公开(公告)号：US20120200247A1

公开(公告)日：2012-08-09

申请号：US13367000

申请日：2012-02-06

申请人： James Baugh

发明人： James Baugh

IPC分类号： G05D3/00

CPC分类号： G05B19/042 ,  E06B9/262 ,  E06B9/322 ,  E06B2009/3222 ,  G05B2219/2653

摘要： Example architectural opening coverings and methods are disclosed. An example architectural opening covering system comprises a first motor to move a middle rail relative to a fixed top rail, and a second motor to move a bottom rail relative to the middle rail and the fixed top rail. The example system also comprises a controller to selectively actuate the first motor to move the middle rail based on a first position of the middle rail and a first position of the bottom rail, and to selectively actuate the second motor to move the bottom rail based on a second position of the middle rail and a second position of the bottom rail.

摘要翻译： 公开了一些建筑开放性覆盖物和方法。 示例性建筑开口覆盖系统包括：第一电动机，用于相对于固定顶部轨道移动中间轨道;以及第二电动机，用于相对于中间轨道和固定顶部轨道移动底部轨道。 示例系统还包括控制器，用于选择性地致动第一电动机以基于中间轨道的第一位置和底部轨道的第一位置移动中间轨道，并且基于以下方式选择性地致动第二电动机以移动底部轨道： 中间轨道的第二位置和底部轨道的第二位置。

公开(公告)号：US20110253320A1

公开(公告)日：2011-10-20

申请号：US13123555

申请日：2009-10-20

申请人： James Baugh ,  Daniel Fluckey ,  Michael S. Holford

发明人： James Baugh ,  Daniel Fluckey ,  Michael S. Holford

IPC分类号： A47H5/02 ,  A47H23/00

CPC分类号： E06B9/322 ,  E06B9/262 ,  E06B2009/2627

摘要： An apparatus and method associated with the extension and retraction of a covering for an architectural opening. More particularly, an apparatus and method which monitors the extension of a shade to control the extension and position when the extension motion of the shade is interrupted.

摘要翻译： 一种与建筑开口的覆盖物的伸缩相关联的装置和方法。 更具体地说，一种监视遮光罩的延伸以控制遮光罩的延伸运动被中断时的延伸和位置的装置和方法。

公开(公告)号：US20080037485A1

公开(公告)日：2008-02-14

申请号：US11572066

申请日：2005-07-14

申请人： Anne Osinga ,  Michael Holford ,  Joseph Kovach ,  Paul Josephson ,  Jochem Welvaadt ,  James Baugh

发明人： Anne Osinga ,  Michael Holford ,  Joseph Kovach ,  Paul Josephson ,  Jochem Welvaadt ,  James Baugh

IPC分类号： H04Q7/24

CPC分类号： H04L45/00 ,  H04W52/0219 ,  H04W52/0229 ,  H04W52/0258 ,  Y02D70/1222 ,  Y02D70/142 ,  Y02D70/144 ,  Y02D70/162

摘要： The present invention provide apparatus, systems and/or methods for use in controlling a distributed network of main powered devices and battery powered devices. The devices control the operation of one or more appliances. In one embodiment, an adaptive network comprises a main powered device, a battery powered device and a network control device. The network uses a wireless network protocol that includes at least one of a group, network, unit, group flag, mood and/or mask identifier. The network may include a data storage device having a data structure comprising a listing of at least one battery powered device with which the main powered device can communicate on the network, and/or a connectivity rating and ranking of networked devices. The network may also include: a network traffic manager, a routing and a controller identifier.

摘要翻译： 本发明提供用于控制主电源设备和电池供电设备的分布式网络的设备，系统和/或方法。 设备控制一个或多个设备的操作。 在一个实施例中，自适应网络包括主供电设备，电池供电设备和网络控制设备。 网络使用包括组，网络，单元，组标志，心情和/或掩码标识符中的至少一个的无线网络协议。 网络可以包括具有数据结构的数据存储设备，该数据结构包括至少一个电池供电设备的列表，主电源设备可以通过该列表与网络通信，和/或联网设备的连接评级和排名。 网络还可以包括：网络流量管理器，路由和控制器标识符。

公开(公告)号：US07008487B1

公开(公告)日：2006-03-07

申请号：US10090986

申请日：2002-03-04

申请人： Shad Hedges ,  James Baugh

发明人： Shad Hedges ,  James Baugh

IPC分类号： B08B3/02

CPC分类号： G03F1/82 ,  B08B3/02 ,  B08B11/02 ,  B08B2220/01 ,  G03F1/62 ,  Y10T428/13 ,  Y10T428/24273 ,  Y10T428/24479 ,  Y10T428/2457

摘要： A system and method to clean the pellicle frame and adhesive ring of a photomask reticle are described. One embodiment includes a cover that isolates the photomasks from the pellicle frame. The reticle is secured between a spin chuck and the cover so that the photomasks are isolated and protected from solvents used in a cleaning process. With the reticle secured to the spin chuck, the spin chuck is rotated under a pressurized spray of solvent. The solvent, which is caustic to the photomasks, removes the contaminants from the adhesive ring. After the exposed areas are cleaned, the cover is removed and foreign material from photomasks are removed using less invasive solvents and methods.

摘要翻译： 描述了一种清洁光掩模掩模版的防护薄膜框架和粘合环的系统和方法。 一个实施例包括将光掩模与防护薄膜组件框架隔离的盖。 掩模版固定在旋转卡盘和盖子之间，使得光掩模被隔离并保护不受清洁过程中使用的溶剂的影响。 当光罩固定在旋转卡盘上时，旋转卡盘在加压的溶剂喷雾下旋转。 对光掩模腐蚀的溶剂从粘合环中除去污染物。 在暴露的区域被清洁之后，除去盖子并且使用较少侵入性的溶剂和方法除去来自光掩模的异物。

公开(公告)号：US08540005B2

公开(公告)日：2013-09-24

申请号：US13123555

申请日：2009-10-20

申请人： James Baugh ,  Daniel Fluckey ,  Michael S. Holford

发明人： James Baugh ,  Daniel Fluckey ,  Michael S. Holford

IPC分类号： A47H5/00

CPC分类号： E06B9/322 ,  E06B9/262 ,  E06B2009/2627

摘要： An apparatus and method associated with the extension and retraction of a covering for an architectural opening. More particularly, an apparatus and method which monitors the extension of a shade to control the extension and position when the extension motion of the shade is interrupted.

摘要翻译： 一种与建筑开口的覆盖物的伸缩相关联的装置和方法。 更具体地说，一种监视遮光罩的延伸以控制遮光罩的延伸运动被中断时的延伸和位置的装置和方法。

公开(公告)号：US07767365B2

公开(公告)日：2010-08-03

申请号：US11515089

申请日：2006-08-31

申请人： Craig M. Carpenter ,  James Baugh ,  Steve McDonald ,  Robert Rasmussen ,  J. Brett Rolfson ,  Azeddine Zerrade

发明人： Craig M. Carpenter ,  James Baugh ,  Steve McDonald ,  Robert Rasmussen ,  J. Brett Rolfson ,  Azeddine Zerrade

IPC分类号： G03F1/00

CPC分类号： G03F1/82 ,  G03F1/32 ,  G03F1/54 ,  G03F1/80

摘要： A method for removing impurities (e.g., atomic sulfur) from a reticle for use in photolithography is provided. In one embodiment, a reticle (or photomask) comprising a plate, a first layer over the plate, and a photoresist layer over the first layer is provided. The photoresist layer is removed with a first chemistry comprising a sulfur-containing compound. At least a portion of the first layer is removed with a second chemistry comprising a sulfur-containing etchant, thereby exposing portions of the plate. Removing the photoresist layer and/or at least a portion of the first layer leaves sulfur on at least portions of the reticle. In a cleaning step, the reticle is contacted with one or more excited species of oxygen to remove residual sulfur and other contaminants, such as carbon, sulfur and oxygen-containing species. Methods of embodiments can be used to clean, e.g., binary photomasks, attenuated phase shift masks (APSMs) and high transmission attenuated photomasks.

摘要翻译： 提供从用于光刻的掩模版中除去杂质（例如原子硫）的方法。 在一个实施例中，提供了包括板，板上的第一层和第一层上的光致抗蚀剂层的掩模版（或光掩模）。 用包含含硫化合物的第一化学物质除去光致抗蚀剂层。 用包含含硫蚀刻剂的第二化学物质除去第一层的至少一部分，从而暴露板的部分。 去除光致抗蚀剂层和/或第一层的至少一部分在掩模版的至少部分上留下硫。 在清洁步骤中，将掩模版与一种或多种激发的氧气接触以除去残留的硫和其它污染物，例如碳，硫和含氧物质。 实施例的方法可用于清洁例如二值光掩模，衰减相移掩模（APSM）和高透射衰减光掩模。

公开(公告)号：US20100109850A1

公开(公告)日：2010-05-06

申请号：US12438320

申请日：2007-08-23

申请人： Joseph E. Kovach ,  James Baugh ,  Paul F. Josephson ,  Michael S. Holford

发明人： Joseph E. Kovach ,  James Baugh ,  Paul F. Josephson ,  Michael S. Holford

IPC分类号： H04Q3/00 ,  H04B1/06

CPC分类号： G08C17/02 ,  G08C23/04 ,  G08C2201/63 ,  G08C2201/71

摘要： A controller for a device transmitting commands across one or more communication channels. Each such channel may employ a separate medium, such as radio waves and infrared light. The controller may transmit two separate signals to a device, where one signal is sent via radio waves and the other by infrared light. One signal may correspond to a group identifier and the other to an operating command to be carried out by the device. The device may receive both signals and, if the device belongs to a group corresponding to the group identifier, it may execute the operating command. Alternatively, the group identifier may be replaced by a wake command and the device may execute the operating command only if the wake command is received.

摘要翻译： 一种用于通过一个或多个通信信道发送命令的设备的控制器。 每个这样的通道可以采用单独的介质，例如无线电波和红外光。 控制器可以向设备发送两个单独的信号，其中一个信号经由无线电波发送，另一个信号通过红外光发送。 一个信号可以对应于组标识符，另一个信号可以对应于要由设备执行的操作命令。 设备可以接收两个信号，并且如果设备属于与组标识符相对应的组，则它可以执行操作命令。 或者，组标识符可以被唤醒命令替代，并且仅当接收到唤醒命令时，设备才可以执行操作命令。

公开(公告)号：US07300526B2

公开(公告)日：2007-11-27

申请号：US11368895

申请日：2006-03-06

申请人： Shad Hedges ,  James Baugh

发明人： Shad Hedges ,  James Baugh

IPC分类号： B08B3/02

CPC分类号： G03F1/82 ,  B08B3/02 ,  B08B11/02 ,  B08B2220/01 ,  G03F1/62 ,  Y10T428/13 ,  Y10T428/24273 ,  Y10T428/24479 ,  Y10T428/2457

摘要： A system and method to clean the pellicle frame and adhesive ring of a photomask reticle are described. One embodiment includes a cover that isolates the photomasks from the pellicle frame. The reticle is secured between a spin chuck and the cover so that the photomasks are isolated and protected from solvents used in a cleaning process. With the reticle secured to the spin chuck, the spin chuck is rotated under a pressurized spray of solvent. The solvent, which is caustic to the photomasks, removes the contaminants from the adhesive ring. After the exposed areas are cleaned, the cover is removed and foreign material from photomasks are removed using less invasive solvents and methods.

摘要翻译： 描述了一种清洁光掩模掩模版的防护薄膜框架和粘合环的系统和方法。 一个实施例包括将光掩模与防护薄膜组件框架隔离的盖。 掩模版固定在旋转卡盘和盖子之间，使得光掩模被隔离并保护不受清洁过程中使用的溶剂的影响。 当光罩固定在旋转卡盘上时，旋转卡盘在加压的溶剂喷雾下旋转。 对光掩模腐蚀的溶剂从粘合环中除去污染物。 在暴露的区域被清洁之后，除去盖子并且使用较少侵入性的溶剂和方法除去来自光掩模的异物。

公开(公告)号：US20060144425A1

公开(公告)日：2006-07-06

申请号：US11368895

申请日：2006-03-06

申请人： Shad Hedges ,  James Baugh

发明人： Shad Hedges ,  James Baugh

IPC分类号： B08B3/00

CPC分类号： G03F1/82 ,  B08B3/02 ,  B08B11/02 ,  B08B2220/01 ,  G03F1/62 ,  Y10T428/13 ,  Y10T428/24273 ,  Y10T428/24479 ,  Y10T428/2457

摘要： A system and method to clean the pellicle frame and adhesive ring of a photomask reticle are described. One embodiment includes a cover that isolates the photomasks from the pellicle frame. The reticle is secured between a spin chuck and the cover so that the photomasks are isolated and protected from solvents used in a cleaning process. With the reticle secured to the spin chuck, the spin chuck is rotated under a pressurized spray of solvent. The solvent, which is caustic to the photomasks, removes the contaminants from the adhesive ring. After the exposed areas are cleaned, the cover is removed and foreign material from photomasks are removed using less invasive solvents and methods.

公开(公告)号：US5071126A

公开(公告)日：1991-12-10

申请号：US531088

申请日：1990-05-31

申请人： James Baugh

发明人： James Baugh

IPC分类号： A63B60/58

CPC分类号： A63B60/58

摘要： A tennis racket cover is provided with a measuring strap for measuring the height of a tennis net. A first end of the strap is attached to the cover, and a second end of the strap can be pulled away from the cover and positioned beyond a first end of the cover. The distance between a second end of the cover and the second end of the strap is about 36 inches.

摘要翻译： 网球拍盖配有测量带，用于测量网球网的高度。 带的第一端附接到盖，并且带的第二端可以从盖被拉开并定位在盖的第一端之外。 盖的第二端和带的第二端之间的距离约为36英寸。