lip extending transversely, a raised ridge substantially parallel to the substrate support, an inner open channel, and a ledge radially outward of the raised ridge. A cover ring at least partially covers the deposition ring, the cover ring comprising an annular plate comprising a footing which rests on a surface about the substrate support, and downwardly extending first and second cylindrical walls.
摘要翻译： 用于溅射室的处理套件包括沉积环，盖环和屏蔽组件，用于放置在溅射室中的衬底支撑件周围。 沉积环包括具有横向延伸的内唇缘的环形带，基本上平行于基底支撑件的凸脊，内开口通道和径向向外突出的凸缘。 盖环至少部分地覆盖沉积环，盖环包括环形板，环形板包括搁置在基板支撑件周围的表面上的基脚以及向下延伸的第一和第二圆柱形壁。
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公开(公告)号：US07807030B2
公开(公告)日：2010-10-05
申请号：US11610849
申请日：2006-12-14
IPC分类号： C23C14/35
CPC分类号： H01J37/3455 , C23C14/345 , C23C14/35 , C23C14/355 , H01J37/3405 , H01J37/3408
摘要： A small magnet assembly having a magnet assembly of area less than 10% of the target area, is scanned in a retrograde planetary or epicyclic path about the back of a target being plasma sputtered including an orbital rotation about the center axis of the target and a planetary rotation about another axis rotating about the target center axis. The magnet assembly passes through the target center, thus allowing full target coverage. A properly chosen ratio of the two rotations about respective axes produces a much slower magnet velocity near the target periphery than at the target center. A geared planetary mechanism includes a rotating drive plate, a fixed center gear, and an idler and a follower gear rotatably supported in the drive plane supporting a cantilevered magnet assembly on the side of the drive plate facing the target.
摘要翻译： 具有面积小于目标区域的10％的磁体组件的小型磁体组件沿着包括围绕靶的中心轴线的轨道旋转的等离子体溅射的靶的背面以逆行星行星或行星路径扫描， 围绕围绕目标中心轴线旋转的另一轴线的行星旋转。 磁铁组件通过目标中心，从而允许全目标覆盖。 相对于相应轴的两个旋转的适当选择的比率在目标周边附近产生比在目标中心附近更慢的磁体速度。 齿轮行星机构包括旋转驱动板，固定中心齿轮和惰轮以及可驱动地支撑在驱动平面上的悬臂磁体组件的驱动平面中的从动齿轮。
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公开(公告)号：US07767064B2
公开(公告)日：2010-08-03
申请号：US11553880
申请日：2006-10-27
IPC分类号： C23C14/00
CPC分类号： C23C14/35 , H01J37/3408 , H01J37/3452 , H01J37/3455
摘要： A dual magnetron for plasma sputtering including a source magnetron and an auxiliary magnetron, each of which rotate about the center of the target at respective radii. The positions of the magnetron can be moved in complementary radial directions between sputter deposition and target cleaning. The magnetrons have different characteristics of size, strength, and imbalance. The source magnetron is smaller, stronger, and unbalanced source magnetron and is positioned near the edge of the wafer in sputter deposition and etching. The auxiliary magnetron is larger, weak, and more balanced and used for cleaning the center of the target and guiding sputter ions from the source magnetron in sputter deposition. Each magnetron may have its plasma shorted out in its radially outer position.
摘要翻译： 一种用于等离子体溅射的双磁控管，包括源磁控管和辅助磁控管，每个磁控管以相应的半径围绕靶的中心旋转。 磁控管的位置可以在溅射沉积和目标清洁之间沿互补的径向移动。 磁控管具有不同的尺寸，强度和不平衡特性。 源极磁控管是较小，较强和不平衡的源磁控管，并且在溅射沉积和蚀刻中位于晶片边缘附近。 辅助磁控管较大，弱且更均衡，用于清洁靶的中心并在溅射沉积中引导来自源磁控管的溅射离子。 每个磁控管可以使其等离子体在其径向外部位置短路。
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公开(公告)号：US07674360B2
公开(公告)日：2010-03-09
申请号：US10942273
申请日：2004-09-16
申请人： Ilyoung Richard Hong , Donny Young , Michael Rosenstein , Robert B. Lowrance , Daniel C. Lubben , Michael Andrew Miller , Peijun Ding , Sreekrishnan Sankaranarayan , Goichi Yoshidome
发明人： Ilyoung Richard Hong , Donny Young , Michael Rosenstein , Robert B. Lowrance , Daniel C. Lubben , Michael Andrew Miller , Peijun Ding , Sreekrishnan Sankaranarayan , Goichi Yoshidome
CPC分类号： C23C14/3407 , C23C14/35 , C23C14/54 , H01J37/3408 , H01J37/3455
摘要： A lift mechanism for and a corresponding use of a magnetron in a plasma sputter reactor. A magnetron rotating about the target axis is controllably lifted away from the back of the target to compensate for sputter erosion, thereby maintaining a constant magnetic field and resultant plasma density at the sputtered surface, which is particularly important for stable operation with a small magnetron, for example, one executing circular or planetary motion about the target axis. The lift mechanism can include a lead screw axially fixed to the magnetron support shaft and a lead nut engaged therewith to raise the magnetron as the lead nut is turned. Alternatively, the support shaft is axially fixed to a vertically moving slider. The amount of lift may be controlled according a recipe based on accumulated power applied to the target or by monitoring electrical characteristics of the target.
摘要翻译： 用于等离子体溅射反应器中的磁控管的升降机构和相应的使用。 围绕目标轴旋转的磁控管被可控地从目标的背面提升，以补偿溅射侵蚀，从而在溅射表面保持恒定的磁场和合成的等离子体密度，这对于使用小的磁控管的稳定操作特别重要， 例如，一个执行关于目标轴的圆形或行星运动。 升降机构可以包括轴向固定到磁控管支撑轴的导螺杆和与其接合的导螺母，以在导螺母转动时升高磁控管。 或者，支撑轴轴向固定到垂直移动的滑块。 可以根据基于施加到目标的累积功率的配方或通过监视目标的电气特性来控制升力量。
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公开(公告)号：US06841050B2
公开(公告)日：2005-01-11
申请号：US10152494
申请日：2002-05-21
CPC分类号： H01J37/3455 , C23C14/345 , C23C14/35 , C23C14/355 , H01J37/3405 , H01J37/3408
摘要： A small magnet assembly is scanned in a retrograde planetary or epicyclic path about the back of a target being plasma sputtered including an orbital rotation about the center axis of the target and a planetary rotation about another axis rotating about the target center axis. The magnet assembly passes through the target center, thus allowing full target coverage. A properly chosen ratio of the two rotations about respective axes produces a much slower magnet velocity near the target periphery than at the target center. A geared planetary mechanism includes a rotating drive plate, a fixed center gear, and an idler and a follower gear rotatably supported in the drive plane supporting a cantilevered magnet assembly on the side of the drive plate facing the target. A belted planetary mechanism includes a fixed center capstan, a follower pulley supporting the magnet assembly, and a belt wrapped around them.
摘要翻译： 小型磁体组件在逆行星行星或行星路径周围围绕目标物的背面进行扫描，等离子体溅射包括围绕靶的中心轴线的轨道旋转和围绕目标中心轴线旋转的另一轴线的行星旋转。 磁铁组件通过目标中心，从而允许全目标覆盖。 相对于相应轴的两个旋转的适当选择的比率在目标周边附近产生比在目标中心附近更慢的磁体速度。 齿轮行星机构包括旋转驱动板，固定中心齿轮和惰轮以及可驱动地支撑在驱动平面上的悬臂磁体组件的驱动平面中的从动齿轮。 带式行星机构包括固定中心绞盘，支撑磁体组件的从动轮和缠绕在其上的带。
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公开(公告)号：US20120237682A1
公开(公告)日：2012-09-20
申请号：US13414434
申请日：2012-03-07
CPC分类号： C23C14/042 , H01L51/56 , Y10T29/49778
摘要： A system for handling masked substrates comprising a chamber having a pedestal for supporting a substrate, and a chuck for supporting a mask in relation to a substrate. The system may include an alignment system operable to confirm alignment of the mask and the substrate. A method of positioning a mask on a substrate in a chamber comprises supporting the mask with a chuck disposed in the chamber and supporting the substrate with a pedestal disposed in the chamber. The method may further comprise aligning one or more reference points on the mask with one or more reference points on the substrate and positioning the mask on the substrate using at least one of the chuck and the pedestal.
摘要翻译： 一种用于处理掩模基板的系统，包括具有用于支撑基板的基座的室和用于相对于基板支撑掩模的卡盘。 系统可以包括可操作以确认掩模和基底的对准的对准系统。 将掩模定位在腔室中的基底上的方法包括用设置在腔室中的卡盘支撑掩模，并且用设置在腔室中的基座来支撑基底。 该方法还可以包括将掩模上的一个或多个参考点与衬底上的一个或多个参考点对准，并使用卡盘和基座中的至少一个将掩模定位在衬底上。
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