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公开(公告)号:US20100128367A1
公开(公告)日:2010-05-27
申请号:US12403526
申请日:2009-03-13
申请人: Mariella Beckenbach , Klaus Rief , Andreas Bertele , Benjamin Sigel , Sascha Bleidistel , Wolfgang Hummel , Andreas Frommeyer , Toralf Gruner , Jochen Schwaer , Baerbel Schwaer , Thomas Schletterer , Artur Hoegele , Armin Schoeppach
发明人: Mariella Beckenbach , Klaus Rief , Andreas Bertele , Benjamin Sigel , Sascha Bleidistel , Wolfgang Hummel , Andreas Frommeyer , Toralf Gruner , Jochen Schwaer , Baerbel Schwaer , Thomas Schletterer , Artur Hoegele , Armin Schoeppach
IPC分类号: G02B7/02
CPC分类号: G03F7/70825 , G02B7/023 , G02B13/14 , G02B27/0068 , G03F7/70058 , G03F7/70266
摘要: A projection objective for a microlithography apparatus with improved imaging properties is provided. A manipulator for a projection objective is provided. A microlithography apparatus including a projection objective of this type and/or a manipulator of this type is provided. A method for improving the imaging properties of a projection objective is provided.
摘要翻译: 提供了具有改善的成像特性的微光刻设备的投影物镜。 提供了一种用于投影物镜的操纵器。 提供包括这种类型的投影物镜和/或这种类型的操纵器的微光刻设备。 提供了一种用于改善投影物镜的成像特性的方法。