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    LITHOGRAPHIC APPARATUS AND A METHOD OF OPERATING THE APPARATUS
    5.
    发明申请
    LITHOGRAPHIC APPARATUS AND A METHOD OF OPERATING THE APPARATUS 审中-公开
    平面设备和操作设备的方法

    公开(公告)号：US20100271606A1

    公开(公告)日：2010-10-28

    申请号：US12763846

    申请日：2010-04-20

    申请人： Laurens Anthony SANDERSE ,  Josephus Cornelius Johannes Antonius Vugts ,  Ivo Adam Johannes Thomas

    发明人： Laurens Anthony SANDERSE ,  Josephus Cornelius Johannes Antonius Vugts ,  Ivo Adam Johannes Thomas

    IPC分类号： G03B27/32 ,  G03B27/42

    CPC分类号： G03F7/70341

    摘要： An immersion lithographic apparatus is disclosed. The apparatus has a projection system configured to project a patterned radiation beam onto a target portion of the substrate, the projection system having a lower surface. The apparatus also has a liquid confinement structure defining, in use, in part with the lower surface and the substrate and/or substrate table, an immersion space, the immersion space comprising, in use, a liquid meniscus between a part of the lower surface facing a surface of the liquid confinement structure and a facing surface of the liquid confinement structure facing the part of the lower surface. The apparatus also has a pinning surface comprising a plurality of meniscus pinning features, the pinning surface being part of or on the part of the lower surface, or part of or on the facing surface of the liquid confinement structure, or part of or on both.

    摘要翻译： 公开了一种浸没式光刻设备。 该装置具有投影系统，该投影系统配置成将图案化的辐射束投影到基板的目标部分上，该投影系统具有下表面。 该装置还具有液体限制结构，其在使用中部分地限定下表面和衬底和/或衬底台，浸没空间，浸没空间在使用中包括在下表面的一部分之间的液体弯液面 面对液体限制结构的表面和面向下表面的一部分的液体限制结构的面对表面。 该装置还具有钉扎表面，该钉扎表面包括多个弯液面钉扎特征，钉扎表面是液面限制结构的一部分或部分下部表面的一部分或其一部分或面对表面，或两者的一部分或两者上 。

    Lithographic projection assembly, load lock and method for transferring objects
    10.
    发明授权
    Lithographic projection assembly, load lock and method for transferring objects 有权
    光刻投影组件，负载锁定和传送对象的方法

    公开(公告)号：US07359031B2

    公开(公告)日：2008-04-15

    申请号：US10797725

    申请日：2004-03-11

    申请人： Albert Jan Hendrik Klomp ,  Jan Frederik Hoogkamp ,  Josephus Cornelius Johannes Antonius Vugts ,  Robert Gordon Livesey ,  Johannes Hendrikus Gertrudis Franssen

    发明人： Albert Jan Hendrik Klomp ,  Jan Frederik Hoogkamp ,  Josephus Cornelius Johannes Antonius Vugts ,  Robert Gordon Livesey ,  Johannes Hendrikus Gertrudis Franssen

    IPC分类号： G03B27/42 ,  G03B27/58

    CPC分类号： G03F7/70975 ,  G03F7/7075 ,  G03F7/70858 ,  G03F7/70991

    摘要： Lithographic projection assembly, including at least one load lock for transferring objects, in particular substrates, between a first environment and a second environment, the second environment preferably having a lower pressure than the first environment; an object handler including a handler chamber in which the second environment prevails; and a lithographic projection apparatus including a projection chamber. The handler chamber and projection chamber can communicate for transferring the objects. The load lock includes a load lock chamber; evacuation device for evacuating the load lock chamber; and door device for closing the load lock chamber during evacuation and for opening the load lock chamber to enter an object in or remove an object from the load lock chamber. The load lock chamber may be provided with at least two mutually distinct object support positions.

    摘要翻译： 光刻投影组件包括用于在第一环境和第二环境之间传送物体，特别是基底的至少一个装载锁，所述第二环境优选地具有比所述第一环境更低的压力; 一个对象处理器，包括处理器室，其中第二个环境占优势; 以及包括投影室的光刻投影装置。 处理器室和投影室可以通信用于传送物体。 负载锁包括一个负载锁定室; 排气装置，用于排空负载锁定室; 以及门装置，用于在排气期间关闭装载锁定室，并且用于打开装载锁定室以将物体进入物体或将其从装载锁定室移除。 负载锁定室可以设置有至少两个相互不同的物体支撑位置。