摘要:
The invention is related to a method and apparatus for modifying the irradiation distribution of a radiation source. In accordance with the method the radiation source (1) is used to direct radiation to an essentially planar target surface (6). In accordance with the invention between the radiation source (1) and the target surface (6), several plates (4), which are essentially transparent to the radiation and have spaces between them, are placed close to the radiation source (1), in order to use the reflection and absorption of the transparent plates (4) to attenuate the radiation to desired areas.
摘要:
The method and apparatus for measuring the current-voltage characteristic curve of a solar panel uses cost-effective equipment and a minimized need of optical output power. A light pulse is applied to the solar panel and the response of the solar panel to the light pulse is measured by varying the electrical load connected to the output of the solar panel. The measurement is carried out with the help of a short-duration decaying light pulse such that the falling tail of the pulse is used for such a short period that the intensity of the pulse does not have time to change essentially during the measurement.
摘要:
The present invention concerns a method and an apparatus for removing substances from gases discharged from gas phase reactors. In particular, the invention provides a method for removing substances contained in gases discharged from an ALD reaction process, comprising contacting the gases with a “sacrificial” material having a high surface area kept at essentially the same conditions as those prevailing during the gas phase reaction process. The sacrificial material is thus subjected to surface reactions with the substances contained in the gases to form a reaction product on the surface of the sacrificial material and to remove the substances from the gases. The present invention diminishes the amount of waste produced in the gas phase process and reduces wear on the equipment.
摘要:
The present invention concerns a method and an apparatus for removing substances from gases discharged from gas phase reactors. In particular, the invention provides a method for removing substances contained in gases discharged from an ALD reaction process, comprising contacting the gases with a “sacrificial” material having a high surface area kept at essentially the same conditions as those prevailing during the gas phase reaction process. The sacrificial material is thus subjected to surface reactions with the substances contained in the gases to form a reaction product on the surface of the sacrificial material and to remove the substances from the gases. The present invention diminishes the amount of waste produced in the gas phase process and reduces wear on the equipment.