公开(公告)号：US20050264773A1

公开(公告)日：2005-12-01

申请号：US10852686

申请日：2004-05-25

申请人： Marcel Beckers ,  Ronald Hultermans ,  Nicolaas Kate ,  Nicolaas Kemper ,  Nicolaas Koppelaars ,  Jan-Marius Schotsman ,  Ronald Der Ham ,  Johannes Antonius Van Uijtregt

发明人： Marcel Beckers ,  Ronald Hultermans ,  Nicolaas Kate ,  Nicolaas Kemper ,  Nicolaas Koppelaars ,  Jan-Marius Schotsman ,  Ronald Der Ham ,  Johannes Antonius Van Uijtregt

IPC分类号： G03F7/20 ,  H01L21/027 ,  G03B27/52

CPC分类号： G03F7/70933 ,  G03F7/70908

摘要： A lithographic apparatus is disclosed. The apparatus includes an illumination system to provide a beam of radiation, and a support structure for supporting a patterning device. The patterning device serves to impart the beam with a pattern in its cross-section. The apparatus also includes a gas flushing device for flushing a substantially laminar flow of gas across the beam of radiation and/or along a surface of an optical component. The gas flushing device includes a single gas outlet that has an inner rim at a downstream end of the gas outlet. The inner rim defines a total gas outlet area. The gas outlet is provided with a laminator that has an effective area out of which, in use, the substantially laminar flow of gas flows. The laminator effective area includes material that has laminator openings and is at least as large as the total gas outlet area.

摘要翻译： 公开了一种光刻设备。 该装置包括用于提供辐射束的照明系统和用于支撑图案形成装置的支撑结构。 图案形成装置用于在其横截面中赋予光束图案。 该装置还包括用于冲洗基本层流的气体穿过辐射束和/或沿着光学部件的表面冲洗的气体冲洗装置。 气体冲洗装置包括单个气体出口，其在气体出口的下游端具有内缘。 内缘定义了总气体出口面积。 气体出口设置有层压机，其具有在使用中基本上层流的气体流动的有效区域。 层压机有效区域包括具有层压机开口并且至少与总气体出口面积一样大的材料。

公开(公告)号：US07136142B2

公开(公告)日：2006-11-14

申请号：US10852686

申请日：2004-05-25

申请人： Marcel Beckers ,  Ronald Johannes Hultermans ,  Nicolaas Ten Kate ,  Nicolaas Rudolf Kemper ,  Nicolaas Franciscus Koppelaars ,  Jan-Marius Schotsman ,  Ronald Van Der Ham ,  Johannes Antonius Maria Martina Van Uijtregt

发明人： Marcel Beckers ,  Ronald Johannes Hultermans ,  Nicolaas Ten Kate ,  Nicolaas Rudolf Kemper ,  Nicolaas Franciscus Koppelaars ,  Jan-Marius Schotsman ,  Ronald Van Der Ham ,  Johannes Antonius Maria Martina Van Uijtregt

IPC分类号： G03B27/52 ,  G03B27/42

CPC分类号： G03F7/70933 ,  G03F7/70908

摘要： A lithographic apparatus is disclosed. The apparatus includes an illumination system to provide a beam of radiation, and a support structure for supporting a patterning device. The patterning device serves to impart the beam with a pattern in its cross-section. The apparatus also includes a gas flushing device for flushing a substantially laminar flow of gas across the beam of radiation and/or along a surface of an optical component. The gas flushing device includes a single gas outlet that has an inner rim at a downstream end of the gas outlet. The inner rim defines a total gas outlet area. The gas outlet is provided with a laminator that has an effective area out of which, in use, the substantially laminar flow of gas flows. The laminator effective area includes material that has laminator openings and is at least as large as the total gas outlet area.

摘要翻译： 公开了一种光刻设备。 该装置包括用于提供辐射束的照明系统和用于支撑图案形成装置的支撑结构。 图案形成装置用于在其横截面中赋予光束图案。 该装置还包括用于冲洗基本层流的气体穿过辐射束和/或沿着光学部件的表面冲洗的气体冲洗装置。 气体冲洗装置包括单个气体出口，其在气体出口的下游端具有内缘。 内缘定义了总气体出口面积。 气体出口设置有层压机，其具有在使用中基本上层流的气体流动的有效区域。 层压机有效区域包括具有层压机开口并且至少与总气体出口面积一样大的材料。