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    Twist-N-Lock wafer area pressure ring and assembly for reducing particulate contaminant in a plasma processing chamber
    2.
    发明授权
    Twist-N-Lock wafer area pressure ring and assembly for reducing particulate contaminant in a plasma processing chamber 有权
    Twist-N-Lock晶圆区域压力环和组件，用于减少等离子体处理室中的微粒污染物

    公开(公告)号：US06936135B2

    公开(公告)日：2005-08-30

    申请号：US10418249

    申请日：2003-04-16

    申请人： Jerrel K. Antolik

    发明人： Jerrel K. Antolik

    IPC分类号： H01J37/32 ,  H01L21/00 ,  H01L21/687 ,  C23C16/00

    CPC分类号： H01L21/68728 ,  H01J37/32642 ,  H01L21/67069 ,  H01L21/68735 ,  Y10S156/915

    摘要： A confinement ring coupling arrangement for coupling, in a plasma processing chamber, a confinement ring to a plunger. The plunger is configured to move the confinement ring to deploy and stow the confinement ring to facilitate processing of a substrate within the plasma processing chamber. The confinement ring coupling arrangement includes a hanger adapter having a locking head, the hanger adapter being configured to be coupled with the plunger. The confinement ring coupling arrangement further includes a hanging bore disposed in the confinement ring and configured to receive the locking head and to secure the locking head within the hanging bore during stowing and deployment of the confinement ring, wherein a diameter of the locking head is sufficiently smaller than a cross-section dimension of the hanging bore to prevent a sidewall of the locking head from scraping against a sidewall of the hanging bore during the stowing and deployment of the confinement ring.

    摘要翻译： 一种限制环联接装置，用于在等离子体处理室中将限制环耦合到柱塞。 柱塞构造成移动限制环以展开和收起限制环，以便于处理等离子体处理室内的衬底。 所述限制环联接装置包括具有锁定头的衣架适配器，所述衣架适配器构造成与所述柱塞联接。 约束环联接装置还包括设置在限制环中并被配置为容纳锁定头并且在收集和展开限制环期间将锁定头固定在悬挂孔内的悬挂孔，其中锁定头的直径足够 小于悬挂孔的横截面尺寸，以防止在限制环的收起和展开期间锁定头的侧壁刮擦悬挂孔的侧壁。

    Confinement ring support assembly
    5.
    发明授权
    Confinement ring support assembly 有权
    限位环支撑组件

    公开(公告)号：US06926803B2

    公开(公告)日：2005-08-09

    申请号：US10418245

    申请日：2003-04-16

    申请人： Jerrel K. Antolik

    发明人： Jerrel K. Antolik

    IPC分类号： H01J37/32 ,  H01L21/00 ,  C23C16/00

    CPC分类号： H01L21/67069 ,  H01J37/32642 ,  Y10S156/915

    摘要： A confinement ring support assembly for coupling together a plurality of confinement rings in a plasma processing chamber. The confinement ring support assembly includes a post having first end and a second end. The post further includes a first lip having an associated first sliding surface, and a second lip having an associated second sliding surface. The first lip is disposed at a first position on the post, the second lip being disposed at a second position at a different arc relative to the first location on the post, the second position being disposed between the first position and the first end along a longitudinal axis of the post. The confinement ring support assembly further includes a first washer configured to move slidably from the first lip past the second lip toward the first end of the post. The first washer has a first cut formed in its interior opening that is configured to engage with the first lip to prevent the first washer from sliding past the first lip in a direction away from the first end and to engage with the first sliding surface associated with the first lip to constrain a rotational movement of the first washer as the washer moves longitudinally along the post.

    摘要翻译： 限制环支撑组件，用于将等离子体处理室中的多个限制环连接在一起。 限制环支撑组件包括具有第一端和第二端的柱。 该柱还包括具有相关联的第一滑动表面的第一唇缘和具有相关联的第二滑动表面的第二唇部。 第一唇缘设置在柱上的第一位置处，第二唇缘相对于柱上的第一位置以不同的弧度设置在第二位置，第二位置沿着第一位置沿第一位置沿第一位置 柱的纵轴。 约束环支撑组件还包括第一垫圈，其被配置为可移动地从第一唇缘移动经过第二唇缘朝向柱的第一端。 第一垫圈具有形成在其内部开口中的第一切口，该第一切口被构造成与第一唇缘接合，以防止第一垫圈沿远离第一端的方向滑过第一唇缘并与第一切口相关联的第一滑动面 当垫圈沿着柱纵向移动时，限制第一垫圈的旋转运动的第一唇缘。

    Twist-N-Lock wafer area pressure ring and assembly
    7.
    发明授权
    Twist-N-Lock wafer area pressure ring and assembly 有权
    扭锁N型晶圆面积压力环和组装

    公开(公告)号：US07211170B2

    公开(公告)日：2007-05-01

    申请号：US09916784

    申请日：2001-07-27

    申请人： Jerrel K. Antolik

    发明人： Jerrel K. Antolik

    IPC分类号： H01L21/00 ,  C23C16/00

    CPC分类号： H01L21/68721 ,  H01L21/68728 ,  Y10S156/915

    摘要： Wafer area pressure rings used to confine plasma in plasma processing chambers which are manufactured with bores therein such that replacement of the pressure rings during routine or repair maintenance is significantly eased. The bores allows the pressure rings to be installed by simply aligning the bores under hanging adapters which are connected to the ceiling of the chamber, lifting the rings such that the hanging adapters enter the ring, turning or twisting the entire apparatus a miniscule amount, and then lowering the ring apparatus on the hanging apparatus, thereby locking the rings in place.

    摘要翻译： 用于将等离子体限制在等离子体处理室中的晶圆区域压力环，所述等离子体处理室在其中由孔制造，使得在日常维护或修理维护期间更换压力环是显着的。 孔可以通过简单地将连接到腔室顶部的悬挂适配器下的孔对准来提升压力环，提升环，使得悬挂适配器进入环，使整个装置转动或扭转微小量，以及 然后将挂钩装置上的环形装置降低，从而将环锁定在适当位置。