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    APPARATUS AND METHODS FOR CONTINUOUSLY DEPOSITING A PATTERN OF MATERIAL ONTO A SUBSTRATE
    4.
    发明申请
    APPARATUS AND METHODS FOR CONTINUOUSLY DEPOSITING A PATTERN OF MATERIAL ONTO A SUBSTRATE 审中-公开
    将材料图案连续沉积到基材上的装置和方法

    公开(公告)号：US20080011225A1

    公开(公告)日：2008-01-17

    申请号：US11456687

    申请日：2006-07-11

    Applicant: Donald J. McClure ,  Jeffrey H. Tokie ,  Daniel H. Carlson ,  James N. Dobbs ,  John T. Strand ,  Ronald P. Swanson

    Inventor： Donald J. McClure ,  Jeffrey H. Tokie ,  Daniel H. Carlson ,  James N. Dobbs ,  John T. Strand ,  Ronald P. Swanson

    IPC: B05C1/00 ,  B05C11/11

    CPC classification number: H05K3/143 ,  C23C14/042 ,  C23C14/54 ,  C23C14/562 ,  H05K1/0393 ,  H05K3/0008 ,  H05K2201/09918 ,  H05K2203/0134 ,  H05K2203/0143 ,  H05K2203/1545

    Abstract: A pattern of material is continuously deposited onto a substrate. The substrate and a mask are continuously brought together over a portion of a drum where a deposition source emits material. The mask includes apertures that form a pattern, and the material from the deposition source passes through the pattern of the mask and collects onto the substrate to form the pattern of material. The elongation and the transverse position of the substrate and the mask may be controlled. Pattern elements of the substrate and of the mask may be sensed in order to adjust the elongation and/or the transverse position of the substrate and/or mask to maintain a precise registration. Furthermore, the apertures may have a least dimension on the order of 100 microns or less to thereby create features on the substrate having least dimensions on the order of 100 microns or less.

    Abstract translation: 材料的图案被连续沉积到基底上。 衬底和掩模在沉积源发射材料的鼓的一部分上连续地接合在一起。 掩模包括形成图案的孔，并且来自沉积源的材料穿过掩模的图案并收集到基底上以形成材料图案。 可以控制衬底和掩模的伸长率和横向位置。 可以感测衬底和掩模的图案元件以调节衬底和/或掩模的伸长率和/或横向位置以保持精确的配准。 此外，孔可以具有大约100微米或更小的最小尺寸，从而在基底上产生具有小于或等于100微米的最小尺寸的特征。

    Apparatus and method for making microreplicated article
    6.
    发明授权
    Apparatus and method for making microreplicated article 有权
    制备微复制品的装置和方法

    公开(公告)号：US07444932B2

    公开(公告)日：2008-11-04

    申请号：US11369486

    申请日：2006-03-06

    Applicant: John T. Strand ,  Serge Wetzels

    Inventor： John T. Strand ,  Serge Wetzels

    IPC: B31F1/07 ,  B41F19/02 ,  B44B5/00 ,  B28B17/00 ,  B28B13/00

    CPC classification number: B05C1/0808 ,  B05C1/083 ,  B29C59/046 ,  B29C2035/0827 ,  B29C2059/023 ,  B29D11/00278 ,  B44B5/00 ,  G02B3/0031 ,  G02B5/045

    Abstract: A roll to roll microreplication apparatus is described. This apparatus forms a microreplicated article including a web having first and second opposed surfaces. The apparatus includes a first patterned roll, first nip roll and first coating die; the first coating die is disposed adjacent the web substrate first side and the web substrate is disposed between the first patterned roll and first nip roll. The first nip roll touches the web substrate second side and the first patterned roll touches the web substrate first side. The apparatus includes, a second patterned roll, second nip roll and second coating die, the second coating die is disposed adjacent the web substrate second side and the web substrate is disposed between the second patterned roll and second nip roll. The second nip roll touches the web substrate first side and the second patterned roll touches the web substrate second side. A drive assembly is configured to rotate the first patterned roll and the second patterned roll such that the first and second rolls maintain a continuous registration within 100 micrometers. Methods of making a microreplicated article are also disclosed.

    Abstract translation: 描述了一种卷对卷微复制设备。 该装置形成微复制品，其包括具有第一和第二相对表面的纤维网。 该装置包括第一图案辊，第一压合辊和第一涂覆模; 第一涂布模具设置在纸幅基材第一侧附近，并且幅材基材设置在第一图案化辊和第一压合辊之间。 第一夹辊接触幅材基板第二侧，并且第一图案辊接触幅材基板第一侧。 该设备包括第二图案化辊，第二压合辊和第二涂覆模，第二涂布模设置在纸幅基板第二侧附近，并且幅材基板设置在第二图案化辊和第二压合辊之间。 第二压辊辊接触幅材基板第一侧，第二图案辊接触幅材基板第二侧。 驱动组件被配置为旋转第一图案化辊和第二图案化辊，使得第一和第二辊在100微米内保持连续配准。 还公开了制备微复制物品的方法。

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