公开(公告)号：US20060227310A1

公开(公告)日：2006-10-12

申请号：US11384824

申请日：2006-03-21

申请人： Erik Buurman ,  Thomas Castenmiller ,  Johannes Wilhelmus Teeuwsen ,  Bearrach Moest ,  Marc Haast

发明人： Erik Buurman ,  Thomas Castenmiller ,  Johannes Wilhelmus Teeuwsen ,  Bearrach Moest ,  Marc Haast

IPC分类号： G03F7/00

CPC分类号： G03F7/70575 ,  G03F7/70641 ,  G03F9/7026

摘要： A method and apparatus make use of data representing changes in wavelength of a radiation source to provide control of focal plane position or to provide correction of sensor data. In the first aspect, the wavelength variation data is provided to control systems that control focus by moving apparatus components including, for example, the mask table, the substrate table or optical elements of the projection optical system. In the second aspect, variation data is used in correcting, e.g., focal plane position data measured by an inboard sensor, such as a transmitted image sensor. The two aspects may be combined in a single apparatus or may be used separately.

摘要翻译： 一种方法和装置利用表示辐射源的波长变化的数据来提供焦平面位置的控制或提供传感器数据的校正。 在第一方面中，波长变化数据被提供给通过移动包括例如掩模台，基板台或投影光学系统的光学元件的装置部件来控制焦点的控制系统。 在第二方面，变化数据用于校正例如由诸如传输图像传感器的内部传感器测量的焦平面位置数据。 这两个方面可以组合在单个装置中或者可以单独使用。

公开(公告)号：US20060215134A1

公开(公告)日：2006-09-28

申请号：US11086667

申请日：2005-03-23

申请人： Erik Buurman ,  Thomas Castenmiller ,  Johannes Wilhelmus Teeuwsen ,  Bearrach Moest ,  Mare Haast

发明人： Erik Buurman ,  Thomas Castenmiller ,  Johannes Wilhelmus Teeuwsen ,  Bearrach Moest ,  Mare Haast

IPC分类号： G03F7/20

CPC分类号： G03F7/70575 ,  G03F7/70641 ,  G03F9/7026

摘要： A method and apparatus make use of data representing changes in wavelength of a radiation source to provide control of focal plane position or to provide correction of sensor data. In the first aspect, the wavelength variation data is provided to control systems that control focus by moving apparatus components including, for example, the mask table, the substrate table or optical elements of the projection optical system. In the second aspect, variation data is used in correcting, e.g., focal plane position data measured by a transmitted image sensor. The two aspects may be combined in a single apparatus or may be used separately.

公开(公告)号：US20060170899A1

公开(公告)日：2006-08-03

申请号：US11316346

申请日：2005-12-23

申请人： Robertus Cornelis De Kruif ,  Richard Bruls ,  Johannes Wilhelmus Teeuwsen ,  Erik Buurman

发明人： Robertus Cornelis De Kruif ,  Richard Bruls ,  Johannes Wilhelmus Teeuwsen ,  Erik Buurman

IPC分类号： G03B27/72

CPC分类号： G03F7/70625 ,  G03F7/70575

摘要： A CD-pitch dependency for a lithographic pattern printing process is related to the spectral intensity distribution of radiation used for projecting the pattern. A CD-pitch dependency can vary from one system to another. This can result in an iso-dense bias mismatch between systems. The invention addresses this problem by providing a lithographic apparatus including an illumination system for providing a projection beam of radiation, a projection system for projecting a patterned beam onto a target portion of a substrate, and a substrate table for holding the substrate, with a controller to provide an adjustment of the spectral distribution of radiant intensity of the projection beam. The adjustment of the spectral intensity distribution is based on data relating to an iso dense bias, and comprises a broadening of the spectral bandwidth or a change of shape of the spectral intensity distribution.