Complex malodor removing equipment

    公开(公告)号:US10512878B2

    公开(公告)日:2019-12-24

    申请号:US15769740

    申请日:2016-02-23

    摘要: A complex malodor removing equipment includes: a neutralizing module which dissolves a portion of malodor-causing substances, in malodorous gas introduced from malodor-producing equipment, in liquid water and removes same, which includes an acidity neutralizing module that introduces an alkaline substance from outside and removes an acidic malodor-causing substance from the malodor-causing substances, and an alkaline neutralizing module that introduces an acidic substance from outside and removes an alkaline malodor-causing substance from the malodor-causing substances, and which connects the acidity neutralizing module and the alkaline neutralizing module; and a balancing module which dissolves the remainder of the malodor-causing substances, in the malodorous gas introduced from the neutralizing module, in water and removes same, which includes an oxidation balancing module that introduces an oxidizing agent from outside and balances the malodor-causing substances, and a reduction balancing module that introduces a reducing agent from outside and balances the malodor-causing substances.

    COMPLEX MALODOR REMOVING EQUIPMENT
    2.
    发明申请

    公开(公告)号:US20180311606A1

    公开(公告)日:2018-11-01

    申请号:US15769740

    申请日:2016-02-23

    摘要: A complex malodor removing equipment includes: a neutralizing module which dissolves a portion of malodor-causing substances, in malodorous gas introduced from malodor-producing equipment, in liquid water and removes same, which includes an acidity neutralizing module that introduces an alkaline substance from outside and removes an acidic malodor-causing substance from the malodor-causing substances, and an alkaline neutralizing module that introduces an acidic substance from outside and removes an alkaline malodor-causing substance from the malodor-causing substances, and which connects the acidity neutralizing module and the alkaline neutralizing module; and a balancing module which dissolves the remainder of the malodor-causing substances, in the malodorous gas introduced from the neutralizing module, in water and removes same, which includes an oxidation balancing module that introduces an oxidizing agent from outside and balances the malodor-causing substances, and a reduction balancing module that introduces a reducing agent from outside and balances the malodor-causing substances.

    Control method of refrigerator
    7.
    发明授权
    Control method of refrigerator 有权
    冰箱控制方法

    公开(公告)号:US09109829B2

    公开(公告)日:2015-08-18

    申请号:US12926262

    申请日:2010-11-04

    IPC分类号: F25C5/00 F25C5/02 F25D29/00

    摘要: A control method of a refrigerator to prevent frost from being formed in an ice making chamber. The refrigerator includes an ice making chamber refrigerant pipe to supply a refrigerant to make ice in a direct cooling manner and an ice making chamber circulation fan to create a forced air stream to circulate air in the ice making chamber. The control method includes determining whether temperature of the ice making chamber is lower than a predetermined temperature and driving the ice making chamber circulation fan in a state in which the temperature of the ice making chamber is lower than the predetermined temperature and the refrigerant flows in the ice making chamber refrigerant pipe or when flow of the refrigerant in the ice making chamber refrigerant pipe is interrupted in a state in which the temperature of the ice making chamber is lower than the predetermined temperature.

    摘要翻译: 一种用于防止在制冰室中形成霜冻的冰箱的控制方法。 冰箱包括制冰室制冷剂管,供应制冷剂以直接冷却方式制冰,并且制冰室循环风扇产生强制空气流以使制冰室中的空气循环。 控制方法包括:确定制冰室的温度是否低于预定温度,并且在制冰室的温度低于预定温度的状态下驱动制冰室循环风扇,并且制冷剂在 制冰室制冷剂管道或制冰室制冷剂管道中的制冷剂的流动在制冰室的温度低于预定温度的状态下中断。

    Lateral flow atomic layer deposition apparatus and atomic layer deposition method using the same
    8.
    发明授权
    Lateral flow atomic layer deposition apparatus and atomic layer deposition method using the same 有权
    横流原子层沉积装置和使用其的原子层沉积方法

    公开(公告)号:US09062375B2

    公开(公告)日:2015-06-23

    申请号:US13587061

    申请日:2012-08-16

    IPC分类号: C23C16/00 C23C16/455

    摘要: A lateral flow atomic layer deposition (ALD) apparatus has two gas inflow channels and two gas outflow channels that are connected to two gas outlets that are symmetrically formed based on a substrate in which a thin film is deposited, thereby differently guiding a flow direction of a gas flowing on the substrate. Therefore, uniformity of a deposited film is improved, compared with the conventional lateral flow ALD apparatus in which a supplied source gas and reaction gas constantly flow in only one direction on the substrate.

    摘要翻译: 侧流原子层沉积(ALD)装置具有两个气体流入通道和两个气体流出通道,其连接到基于其中沉积薄膜的基底对称形成的两个气体出口,从而不同地引导流动方向 在基板上流动的气体。 因此,与供给的原料气体和反应气体在基板上仅沿一个方向恒定流动的常规侧流ALD装置相比,沉积膜的均匀性得到改善。