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    Thin film deposition apparatus and thin film deposition method using the same
    1.
    发明授权
    Thin film deposition apparatus and thin film deposition method using the same 有权
    薄膜沉积装置和使用其的薄膜沉积方法

    公开(公告)号：US09045826B2

    公开(公告)日：2015-06-02

    申请号：US13613804

    申请日：2012-09-13

    申请人： Sang-Joon Seo ,  Myung-Soo Huh ,  Seung-Hun Kim ,  Jin-Kwang Kim ,  Cheol-Rae Jo ,  Choel-Min Jang ,  Jeong-Ho Yi

    发明人： Sang-Joon Seo ,  Myung-Soo Huh ,  Seung-Hun Kim ,  Jin-Kwang Kim ,  Cheol-Rae Jo ,  Choel-Min Jang ,  Jeong-Ho Yi

    IPC分类号： C23C16/455

    CPC分类号： C23C16/45551

    摘要： In a thin film deposition apparatus and a thin film deposition method using the same, a first spraying unit and a second spraying unit which are separately driven are prepared, the first spraying unit is driven to sequentially spray a first deposition source and an inert gas onto a substrate, a chamber is exhausted to remove, from the chamber, excess first deposition sources that are not adsorbed onto the substrate from the chamber, a second spraying unit is driven to sequentially spray a second deposition source and an inert gas onto the substrate, and the chamber is exhausted to remove, from the chamber, excess second deposition sources that are not adsorbed onto the substrate. When the thin film deposition method is used, the unintended generation of microparticles during deposition is sufficiently suppressed.

    摘要翻译： 在使用其的薄膜沉积装置和薄膜沉积方法中，制备分别驱动的第一喷射单元和第二喷射单元，驱动第一喷射单元以顺序地将第一沉积源和惰性气体喷射到 衬底，腔室被排出以从腔室中除去未从腔室吸附到衬底上的过量的第一沉积源，驱动第二喷射单元以顺序地将第二沉积源和惰性气体喷射到衬底上， 并且室被排出以从腔室中除去未吸附到基底上的多余的第二沉积源。 当使用薄膜沉积方法时，在沉积期间非常期望的微粒的产生被充分地抑制。

    Deposition Source, Deposition Apparatus, and Method of Manufacturing Organic Light-Emitting Display Apparatus
    2.
    发明申请
    Deposition Source, Deposition Apparatus, and Method of Manufacturing Organic Light-Emitting Display Apparatus 有权
    沉积源，沉积装置和制造有机发光显示装置的方法

    公开(公告)号：US20130196076A1

    公开(公告)日：2013-08-01

    申请号：US13593134

    申请日：2012-08-23

    申请人： Tae-Wook Kang ,  Jeong-Ho Yi

    发明人： Tae-Wook Kang ,  Jeong-Ho Yi

    IPC分类号： H05B33/10 ,  C23C16/56

    CPC分类号： C23C14/58 ,  B05D1/60 ,  B05D3/067 ,  C23C14/12 ,  C23C14/243

    摘要： A deposition source for depositing a deposition material on a substrate, the deposition source including: a nozzle disposed to face the substrate and discharge the deposition material toward the substrate; and a hardening portion disposed to at least one side of the nozzle for immediately hardening the deposition material discharged via the nozzle when the deposition material reaches the substrate. The deposition source being part of a deposition apparatus for manufacturing an organic light-emitting display having improved characteristics of a deposited film and encapsulation characteristics.

    摘要翻译： 一种用于在基板上沉积沉积材料的沉积源，所述沉积源包括：设置成面对所述衬底并将所述沉积材料排向所述衬底的喷嘴; 以及设置在所述喷嘴的至少一侧的硬化部，用于当所述沉积材料到达所述基板时立即硬化经由所述喷嘴排出的沉积材料。 沉积源是用于制造具有改进的沉积膜特性和封装特性的有机发光显示器的沉积设备的一部分。

    Substrate depositing system and depositing method using the same
    4.
    发明授权
    Substrate depositing system and depositing method using the same 有权
    基板沉积系统及其沉积方法

    公开(公告)号：US08802488B2

    公开(公告)日：2014-08-12

    申请号：US13179350

    申请日：2011-07-08

    申请人： Jeong-Ho Yi ,  Suk-Won Jung ,  Seung-Ho Choi

    发明人： Jeong-Ho Yi ,  Suk-Won Jung ,  Seung-Ho Choi

    IPC分类号： H01L51/40 ,  C23C16/00

    CPC分类号： H01L21/67184 ,  C23C14/50 ,  C23C14/566 ,  C23C14/568 ,  H01L21/67196 ,  H01L21/67742 ,  H01L21/67748

    摘要： A substrate depositing system and a method of using a substrate depositing system. A substrate depositing system includes a load-lock chamber for loading and unloading a substrate, at least one transfer chamber connected to the load-lock chamber and including a substrate transfer device configured to vertically transfer the substrate, and a pair of depositing chambers connected to opposite sides of the at least one transfer chamber and including a depositing source and a pair of substrate fixing devices, the substrate transfer device including a pair of substrate installing members.

    摘要翻译： 衬底沉积系统和使用衬底沉​​积系统的方法。 衬底沉积系统包括用于装载和卸载衬底的加载锁定室，连接到加载锁定室的至少一个传送室，并且包括被配置为垂直传送衬底的衬底传送装置，以及连接到 所述至少一个传送室的相对侧并且包括沉积源和一对基板固定装置，所述基板传送装置包括一对基板安装构件。

    SUBSTRATE DEPOSITING SYSTEM AND DEPOSITING METHOD USING THE SAME
    6.
    发明申请
    SUBSTRATE DEPOSITING SYSTEM AND DEPOSITING METHOD USING THE SAME 有权
    基底沉积系统和使用该沉积系统的沉积方法

    公开(公告)号：US20120064728A1

    公开(公告)日：2012-03-15

    申请号：US13179350

    申请日：2011-07-08

    申请人： Jeong-Ho Yi ,  Suk-Won Jung ,  Seung-Ho Choi

    发明人： Jeong-Ho Yi ,  Suk-Won Jung ,  Seung-Ho Choi

    IPC分类号： H01L21/30 ,  B05C5/00

    CPC分类号： H01L21/67184 ,  C23C14/50 ,  C23C14/566 ,  C23C14/568 ,  H01L21/67196 ,  H01L21/67742 ,  H01L21/67748

    摘要： A substrate depositing system and a method of using a substrate depositing system. A substrate depositing system includes a load-lock chamber for loading and unloading a substrate, at least one transfer chamber connected to the load-lock chamber and including a substrate transfer device configured to vertically transfer the substrate, and a pair of depositing chambers connected to opposite sides of the at least one transfer chamber and including a depositing source and a pair of substrate fixing devices, the substrate transfer device including a pair of substrate installing members.

    摘要翻译： 衬底沉积系统和使用衬底沉​​积系统的方法。 衬底沉积系统包括用于装载和卸载衬底的加载锁定室，连接到加载锁定室的至少一个传送室，并且包括被配置为垂直传送衬底的衬底传送装置，以及连接到 所述至少一个传送室的相对侧并且包括沉积源和一对基板固定装置，所述基板传送装置包括一对基板安装构件。

    THIN FILM DEPOSITING APPARATUS AND THIN FILM DEPOSITING METHOD USING THE SAME
    8.
    发明申请
    THIN FILM DEPOSITING APPARATUS AND THIN FILM DEPOSITING METHOD USING THE SAME 有权
    薄膜沉积装置和薄膜沉积方法

    公开(公告)号：US20130266728A1

    公开(公告)日：2013-10-10

    申请号：US13613804

    申请日：2012-09-13

    申请人： Sang-Joon Seo ,  Myung-Soo Huh ,  Seung-Hun Kim ,  Jin-Kwang Kim ,  Cheol-Rae Jo ,  Choel-Min Jang ,  Jeong-Ho Yi

    发明人： Sang-Joon Seo ,  Myung-Soo Huh ,  Seung-Hun Kim ,  Jin-Kwang Kim ,  Cheol-Rae Jo ,  Choel-Min Jang ,  Jeong-Ho Yi

    IPC分类号： C23C16/455

    CPC分类号： C23C16/45551

    摘要： In a thin film deposition apparatus and a thin film deposition method using the same, a first spraying unit and a second spraying unit which are separately driven are prepared, the first spraying unit is driven to sequentially spray a first deposition source and an inert gas onto a substrate, a chamber is exhausted to remove, from the chamber, excess first deposition sources that are not adsorbed onto the substrate from the chamber, a second spraying unit is driven to sequentially spray a second deposition source and an inert gas onto the substrate, and the chamber is exhausted to remove, from the chamber, excess second deposition sources that are not adsorbed onto the substrate. When the thin film deposition method is used, the unintended generation of microparticles during deposition is sufficiently suppressed.

    摘要翻译： 在使用其的薄膜沉积装置和薄膜沉积方法中，制备分别驱动的第一喷射单元和第二喷射单元，驱动第一喷射单元以顺序地将第一沉积源和惰性气体喷射到 衬底，腔室被排出以从腔室中除去未从腔室吸附到衬底上的过量的第一沉积源，驱动第二喷射单元以顺序地将第二沉积源和惰性气体喷射到衬底上， 并且室被排出以从腔室中除去未吸附到基底上的多余的第二沉积源。 当使用薄膜沉积方法时，在沉积期间非常期望的微粒的产生被充分地抑制。

    Deposition source, deposition apparatus, and method of manufacturing organic light-emitting display apparatus
    9.
    发明授权
    Deposition source, deposition apparatus, and method of manufacturing organic light-emitting display apparatus 有权
    沉积源，沉积装置和制造有机发光显示装置的方法

    公开(公告)号：US09045822B2

    公开(公告)日：2015-06-02

    申请号：US13593134

    申请日：2012-08-23

    申请人： Tae-Wook Kang ,  Jeong-Ho Yi

    发明人： Tae-Wook Kang ,  Jeong-Ho Yi

    IPC分类号： C23C16/56 ,  C23C14/12 ,  C23C14/24 ,  C23C14/58 ,  B05D3/06 ,  B05D1/00

    CPC分类号： C23C14/58 ,  B05D1/60 ,  B05D3/067 ,  C23C14/12 ,  C23C14/243

    摘要： A deposition source for depositing a deposition material on a substrate, the deposition source including: a nozzle disposed to face the substrate and discharge the deposition material toward the substrate; and a hardening portion disposed to at least one side of the nozzle for immediately hardening the deposition material discharged via the nozzle when the deposition material reaches the substrate. The deposition source being part of a deposition apparatus for manufacturing an organic light-emitting display having improved characteristics of a deposited film and encapsulation characteristics.

    摘要翻译： 一种用于在基板上沉积沉积材料的沉积源，所述沉积源包括：设置成面对所述衬底并将所述沉积材料排向所述衬底的喷嘴; 以及设置在所述喷嘴的至少一侧的硬化部，用于当所述沉积材料到达所述基板时立即硬化经由所述喷嘴排出的沉积材料。 沉积源是用于制造具有改进的沉积膜特性和封装特性的有机发光显示器的沉积设备的一部分。