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    SPUTTERING SYSTEM AND METHOD FOR DEPOSITING THIN FILM
    1.
    发明申请
    SPUTTERING SYSTEM AND METHOD FOR DEPOSITING THIN FILM 失效
    用于沉积薄膜的溅射系统和方法

    公开(公告)号：US20100006422A1

    公开(公告)日：2010-01-14

    申请号：US12294294

    申请日：2006-03-28

    申请人： Masayoshi Yokoo ,  Isao Tanikawa ,  Norikazu Kainuma ,  Yoshinobu Takano

    发明人： Masayoshi Yokoo ,  Isao Tanikawa ,  Norikazu Kainuma ,  Yoshinobu Takano

    IPC分类号： C23C14/34

    CPC分类号： C23C14/042 ,  G11B7/266

    摘要： A sputtering system for depositing a thin film on the surface of a disc substrate in which high precision positioning of an inner mask and an outer mask is facilitated. The sputtering system has a mask member placed on the surface of the substrate mounted on a substrate holder to cover a partial region on the surface of the substrate. A thin film is deposited by sputtering in a region on the surface of the substrate not covered by the mask member. A section for carrying in and carrying out the substrate has mechanically holds and releases the substrate holder mounting the substrate, and mechanically holds and releases the mask member.

    摘要翻译： 一种用于在盘基板的表面上沉积薄膜的溅射系统，其中促进了内掩模和外掩模的高精度定位。 溅射系统具有掩模构件，该掩模构件设置在安装在基板保持器上的基板的表面上以覆盖基板表面上的部分区域。 通过溅射将薄膜沉积在未被掩模构件覆盖的基板的表面上的区域中。 用于承载和执行基板的部分机械地保持和释放安装基板的基板保持器，并机械地保持和释放掩模构件。

    Apparatus for detecting radiation and method for manufacturing such apparatus
    3.
    发明授权
    Apparatus for detecting radiation and method for manufacturing such apparatus 失效
    用于检测辐射的装置和用于制造这种装置的方法

    公开(公告)号：US6133614A

    公开(公告)日：2000-10-17

    申请号：US697281

    申请日：1996-08-27

    申请人： Tatsumi Shoji ,  Keiichi Kawasaki ,  Isao Tanikawa ,  Kazuaki Tashiro ,  Ichiro Tanaka ,  Tatsuya Yamazaki

    发明人： Tatsumi Shoji ,  Keiichi Kawasaki ,  Isao Tanikawa ,  Kazuaki Tashiro ,  Ichiro Tanaka ,  Tatsuya Yamazaki

    IPC分类号： H01L27/146 ,  H01L31/00 ,  H01L31/0232 ,  H01L31/115

    CPC分类号： H01L27/14663 ,  H01L27/14623

    摘要： A method for manufacturing a semiconductor apparatus for detecting radiation provided with phosphor comprises the steps of forming a phosphor layer integrally with a meshed partition plate having partitions per pixel of the semiconductor apparatus for detecting radiation, and of separating the phosphor per pixel by removing the phosphor on the partitioning portion of the partition plate by the irradiation of laser beam in the form of grooves together with the surface layer of the partitioning portions in order to make the phosphor thick to obtain a higher sensitivity, and also to make pixel pitches finer to enhance resolution, thus obtaining exact images without creating any cross talks between pixels.

    摘要翻译： 一种用于检测设置有荧光体的辐射检测用半导体装置的方法，包括以下步骤：与半导体装置的每隔像素分隔的网状分隔板一体地形成荧光体层，用于检测辐射，并通过除去荧光体 通过与分隔部分的表面层一起以沟槽形式的激光束照射分隔板的分隔部分，以使荧光体厚，以获得更高的灵敏度，并且还使得像素间距更细以提高 分辨率，从而获得精确的图像，而不会在像素之间创建任何交叉谈话。

    Plastic vessel having oriented coating and process for preparation thereof
    5.
    发明授权
    Plastic vessel having oriented coating and process for preparation thereof 失效
    具有定向涂层的塑料容器及其制备方法

    公开(公告)号：US4714580A

    公开(公告)日：1987-12-22

    申请号：US496996

    申请日：1983-05-23

    申请人： Yoshitsugu Maruhashi ,  Isao Tanikawa ,  Sadao Hirata

    发明人： Yoshitsugu Maruhashi ,  Isao Tanikawa ,  Sadao Hirata

    IPC分类号： B29C51/00 ,  B05D7/02 ,  B29C45/00 ,  B29C49/00 ,  B29C49/02 ,  B29C49/08 ,  B29C49/22 ,  B29C49/58 ,  B29C49/64 ,  B29C51/10 ,  B29C51/14 ,  B29C51/18 ,  B29C51/28 ,  B29C51/42 ,  B29C65/00 ,  B32B27/30 ,  B65D1/00 ,  B65D1/02 ,  B65D1/28 ,  B65D65/42 ,  C08J7/04 ,  B29C45/14

    CPC分类号： B05D7/02 ,  B29C49/22 ,  B29C49/64 ,  B29C51/14 ,  B65D1/0215 ,  B65D1/28 ,  B65D65/42 ,  C08J7/047 ,  B29B2911/14106 ,  B29B2911/14113 ,  B29B2911/1412 ,  B29B2911/14126 ,  B29B2911/14133 ,  B29B2911/1414 ,  B29B2911/1416 ,  B29B2911/14166 ,  B29B2911/1424 ,  B29B2911/14246 ,  B29B2911/14266 ,  B29B2911/14273 ,  B29B2911/1428 ,  B29K2027/00 ,  B29L2009/00 ,  C08J2427/00

    摘要： Disclosed is a coated oriented plastic vessel formed by subjecting a parison, preform or sheet comprising a molecularly orientable thermoplastic resin substrate and a coating layer of a vinylidene chloride copolymer formed on at least one surface of said substrate to a draw-molding operation such as biaxial draw-blow-molding or draw-forming, wherein the coating layer of the vinylidene chloride copolymer has such a molecular orientation tht the sum of two-dimensional orientation coefficients (l+m) in the axial direction and circumferential direction is at least 0.03 as measured according to the polarized light fluorometry and the coating layer is not substantially peeled at the low-temperature burst test conducted at -5.degree. C. This coated oriented plastic vessel is prepared by a process comprising coating an aqueous latex of a vinylidene chloride copolymer on at least one surface of a parison, preform or sheet composed of a molecularly orientable thermoplastic resin, drying the coated latex to form a coated structure and subjecting the coated structure to a draw-molding operation such as biaxial draw-blow-molding or draw-forming at a temperature higher than the glass transition temperature of the vinylidene chloride copolymer but lower than the melting point of the vinylidene chloride copolymer, at which temperature draw-molding of said thermoplastic resin is possible, to thereby from the coated structure into a shape of a vessel while drawing the coating layer.

    摘要翻译： 公开了一种涂覆取向的塑料容器，其通过将形成在可分子取向的热塑性树脂基材上的型坯，预制件或片材和形成在所述基材的至少一个表面上的偏二氯乙烯共聚物的涂层进行拉伸成型操作，例如双轴 拉伸吹塑成型或拉伸成形，其中偏二氯乙烯共聚物的涂层具有在轴向和圆周方向上的二维取向系数（1 + m）之和的总和为0.03以上的分子取向 根据偏振光荧光测定法测量，并且涂层在-5℃下进行的低温爆破试验基本上不剥离。该涂覆的取向塑料容器通过以下方法制备，该方法包括将偏二氯乙烯共聚物的水性胶乳 型坯，预制件或片材的至少一个表面，由可分子定向的热塑性树脂组成，干燥涂覆的l atex以形成涂层结构，并且在比偏二氯乙烯共聚物的玻璃化转变温度高的温度下对涂覆结构进行拉伸成型操作，例如双轴拉伸吹塑成型或拉伸成形，但低于 所述偏二氯乙烯共聚物可以在所述热塑性树脂的温度拉伸成型的情况下从所述涂覆的结构中拉出所述涂层而形成容器的形状。

    Sputtering system
    8.
    发明授权
    Sputtering system 失效
    溅射系统

    公开(公告)号：US08597479B2

    公开(公告)日：2013-12-03

    申请号：US11815519

    申请日：2005-02-08

    申请人： Keitaro Harada ,  Masayoshi Yokoo ,  Norikazu Kainuma ,  Yoshinobu Takano ,  Isao Tanikawa

    发明人： Keitaro Harada ,  Masayoshi Yokoo ,  Norikazu Kainuma ,  Yoshinobu Takano ,  Isao Tanikawa

    IPC分类号： C23C14/00 ,  C23C14/32 ,  C25B9/00 ,  C25B11/00 ,  C25B13/00

    CPC分类号： C23C14/35 ,  H01J37/3408 ,  H01J37/3455

    摘要： A magnetron sputtering system generates a high density plasma on a target by applying magnetic fields intersecting an electric field by using a plurality of magnets that are rotatably supported. The respective magnets are revolved and rotated so that the time variation of regions where a magnetic field (line of magnetic force) generated by the each magnet is orthogonal to an electric field is prevented from becoming monotonous. Further, the respective magnets are arranged to make the distances between the center of rotation and the center of revolution of the respective magnets different from each other, so that the regions where the magnetic field (line of magnetic force) generated by the each magnet is orthogonal to the electric field are dispersed in the radial direction of a target.

    摘要翻译： 磁控溅射系统通过使用可旋转地支撑的多个磁体施加与电场相交的磁场，在目标上产生高密度等离子体。 各磁体旋转旋转，防止由各磁体产生的磁场（磁力线）与电场正交的区域的时间变化变得单调。 此外，各磁体被配置成使得各磁体的旋转中心和旋转中心之间的距离彼此不同，使得由每个磁体产生的磁场（磁力线）为的区域为 与电场垂直的方向分散在靶的径向方向。

    Gas-liquid two-phase flow chromatographic analyzer and method of analysis using the same analyzer
    9.
    发明授权
    Gas-liquid two-phase flow chromatographic analyzer and method of analysis using the same analyzer 有权
    气液二相流色谱分析仪及分析方法采用相同的分析仪

    公开(公告)号：US07827850B2

    公开(公告)日：2010-11-09

    申请号：US11910045

    申请日：2006-03-31

    申请人： Isao Tanikawa

    发明人： Isao Tanikawa

    IPC分类号： G01N1/00

    CPC分类号： G01N30/6069 ,  G01N27/62 ,  G01N30/34 ,  G01N30/462 ,  G01N2030/065

    摘要： This invention provides a chromatographic apparatus comprising an introduction part for a carrier gas as a main mobile phase medium, a sample injection part, a separation column comprising a stationary phase formed by coating a polymeric material, a part for housing the separation column, and a detector. The sample injection part is provided between the carrier gas introduction part and the inlet of the separation column. The chromatographic apparatus further comprises a solvent introduction means for adding a liquid solvent as a second mobile phase medium to a carrier gas and mixing them together, a mechanism for regulating the amount of the carrier gas introduced and the amount of the solvent added, and a mechanism for regulating the temperature of each flow passage. A plurality of clogging liquid stoppers, of which the liquid film thickness is equal to the inner diameter of a capillary column, are partly provided at predetermined intervals within the column in a longitudinal direction of the column. In such a state that a gas phase and a liquid phase are intermittently alternated, a mobile phase medium is moved toward a column outlet and a sample is separated by utilizing distribution between the solvent liquid film of the mobile phase medium and the column stationary phase. There is also provided a chromatographic analytical method utilizing this apparatus. According to this method, a sample can be separated without using any high pressure pump.

    摘要翻译： 本发明提供一种色谱装置，其特征在于，包括作为载体气体作为主要流动相介质的引入部分，样品注入部分，包含通过涂覆聚合物材料形成的固定相的分离柱，用于容纳分离柱的部分， 探测器。 样品注入部设置在载气导入部和分离塔的入口之间。 色谱装置还包括溶剂引入装置，用于将液体溶剂作为第二流动相介质添加到载气并将它们混合在一起，用于调节引入的载气量和添加的溶剂量的机构，以及 用于调节每个流道温度的机构。 其中液膜厚度等于毛细管柱的内径的多个堵塞液塞在柱的长度方向上以规定间隔部分设置。 在气相和液相间歇地交替的状态下，通过流动相介质的溶剂液膜和柱固定相之间的分布，使流动相介质向列出口移动，样品分离。 还提供了利用该装置的色谱分析方法。 根据该方法，可以在不使用任何高压泵的情况下分离样品。

    SPUTTERING SYSTEM
    10.
    发明申请
    SPUTTERING SYSTEM 失效
    喷射系统

    公开(公告)号：US20090026073A1

    公开(公告)日：2009-01-29

    申请号：US11815519

    申请日：2005-02-08

    申请人： Keitaro Harada ,  Masayoshi Yokoo ,  Norikazu Kainuma ,  Yoshinobu Takano ,  Isao Tanikawa

    发明人： Keitaro Harada ,  Masayoshi Yokoo ,  Norikazu Kainuma ,  Yoshinobu Takano ,  Isao Tanikawa

    IPC分类号： C23C14/35

    CPC分类号： C23C14/35 ,  H01J37/3408 ,  H01J37/3455

    摘要： A plurality of magnets are rotatably supported and when a ratio between revolution angle and rotation angle per unit time is set to 1:R, R is set to a value which is not less than 1 and not more than 5, and is not a common divisor of 360, so that the time variation of regions where a magnetic field (line of magnetic force) generated by the each magnet is orthogonal to an electric field is prevented from becoming monotonous. Further, the respective magnets are arranged to make the distances between the center of rotation and the center of revolution of the respective magnets different from each other, so that the regions where the magnetic field (line of magnetic force) generated by the each magnet is orthogonal to the electric field are dispersed in the radial direction of a target.

    摘要翻译： 多个磁体被可旋转地支撑，当每单位时间的旋转角度和旋转角度之比设定为1时，R设定为不小于1且不大于5的值，并不常见 360°的除数，使得由每个磁体产生的磁场（磁力线）与电场正交的区域的时间变化被防止变得单调。 此外，各磁体被配置成使得各磁体的旋转中心和旋转中心之间的距离彼此不同，使得由每个磁体产生的磁场（磁力线）为的区域为 与电场垂直的方向分散在靶的径向方向。