METHOD AND APPARATUS FOR IN SITU TESTING OF GAS FLOW CONTROLLERS
    2.
    发明申请
    METHOD AND APPARATUS FOR IN SITU TESTING OF GAS FLOW CONTROLLERS 有权
    用于气体流量控制器测试的方法和装置

    公开(公告)号:US20110011183A1

    公开(公告)日:2011-01-20

    申请号:US12891714

    申请日:2010-09-27

    Abstract: Methods and apparatus utilize a rate of drop in pressure upstream of a gas flow controller (GFC) to accurately measure a rate of flow through the GFC. Measurement of the gas flow through the many gas flow controllers in production use today is enabled, without requiring any special or sophisticated pressure regulators or other special components. Various provisions ensure that none of the changes in pressure that occur during or after the measurement perturb the constant flow of gas through the GFC under test.

    Abstract translation: 方法和设备利用气体流量控制器(GFC)上游压力的下降速率来精确测量通过GFC的流量。 通过今天生产使用中的许多气体流量控制器的气体流量的测量是可以实现的,而不需要任何特殊或复杂的压力调节器或其他特殊部件。 各种规定确保在测量期间或之后发生的压力变化不会影响通过被测GFC的气体的恒定流量。

    Method and apparatus for in situ testing of gas flow controllers
    3.
    发明授权
    Method and apparatus for in situ testing of gas flow controllers 有权
    用于气体流量控制器原位测试的方法和装置

    公开(公告)号:US07823436B2

    公开(公告)日:2010-11-02

    申请号:US12354723

    申请日:2009-01-15

    Abstract: Methods and apparatus utilize a rate of drop in pressure upstream of a gas flow controller (GFC) to accurately measure a rate of flow through the GFC. Measurement of the gas flow through the many gas flow controllers in production use today is enabled, without requiring any special or sophisticated pressure regulators or other special components. Various provisions ensure that none of the changes in pressure that occur during or after the measurement perturb the constant flow of gas through the GFC under test.

    Abstract translation: 方法和设备利用气体流量控制器(GFC)上游压力的下降速率来精确测量通过GFC的流量。 通过今天生产使用中的许多气体流量控制器的气体流量的测量是可以实现的,而不需要任何特殊或复杂的压力调节器或其他特殊部件。 各种规定确保在测量期间或之后发生的压力变化不会影响通过被测GFC的气体的恒定流量。

    Techniques for calibration of gas flows
    4.
    发明授权
    Techniques for calibration of gas flows 有权
    气流校准技术

    公开(公告)号:US07757541B1

    公开(公告)日:2010-07-20

    申请号:US11855052

    申请日:2007-09-13

    CPC classification number: G01F25/0053 G01N21/68

    Abstract: An embodiment of a method in accordance with the present invention to determine the flow rate of a second gas relative to a first gas, comprises, setting a flow of a first gas to a known level, taking a first measurement of the first gas with a measurement technique sensitive to a concentration of the first gas, and establishing a flow of a second gas mixed with the first gas. A second measurement of the first gas is taken with a measurement technique that is sensitive to the concentration of the first gas, and the flow of the second gas is determined by a calculation involving a difference between the first measurement and the second measurement. In alternative embodiments, the first measurement may be taken of a flow of two or more gases combined, with the second measurement taken with one of the gases removed from the mixture. Certain embodiments of methods of the present invention may be employed in sequence in order to determine flow rates of more than two gases.

    Abstract translation: 根据本发明的用于确定第二气体相对于第一气体的流量的方法的实施例包括:将第一气体的流量设定为已知水平,对第一气体进行第一次测量 测量技术对第一气体的浓度敏感,并建立与第一气体混合的第二气体的流动。 采用对第一气体的浓度敏感的测量技术对第一气体进行第二测量,并且通过涉及第一测量和第二测量之间的差的计算来确定第二气体的流量。 在替代实施例中,可以采用组合的两种或多种气体的流动进行第一测量,其中从混合物中除去气体之一进行第二测量。 本发明方法的某些实施方案可以按顺序使用,以确定多于两种气体的流速。

    METHOD AND APPARATUS FOR IDENTIFYING THE CHEMICAL COMPOSITION OF A GAS
    5.
    发明申请
    METHOD AND APPARATUS FOR IDENTIFYING THE CHEMICAL COMPOSITION OF A GAS 有权
    用于识别气体化学成分的方法和装置

    公开(公告)号:US20090180113A1

    公开(公告)日:2009-07-16

    申请号:US12184574

    申请日:2008-08-01

    CPC classification number: G01N7/00 G01N21/68

    Abstract: Embodiments of the present invention relate to the analysis of the components of one or more gases, for example a gas mixture sampled from a semiconductor manufacturing process such as plasma etching or plasma enhanced chemical vapor deposition (PECVD). Particular embodiments provide sufficient power to a plasma of the sample, to dissociate a large number of the molecules and molecular fragments into individual atoms. With sufficient power (typically a power density of between 3-40 W/cm3) delivered into the plasma, most of the emission peaks result from emission of individual atoms, thereby creating spectra conducive to simplifying the identification of the chemical composition of the gases under investigation. Such accurate identification of components of the gas may allow for the precise determination of the stage of the process being performed, and in particular for detection of process endpoint.

    Abstract translation: 本发明的实施例涉及一种或多种气体的组分的分析,例如从诸如等离子体蚀刻或等离子体增强化学气相沉积(PECVD)的半导体制造工艺中采样的气体混合物。 特定的实施方案为样品的等离子体提供足够的功率,以将大量分子和分子片段解离成单独的原子。 通过输送到等离子体中的足够的功率(通常为3-40W / cm 3的功率密度),大多数发射峰由单个原子的发射产生,从而产生有助于简化气体的化学组成的鉴定的光谱 调查 气体组分的这种精确识别可以允许精确确定正在执行的过程的阶段,特别是用于检测过程终点。

    Method and apparatus for in situ testing of gas flow controllers
    7.
    发明授权
    Method and apparatus for in situ testing of gas flow controllers 有权
    用于气体流量控制器原位测试的方法和装置

    公开(公告)号:US08667830B2

    公开(公告)日:2014-03-11

    申请号:US12891714

    申请日:2010-09-27

    Abstract: Methods and apparatus utilize a rate of drop in pressure upstream of a gas flow controller (GFC) to accurately measure a rate of flow through the GFC. Measurement of the gas flow through the many gas flow controllers in production use today is enabled, without requiring any special or sophisticated pressure regulators or other special components. Various provisions ensure that none of the changes in pressure that occur during or after the measurement perturb the constant flow of gas through the GFC under test.

    Abstract translation: 方法和设备利用气体流量控制器(GFC)上游压力的下降速率来精确测量通过GFC的流量。 通过今天生产使用中的许多气体流量控制器的气体流量的测量是可以实现的,而不需要任何特殊或复杂的压力调节器或其他特殊部件。 各种规定确保在测量期间或之后发生的压力变化不会影响通过被测GFC的气体的恒定流量。

    Method and apparatus for the measurement of atmospheric leaks in the presence of chamber outgassing
    8.
    发明授权
    Method and apparatus for the measurement of atmospheric leaks in the presence of chamber outgassing 有权
    在室内除气的情况下测量大气泄漏的方法和装置

    公开(公告)号:US08393197B2

    公开(公告)日:2013-03-12

    申请号:US12509375

    申请日:2009-07-24

    CPC classification number: G01M3/38 G01M3/202

    Abstract: Embodiments of the present invention employ measurement of argon as the means to detect the presence of an atmospheric leak in a processing chamber. Argon detected inside the process chamber is conclusive evidence of a leak. Furthermore, the amount of detected argon provides information on the rate of air entering through the leak. In one embodiment, leak detection takes place in the main plasma inside the processing chamber. In another embodiment, leak detection takes place in the self-contained plasma generated in a remote plasma sensor. Additional measurements can be performed, such as measuring the amount of oxygen, and/or the presence of moisture to help in detecting and quantifying outgassing from the processing chamber.

    Abstract translation: 本发明的实施例采用氩的测量作为检测处理室中大气泄漏的存在的手段。 在处理室内检测到的氩是确定的泄漏证据。 此外,检测到的氩气的量提供关于通过泄漏进入的空气的速率的信息。 在一个实施例中,泄漏检测发生在处理室内的主等离子体中。 在另一个实施例中,在远程等离子体传感器中产生的独立等离子体中发生泄漏检测。 可以进行额外的测量,例如测量氧的量和/或湿气的存在,以帮助检测和定量从处理室排气。

    Method and apparatus for enhancing in-situ gas flow measurement performance
    9.
    发明授权
    Method and apparatus for enhancing in-situ gas flow measurement performance 有权
    用于提高原位气流测量性能的方法和装置

    公开(公告)号:US08271211B2

    公开(公告)日:2012-09-18

    申请号:US12634593

    申请日:2009-12-09

    CPC classification number: G01F15/046 G01F1/34 Y10T137/0324

    Abstract: An in-situ gas flow measurement controller measures the temperature and rate of pressure drop upstream from a flow control device (FCD). The controller samples the pressure and temperature data and applies the equivalent of a decimating filter to the data to produce filtered data at a slower sampling rate. The controller derives timestamps by counting ticks from the sampling clock of the A/D converter that is sampling the pressure at regular intervals to ensure the timestamps associated with the pressure samples are accurate and do not contain jitter that is associated with software clocks. The controller additionally normalizes the temperature reading to account for power supply fluctuations, filters out noise from the pressure and temperature readings, and excludes data during periods of instability. It calculates the gas flow rate accounting for possible non-linearities in the pressure measurements, and provides the computed gas flow measurement via one of many possible interfaces.

    Abstract translation: 原位气体流量测量控制器测量流量控制装置(FCD)上游的压降的温度和速率。 控制器对压力和温度数据进行采样,并将等效的抽取滤波器应用于数据,以较慢的采样速率产生滤波数据。 控制器通过对A / D转换器的采样时钟进行计数来计算时间戳,A / D转换器采样时间间隔采样压力,以确保与压力样本相关联的时间戳准确,并且不包含与软件时钟相关的抖动。 控制器另外对温度读数进行标准化以考虑电源波动,从压力和温度读数滤除噪声,并在不稳定期间排除数据。 它计算气体流量,考虑压力测量中可能的非线性,并通过许多可能的接口之一提供计算的气体流量测量。

    Thermoelectric module having reduced spacing between semiconductor
elements
    10.
    发明授权
    Thermoelectric module having reduced spacing between semiconductor elements 失效
    热电模块具有减小的半导体元件之间的间隔

    公开(公告)号:US5515238A

    公开(公告)日:1996-05-07

    申请号:US395258

    申请日:1995-02-28

    CPC classification number: H01L35/32 Y10S257/93

    Abstract: An improved thermoelectric module is described. A first electrically conductive pattern is defined on a first substrate and a second electrically conductive pattern is defined on a second substrate. Alternating bars of a first thermoelectric material and a second thermoelectric material are arranged parallel to each other. The bars are fixed into place on the first conductive pattern by an effective thermal and electrical connection with the conductive pattern. One such connection means is soldering. Then the bars are separated into elements. The second substrate is positioned over the elements and fixed to the elements to complete the manufacture of the TEM.

    Abstract translation: 描述了一种改进的热电模块。 在第一衬底上限定第一导电图案,并且在第二衬底上限定第二导电图案。 第一热电材料和第二热电材料的交替棒彼此平行地布置。 通过与导电图案的有效的热电连接将条固定在第一导电图案上的适当位置。 一种这样的连接方式是焊接。 然后将条分成元素。 第二基板位于元件上并固定到元件上以完成TEM的制造。

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