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公开(公告)号:US5372912A
公开(公告)日:1994-12-13
申请号:US998984
申请日:1992-12-31
申请人: Robert D. Allen , Jr.; Willard E. Conley , William D. Hinsberg, III , Pamela E. Jones , Kevin M. Welsh
发明人: Robert D. Allen , Jr.; Willard E. Conley , William D. Hinsberg, III , Pamela E. Jones , Kevin M. Welsh
CPC分类号: G03F7/039 , Y10S430/111
摘要: The present invention relates to a radiation-sensitive resist composition and the process for its use in the manufacture of integrated circuits. The composition comprises a radiation-sensitive acid generator, a binder soluble in aqueous base and an acrylate copolymer having acid labile pendant groups.
摘要翻译: 本发明涉及一种辐射敏感抗蚀剂组合物及其用于制造集成电路的方法。 该组合物包含辐射敏感性酸产生剂,可溶于碱水溶液的粘合剂和具有酸不稳定侧基的丙烯酸酯共聚物。