公开(公告)号：US08363320B2

公开(公告)日：2013-01-29

申请号：US13095758

申请日：2011-04-27

申请人： Dean Jennings ,  Timothy N. Thomas ,  Stephen Moffatt ,  Jiping Li ,  Bruce E. Adams ,  Samuel C. Howells

发明人： Dean Jennings ,  Timothy N. Thomas ,  Stephen Moffatt ,  Jiping Li ,  Bruce E. Adams ,  Samuel C. Howells

IPC分类号： G02B5/30

CPC分类号： G02B27/28 ,  G02B27/283 ,  G02B27/48

摘要： A method and apparatus for decorrelating coherent light from a light source, such as a pulsed laser, in both time and space in an effort to provide intense and uniform illumination are provided. The techniques and apparatus described herein may be incorporated into any application where intense, uniform illumination is desired, such as pulsed laser annealing, welding, ablating, and wafer stepper illuminating.

摘要翻译： 提供了一种用于在时间和空间上从光源（例如脉冲激光）去除相干光的方法和装置，以提供强烈和均匀的照明。 本文描述的技术和装置可以并入任何需要强烈均匀照明的应用中，例如脉冲激光退火，焊接，烧蚀和晶片步进照明。

公开(公告)号：US20120308215A1

公开(公告)日：2012-12-06

申请号：US13153135

申请日：2011-06-03

申请人： Jiping Li

发明人： Jiping Li

IPC分类号： F27D11/12

CPC分类号： F27B17/0025 ,  F27D19/00 ,  F27D21/00

摘要： Apparatus and methods for detecting substrate warping during RTP processing are provided. In one embodiment, one or more beams of light are provided above and across the substrate being processed. In this embodiment, the amount of beam blockage correlates to the amount of substrate warping. In another embodiment, a beam of light is reflected off of a substrate during processing. In this embodiment, the amount of movement of the beam correlates to the amount of substrate warping. In yet another embodiment, a region of a substrate is illuminated during processing. In this embodiment, images of the illuminated region are analyzed to determine the amount of substrate warping.

摘要翻译： 提供了用于在RTP处理期间检测基板翘曲的装置和方法。 在一个实施例中，一个或多个光束被提供在被处理的衬底之上和之上。 在该实施例中，光束阻塞的量与基板翘曲的量相关。 在另一个实施例中，在处理期间，光束被从衬底反射出来。 在该实施例中，光束的移动量与基板翘曲量相关。 在另一个实施例中，衬底的区域在处理期间被照亮。 在该实施例中，分析照明区域的图像以确定基板翘曲的量。

公开(公告)号：US08067302B2

公开(公告)日：2011-11-29

申请号：US12563746

申请日：2009-09-21

申请人： Jiping Li

发明人： Jiping Li

IPC分类号： H01L21/26

CPC分类号： H01L21/265 ,  H01J37/32357 ,  H01J37/32412 ,  H01L21/26513 ,  H01L21/324

摘要： A method and apparatus for implanting a semiconductor substrate with boron clusters. A substrate is implanted with octadecaborane by plasma immersion or ion beam implantation. The substrate surface is then melted, resolidified, and annealed to completely dissociate and activate the boron clusters.

摘要翻译： 一种用硼簇植入半导体衬底的方法和装置。 通过等离子体浸渍或离子束注入，注入十八硼烷衬底。 然后将衬底表面熔化，重新固化和退火，以完全解离并活化硼簇。

公开(公告)号：US20110212742A1

公开(公告)日：2011-09-01

申请号：US13106272

申请日：2011-05-12

申请人： De CHEN ,  Jiping Li

发明人： De CHEN ,  Jiping Li

IPC分类号： H04W24/04

CPC分类号： H04W76/28 ,  H04W52/0206 ,  H04W52/0216 ,  Y02D70/1262 ,  Y02D70/24 ,  Y02D70/25

摘要： The present invention relates to mobile communication technologies, and in particular, to a method, base station and system for sending information. The method includes: obtaining discontinuous reception (DRX) parameter of a terminal; determining discontinuous transmission (DTX) parameter of the base station according to the DRX parameter; and sending pilot and broadcast information periodically according to the DTX parameter. The technical solution under the present invention saves time-frequency resources, reduces interference on neighboring cells, and saves electric power.

摘要翻译： 本发明涉及移动通信技术，特别涉及用于发送信息的方法，基站和系统。 该方法包括：获得终端的不连续接收（DRX）参数; 根据DRX参数确定基站的不连续传输（DTX）参数; 并根据DTX参数定期发送导频和广播信息。 本发明的技术方案节省了时间频率资源，减少了对相邻小区的干扰，节省了电力。

公开(公告)号：US20110199683A1

公开(公告)日：2011-08-18

申请号：US13095758

申请日：2011-04-27

申请人： Dean Jennings ,  Timothy N. Thomas ,  Stephen Moffatt ,  Jiping Li ,  Bruce E. Adams ,  Samuel C. Howells

发明人： Dean Jennings ,  Timothy N. Thomas ,  Stephen Moffatt ,  Jiping Li ,  Bruce E. Adams ,  Samuel C. Howells

IPC分类号： G02B27/28

CPC分类号： G02B27/28 ,  G02B27/283 ,  G02B27/48

摘要： A method and apparatus for decorrelating coherent light from a light source, such as a pulsed laser, in both time and space in an effort to provide intense and uniform illumination are provided. The techniques and apparatus described herein may be incorporated into any application where intense, uniform illumination is desired, such as pulsed laser annealing, welding, ablating, and wafer stepper illuminating.

摘要翻译： 提供了一种用于在时间和空间上从光源（例如脉冲激光）去除相干光的方法和装置，以提供强烈和均匀的照明。 本文描述的技术和装置可以并入任何需要强烈均匀照明的应用中，例如脉冲激光退火，焊接，烧蚀和晶片步进照明。

公开(公告)号：US20100266268A1

公开(公告)日：2010-10-21

申请号：US12762351

申请日：2010-04-18

申请人： Dean C. Jennings ,  Timothy N. Thomas ,  Samuel C. Howells ,  Bruce E. Adams ,  Jiping Li

发明人： Dean C. Jennings ,  Timothy N. Thomas ,  Samuel C. Howells ,  Bruce E. Adams ,  Jiping Li

IPC分类号： H05B1/00 ,  G02B27/12 ,  G02F1/37

CPC分类号： H01L21/67115 ,  B23K26/0006 ,  B23K26/0622 ,  B23K26/0648 ,  B23K26/0652 ,  B23K26/12 ,  B23K26/125 ,  B23K26/127 ,  B23K26/352 ,  B23K26/354 ,  B23K2101/40 ,  B23K2103/56 ,  G02B27/0927 ,  G02B27/0961 ,  H01L21/02678 ,  H01L21/02686 ,  H01L21/268

摘要： Substrate processing equipment and methods are used to improve the uniformity of illumination across an illuminated portion of a substrate by processing light with multiple optical homogenizers. The multiple optical homogenizers each include micro-lens arrays and Fourier lens. The multiple optical homogenizers are arranged so that the output numerical aperture of one of the optical homogenizers is within 5% of the input numerical aperture of another optical homogenizer.

摘要翻译： 基板处理设备和方法用于通过用多个光学均化器处理光线来改善衬底的照射部分上的照明的均匀性。 多个光学均质器各自包括微透镜阵列和傅里叶透镜。 多个光学均质器被布置成使得一个光学均质器的输出数值孔径在另一个光学均化器的输入数值孔径的5％内。

公开(公告)号：US07804042B2

公开(公告)日：2010-09-28

申请号：US11764738

申请日：2007-06-18

申请人： Jiping Li ,  Bruce E. Adams ,  Timothy N. Thomas ,  Aaron Muir Hunter ,  Abhilash J. Mayur ,  Rajesh S. Ramanujam

发明人： Jiping Li ,  Bruce E. Adams ,  Timothy N. Thomas ,  Aaron Muir Hunter ,  Abhilash J. Mayur ,  Rajesh S. Ramanujam

IPC分类号： B23K26/00

CPC分类号： B23K26/0665 ,  B23K26/03 ,  B23K26/032 ,  B23K26/034 ,  B23K26/18 ,  B23K2101/40

摘要： In a laser annealing system for workpieces such as semiconductor wafers, a pyrometer wavelength response band is established within a narrow window lying between the laser emission band and a fluorescence emission band from the optical components of the laser system, the pyrometer response band lying in a wavelength region at which the optical absorber layer on the workpiece has an optical absorption coefficient as great as or greater than the underlying workpiece. A multi-layer razor-edge interference filter having a 5-8 nm wavelength cut-off edge transition provides the cut-off of the laser emission at the bottom end of the pyrometer response band.

摘要翻译： 在用于诸如半导体晶片的工件的激光退火系统中，在位于激光发射带和来自激光系统的光学部件的荧光发射带之间的狭窄窗口内建立高温计波长响应带，高温计响应带位于 工件上的光吸收层的光吸收系数大于或大于下面工件的波长区域。 具有5-8nm波长截止边缘跃迁的多层剃刀边缘干涉滤光器提供在高温计响应带的底端处的激光发射的截止。

公开(公告)号：US20100075490A1

公开(公告)日：2010-03-25

申请号：US12563746

申请日：2009-09-21

申请人： Jiping Li

发明人： Jiping Li

IPC分类号： H01L21/26

CPC分类号： H01L21/265 ,  H01J37/32357 ,  H01J37/32412 ,  H01L21/26513 ,  H01L21/324

摘要： A method and apparatus for implanting a semiconductor substrate with boron clusters. A substrate is implanted with octadecaborane by plasma immersion or ion beam implantation. The substrate surface is then melted, resolidified, and annealed to completely dissociate and activate the boron clusters.

摘要翻译： 一种用硼簇植入半导体衬底的方法和装置。 通过等离子体浸渍或离子束注入，注入十八硼烷衬底。 然后将衬底表面熔化，重新固化和退火，以完全解离并活化硼簇。

公开(公告)号：US20090034071A1

公开(公告)日：2009-02-05

申请号：US11831830

申请日：2007-07-31

申请人： DEAN JENNINGS ,  Timothy N. Thomas ,  Stephen Moffatt ,  Jiping Li ,  Bruce E. Adams ,  Samuel C. Howells

发明人： DEAN JENNINGS ,  Timothy N. Thomas ,  Stephen Moffatt ,  Jiping Li ,  Bruce E. Adams ,  Samuel C. Howells

IPC分类号： G02B27/28 ,  G02B27/14

CPC分类号： G02B27/283 ,  B23K26/0604 ,  B23K26/0613 ,  B23K26/0622 ,  B23K26/067 ,  G02B27/10 ,  G02B27/144 ,  G02B27/145 ,  G02B27/48 ,  H01L21/268 ,  H01L21/67115

摘要： A method and apparatus for decorrelating coherent light from a light source, such as a pulsed laser, in both time and space in an effort to provide intense and uniform illumination are provided. For some embodiments employing a pulsed light source, the output pulse may be stretched relative to the input pulse width. The methods and apparatus described herein may be incorporated into any application where intense, uniform illumination is desired, such as pulsed laser annealing, welding, ablating, and wafer stepper illuminating.

摘要翻译： 提供了一种用于在时间和空间上从光源（例如脉冲激光）去除相干光的方法和装置，以提供强烈和均匀的照明。 对于采用脉冲光源的一些实施例，可以相对于输入脉冲宽度拉伸输出脉冲。 本文描述的方法和装置可以结合到需要强烈均匀照明的任何应用中，例如脉冲激光退火，焊接，烧蚀和晶片步进照明。

公开(公告)号：US20080308534A1

公开(公告)日：2008-12-18

申请号：US11764738

申请日：2007-06-18

申请人： Jiping Li ,  Bruce E. Adams ,  Timothy N. Thomas ,  Aaron Muir Hunter ,  Abhilash J. Mayur ,  Rajesh S. Ramanujam

发明人： Jiping Li ,  Bruce E. Adams ,  Timothy N. Thomas ,  Aaron Muir Hunter ,  Abhilash J. Mayur ,  Rajesh S. Ramanujam

IPC分类号： B23K26/08 ,  H01L21/66

CPC分类号： B23K26/0665 ,  B23K26/03 ,  B23K26/032 ,  B23K26/034 ,  B23K26/18 ,  B23K2101/40

摘要： In a laser annealing system for workpieces such as semiconductor wafers, a pyrometer wavelength response band is established within a narrow window lying between the laser emission band and a fluorescence emission band from the optical components of the laser system, the pyrometer response band lying in a wavelength region at which the optical absorber layer on the workpiece has an optical absorption coefficient as great as or greater than the underlying workpiece. A multi-layer razor-edge interference filter having a 5-8 nm wavelength cut-off edge transition provides the cut-off of the laser emission at the bottom end of the pyrometer response band.

摘要翻译： 在用于诸如半导体晶片的工件的激光退火系统中，在位于激光发射带和来自激光系统的光学部件的荧光发射带之间的狭窄窗口内建立高温计波长响应带，高温计响应带位于 工件上的光吸收层的光吸收系数大于或大于下面工件的波长区域。 具有5-8nm波长截止边缘跃迁的多层剃刀边缘干涉滤光器提供在高温计响应带的底端处的激光发射的截止。