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    Substrate Processing Apparatus and Device Manufacturing Method
    1.
    发明申请
    Substrate Processing Apparatus and Device Manufacturing Method 审中-公开
    基板加工装置及装置制造方法

    公开(公告)号：US20090148604A1

    公开(公告)日：2009-06-11

    申请号：US12271362

    申请日：2008-11-14

    申请人： Raimond VISSER ,  Pieter Renaat Maria Hennus ,  Johannes Hendrikus Gertrudis Franssen ,  Erwin Theodorus Jacoba Verhagen

    发明人： Raimond VISSER ,  Pieter Renaat Maria Hennus ,  Johannes Hendrikus Gertrudis Franssen ,  Erwin Theodorus Jacoba Verhagen

    IPC分类号： B05D3/00 ,  C23C14/00

    CPC分类号： H01L21/67201 ,  G03F7/70841

    摘要： An exemplary substrate processing apparatus has a vacuum chamber and a load lock for gas removal. The load lock has a support table to support a substrate. A cover plate may be provided in the load lock, the cover plate having a lower surface facing the upper surface of the support table. Openings may be provided in the lower surface of the cover plate to allow removal of gas from over the substrate in a direction substantially normal to the lower surface. In an embodiment, a gas pressure between the upper surface of the support table and the substrate is initially reduced through the opening to a certain pressure below a concurrent load lock pressure. When the remainder of the load lock pressure has dropped below the certain, gas pressure between the upper surface of the support table and the substrate is reduced together with the remainder load lock pressure.

    摘要翻译： 示例性的基板处理装置具有真空室和用于除气的装载锁。 负载锁具有支撑台以支撑基板。 盖板可以设置在装载锁中，盖板具有面向支撑台的上表面的下表面。 可以在盖板的下表面中设置开口，以允许基本上垂直于下表面的方向从基板上除去气体。 在一个实施例中，支撑台的上表面和基板之间的气体压力最初通过开口减小到低于同时的负载锁定压力的一定压力。 当负载锁定压力的其余部分已经下降到特定值以下时，支撑台的上表面和基板之间的气体压力与剩余的负载锁定压力一起减小。

    Particle detection device, lithographic apparatus and device manufacturing method
    3.
    发明授权
    Particle detection device, lithographic apparatus and device manufacturing method 失效
    粒子检测装置，光刻设备及器件制造方法

    公开(公告)号：US07283225B2

    公开(公告)日：2007-10-16

    申请号：US11242146

    申请日：2005-10-04

    申请人： Johannes Onvlee ,  Raimond Visser ,  Peter Ferdinand Greve ,  Johannes Hendrikus Gertrudis Franssen ,  Erwin Theodorus Jacoba Verhagen

    发明人： Johannes Onvlee ,  Raimond Visser ,  Peter Ferdinand Greve ,  Johannes Hendrikus Gertrudis Franssen ,  Erwin Theodorus Jacoba Verhagen

    IPC分类号： G01N21/00

    CPC分类号： G03F7/70916 ,  G01N21/94 ,  G01N21/956 ,  G03F7/7085

    摘要： To enable differentiation between a particle and a ghost particle, a detector system resolves radiation from a ghost particle from radiation from an actual particle. The detector system outputs at least two detector signals corresponding to intensities of radiation being incident on different parts of the detector system or the detector system outputs at least two detector signals corresponding to intensities of radiation with different wavelengths being incident on the detector system. If radiation is received from a ghost particle, not each of the at least two detector signals has a level above a predetermined threshold level, whereas radiation received from a particle results in the signals having substantially a same level above a threshold level. The detector system may include a radiation detector device configured to generate the first detector signal in response to radiation incident on at least one predetermined part of the radiation detector device and a radiation blocking assembly configured to prevent radiation not originating from a particle from being incident on the predetermined part of the detector device.

    摘要翻译： 为了能够区分粒子和重影粒子，检测器系统从实际粒子的辐射中解析来自重影粒子的辐射。 检测器系统输出对应于入射在检测器系统的不同部分上的辐射强度的至少两个检测器信号，或者检测器系统输出对应于不同波长的辐射强度入射在检测器系统上的至少两个检测器信号。 如果从重影粒子接收到辐射，则并非所述至少两个检测器信号中的每一个具有高于预定阈值电平的电平，而从粒子接收的辐射导致信号具有高于阈值电平的基本上相同的电平。 检测器系统可以包括辐射检测器装置，其被配置为响应于入射到辐射检测器装置的至少一个预定部分上的辐射而产生第一检测器信号;以及辐射阻挡组件，其被配置为防止不是源自颗粒的辐射被入射 检测器装置的预定部分。

    Lithographic projection assembly, load lock and method for transferring objects
    7.
    发明授权
    Lithographic projection assembly, load lock and method for transferring objects 有权
    光刻投影组件，负载锁定和传送对象的方法

    公开(公告)号：US07359031B2

    公开(公告)日：2008-04-15

    申请号：US10797725

    申请日：2004-03-11

    申请人： Albert Jan Hendrik Klomp ,  Jan Frederik Hoogkamp ,  Josephus Cornelius Johannes Antonius Vugts ,  Robert Gordon Livesey ,  Johannes Hendrikus Gertrudis Franssen

    发明人： Albert Jan Hendrik Klomp ,  Jan Frederik Hoogkamp ,  Josephus Cornelius Johannes Antonius Vugts ,  Robert Gordon Livesey ,  Johannes Hendrikus Gertrudis Franssen

    IPC分类号： G03B27/42 ,  G03B27/58

    CPC分类号： G03F7/70975 ,  G03F7/7075 ,  G03F7/70858 ,  G03F7/70991

    摘要： Lithographic projection assembly, including at least one load lock for transferring objects, in particular substrates, between a first environment and a second environment, the second environment preferably having a lower pressure than the first environment; an object handler including a handler chamber in which the second environment prevails; and a lithographic projection apparatus including a projection chamber. The handler chamber and projection chamber can communicate for transferring the objects. The load lock includes a load lock chamber; evacuation device for evacuating the load lock chamber; and door device for closing the load lock chamber during evacuation and for opening the load lock chamber to enter an object in or remove an object from the load lock chamber. The load lock chamber may be provided with at least two mutually distinct object support positions.

    摘要翻译： 光刻投影组件包括用于在第一环境和第二环境之间传送物体，特别是基底的至少一个装载锁，所述第二环境优选地具有比所述第一环境更低的压力; 一个对象处理器，包括处理器室，其中第二个环境占优势; 以及包括投影室的光刻投影装置。 处理器室和投影室可以通信用于传送物体。 负载锁包括一个负载锁定室; 排气装置，用于排空负载锁定室; 以及门装置，用于在排气期间关闭装载锁定室，并且用于打开装载锁定室以将物体进入物体或将其从装载锁定室移除。 负载锁定室可以设置有至少两个相互不同的物体支撑位置。

    Particle detection device, lithographic apparatus and device manufacturing method
    8.
    发明授权
    Particle detection device, lithographic apparatus and device manufacturing method 失效
    粒子检测装置，光刻设备及器件制造方法

    公开(公告)号：US07349082B2

    公开(公告)日：2008-03-25

    申请号：US10957752

    申请日：2004-10-05

    申请人： Johannes Onvlee ,  Peter Ferdinand Greve ,  Johannes Hendrikus Gertrudis Franssen

    发明人： Johannes Onvlee ,  Peter Ferdinand Greve ,  Johannes Hendrikus Gertrudis Franssen

    IPC分类号： G01N21/00

    CPC分类号： G03F7/70916 ,  G01N21/94 ,  G01N21/956 ,  G03F7/7085

    摘要： To enable differentiation between a particle and a ghost particle, a detector system is presented. The detector system is configured to output at least two detector signals corresponding to an intensity of radiation being incident on the detector system. If radiation is received from a ghost particle, not all of the at least two detector signals has a level above a predetermined threshold level, whereas radiation received from a contaminating particle results in all signals having a level above a threshold level. Thus, it may be determined with a high accuracy whether a particle or a ghost particle is redirecting radiation towards the detector system.

    摘要翻译： 为了实现粒子和鬼粒子之间的区分，提出了一种检测器系统。 检测器系统被配置为输出对应于入射在检测器系统上的辐射强度的至少两个检测器信号。 如果从重影颗粒接收到辐射，则并非所有至少两个检测器信号都具有高于预定阈值水平的水平，而从污染颗粒接收的辐射导致所有信号具有高于阈值水平的水平。 因此，可以高精度地确定颗粒或重影颗粒是否朝向检测器系统重定向辐射。