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公开(公告)号：US07670731B2
公开(公告)日：2010-03-02
申请号：US11582566
申请日：2006-10-18
申请人： Jozef Maria Finders , Johannes Anna Quaedackers , Judocus Marie Dominicus Stoeldraijer , Johannes Wilhelmus De Klerk , Alexander Serebryakov
发明人： Jozef Maria Finders , Johannes Anna Quaedackers , Judocus Marie Dominicus Stoeldraijer , Johannes Wilhelmus De Klerk , Alexander Serebryakov
CPC分类号： G03F7/70333 , G03F7/70425
摘要： A method for improving the uniformity of a lithographic process. In one aspect, the probability density function of a first and second lithographic apparatus are matched by providing a continuous z-motion to a stage in the first lithographic apparatus during substrate exposure. Preferably, the z-motion is characterized by a normally distributed function, wherein the effective probability density function of the first apparatus is substantially similar to the probability density function of the second apparatus.
摘要翻译： 一种改善光刻工艺均匀性的方法。 在一个方面，通过在衬底曝光期间向第一光刻设备中的台提供连续的z运动来匹配第一和第二光刻设备的概率密度函数。 优选地，z运动的特征在于正态分布函数，其中第一装置的有效概率密度函数基本上类似于第二装置的概率密度函数。
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公开(公告)号：US07148952B2
公开(公告)日：2006-12-12
申请号：US10976314
申请日：2004-10-29
申请人： Markus Franciscus Antonius Eurlings , Johannes Jacobus Matheus Baselmans , Hako Botma , Jan Bruining , Marcel Mathijs Theodore Marie Dierichs , Antonius Johannes Josephus Van Dijsseldonk , Judocus Marie Dominicus Stoeldraijer
发明人： Markus Franciscus Antonius Eurlings , Johannes Jacobus Matheus Baselmans , Hako Botma , Jan Bruining , Marcel Mathijs Theodore Marie Dierichs , Antonius Johannes Josephus Van Dijsseldonk , Judocus Marie Dominicus Stoeldraijer
IPC分类号： G03B27/42
CPC分类号： G03F7/70075
摘要： The present invention provides a lithographic apparatus comprising an illumination system for providing a projection beam of radiation. The illumination system comprises at least one movable optical element (7), such that a projection beam of radiation (4) can be shifted around a central position. This ensures that inhomogeneities in the intensity distribution in the projection beam (4) will be smeared out, which in turn provides an improved homogeneity of the exposure of a surface to be illuminated by the system, such as a wafer or other substrate. The optical element (7) may comprise a motor movable mirror, prism, filter, lens, axicon, diffuser, diffractive optical array, optical integrator, etc. The invention further provides a device manufacturing method, using a lithographic apparatus according to the invention, wherein the optical element is moved, in order to provide an optimum homogeneity for the projection beam of radiation.
摘要翻译： 本发明提供了一种包括用于提供投影射线束的照明系统的光刻设备。 照明系统包括至少一个可移动光学元件（7），使得投影射线束（4）能够围绕中心位置移动。 这确保了投影束（4）中的强度分布中的不均匀性将被涂抹，这反过来提供了由诸如晶片或其它基底的系统照射的表面的曝光的改进的均匀性。 光学元件（7）可以包括电动机可移动镜，棱镜，滤镜，透镜，旋转三棱镜，漫射器，衍射光学阵列，光学积分器等。本发明还提供了一种使用根据本发明的光刻设备的器件制造方法， 其中所述光学元件被移动，以便为所述投影射束提供最佳均匀性。
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3.发明授权公开(公告)号：US07804582B2
公开(公告)日：2010-09-28
申请号：US11494794
申请日：2006-07-28
申请人： Koen Jacobus Johannes Maria Zaal , Joost Jeroen Ottens , Judocus Marie Dominicus Stoeldraijer , Antonius Johannes De Kort , Franciscus Van De Mast , Marteijn De Jong
发明人： Koen Jacobus Johannes Maria Zaal , Joost Jeroen Ottens , Judocus Marie Dominicus Stoeldraijer , Antonius Johannes De Kort , Franciscus Van De Mast , Marteijn De Jong
IPC分类号： G03B27/58
CPC分类号： G03F7/70858 , G03F7/70516 , G03F7/70775
摘要： A lithographic apparatus includes a system to compensate for the effect of thermal distortion of the substrate table on position measurements of the substrate table using lateral mirrors in the substrate table. Methods of calibrating a lithographic apparatus using various substrate table scan trajectories and measurements of the localized position and rotation of lateral mirrors in the substrate table are presented. A dual stage lithographic apparatus with alignment marks defining the geometry of a lateral mirror used only at the exposure station to measure the geometry of the lateral mirror when the substrate table is at the measurement station.
摘要翻译： 光刻设备包括一个系统，用于补偿衬底台的热变形对衬底台的位置测量的影响，使用衬底台中的侧视镜。 提出了使用各种衬底台扫描轨迹校准光刻设备的方法以及衬底台中横向镜的局部位置和旋转的测量。 具有对准标记的双级光刻设备，其限定仅在曝光站处使用的侧视镜的几何形状，以便当衬底台位于测量站时测量侧视镜的几何形状。
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4.发明申请Lithographic apparatus, device manufacturing method and computer program product 有权平版印刷设备，设备制造方法和计算机程序产品公开(公告)号：US20080158528A1
公开(公告)日：2008-07-03
申请号：US11984837
申请日：2007-11-21
申请人： Judocus Marie Dominicus Stoeldraijer , Erik Roelof Loopstra , Heine Melle Mulder , Timotheus Franciscus Sengers , Freerk Adriaan Stoffels , Laurentius Catrinus Jorritsma , Reiner Maria Jungblut
发明人： Judocus Marie Dominicus Stoeldraijer , Erik Roelof Loopstra , Heine Melle Mulder , Timotheus Franciscus Sengers , Freerk Adriaan Stoffels , Laurentius Catrinus Jorritsma , Reiner Maria Jungblut
CPC分类号： G03F7/70891 , G03F7/70108 , G03F7/70158
摘要： In a lithographic apparatus, a corrective irradiation procedure is performed using an illumination mode arranged so as to heat a selected part of an element of the projection system near a pupil plane thereof that is relatively unheated during production exposure. The corrective irradiation procedure aims to improve uniformity of optical element heating of the projective system and/or to reduce a phase gradient.
摘要翻译： 在光刻设备中，使用照射模式来执行校正照射程序，所述照明模式被布置成在生产曝光期间将相对不加热的瞳孔平面附近的投影系统的元件的选定部分加热。 校正辐射程序旨在提高投影系统的光学元件加热的均匀性和/或降低相位梯度。
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公开(公告)号：US08896809B2
公开(公告)日：2014-11-25
申请号：US11889722
申请日：2007-08-15
申请人： Judocus Marie Dominicus Stoeldraijer , Erik Roelof Loopstra , Jan Bernard Plechelmus Van Schoot , Diederik Jan Maas
发明人： Judocus Marie Dominicus Stoeldraijer , Erik Roelof Loopstra , Jan Bernard Plechelmus Van Schoot , Diederik Jan Maas
CPC分类号： G03F7/7045 , G03F7/70425 , G03F7/70466 , G03F7/70733 , G03F7/70991
摘要： A lithographic apparatus and method is disclosed to reduce the exposure time that a substrate spends within a main lithographic apparatus by pre- (or post-) exposing one or more edge devices on the substrate. Because an edge device does not ultimately yield a useful device, it can be exposed with a lithographic apparatus that has a lower resolution than that used to expose one or more of the other, complete devices produced from the substrate. Therefore, the pre- (or post-) exposure of an edge device can be performed using a less complex, and less expensive, lithographic device.
摘要翻译： 公开了一种光刻设备和方法，以通过预先（或后）暴露基板上的一个或多个边缘设备来减少基板在主平版印刷设备内花费的曝光时间。 因为边缘装置最终不会产生有用的装置，所以可以用光刻设备曝光，该光刻设备的分辨率比用于暴露从基板产生的一个或多个其它完整装置的分辨率低。 因此，可以使用较不复杂和较便宜的光刻设备来执行边缘设备的预曝光（或后曝光）。
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公开(公告)号：US20090190115A1
公开(公告)日：2009-07-30
申请号：US12392744
申请日：2009-02-25
CPC分类号： G03F7/70333 , G03F7/70425
摘要： A method for exposing a resist layer on a substrate to an image of a pattern on a mask is disclosed whereby, after starting exposure and before completing exposure, a controlled amount of contrast loss is introduced by a controller in the image at the resist layer by changing during exposure the position of the substrate holder. The contrast loss affects the pitch dependency of the resolution of a lithographic projection apparatus, and its control is used to match pitch dependency of resolution between different lithographic projection apparatus.
摘要翻译： 公开了一种用于将基板上的抗蚀剂层暴露于掩模上的图案的图像的方法，其中，在开始曝光之后并且在完成曝光之前，控制器通过控制器在抗蚀剂层的图像中引入受控量的对比度损失 在曝光期间改变衬底保持器的位置。 对比度损耗影响光刻投影设备的分辨率的音调依赖性，并且其控制用于匹配不同光刻投影设备之间的分辨率的音调依赖性。
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7.发明授权Lithographic apparatus, device manufacturing method and computer program product 有权平版印刷设备，设备制造方法和计算机程序产品公开(公告)号：US07903234B2
公开(公告)日：2011-03-08
申请号：US11984837
申请日：2007-11-21
申请人： Judocus Marie Dominicus Stoeldraijer , Erik Roelof Loopstra , Heine Melle Mulder , Timotheus Franciscus Sengers , Freerk Adriaan Stoffels , Laurentius Catrinus Jorritsma , Reiner Maria Jungblut
发明人： Judocus Marie Dominicus Stoeldraijer , Erik Roelof Loopstra , Heine Melle Mulder , Timotheus Franciscus Sengers , Freerk Adriaan Stoffels , Laurentius Catrinus Jorritsma , Reiner Maria Jungblut
CPC分类号： G03F7/70891 , G03F7/70108 , G03F7/70158
摘要： In a lithographic apparatus, a corrective irradiation procedure is performed using an illumination mode arranged so as to heat a selected part of an element of the projection system near a pupil plane thereof that is relatively unheated during production exposure. The corrective irradiation procedure aims to improve uniformity of optical element heating of the projective system and/or to reduce a phase gradient.
摘要翻译： 在光刻设备中，使用照射模式来执行校正照射程序，所述照明模式被布置成在生产曝光期间将相对不加热的瞳孔平面附近的投影系统的元件的选定部分加热。 校正辐射程序旨在提高投影系统的光学元件加热的均匀性和/或降低相位梯度。
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公开(公告)号：US07732110B2
公开(公告)日：2010-06-08
申请号：US12392744
申请日：2009-02-25
CPC分类号： G03F7/70333 , G03F7/70425
摘要： A method for exposing a resist layer on a substrate to an image of a pattern on a mask is disclosed whereby, after starting exposure and before completing exposure, a controlled amount of contrast loss is introduced by a controller in the image at the resist layer by changing during exposure the position of the substrate holder. The contrast loss affects the pitch dependency of the resolution of a lithographic projection apparatus, and its control is used to match pitch dependency of resolution between different lithographic projection apparatus.
摘要翻译： 公开了一种用于将基板上的抗蚀剂层暴露于掩模上的图案的图像的方法，其中，在开始曝光之后并且在完成曝光之前，控制器通过控制器在抗蚀剂层的图像中引入受控量的对比度损失 在曝光期间改变衬底保持器的位置。 对比度损耗影响光刻投影设备的分辨率的音调依赖性，并且其控制用于匹配不同光刻投影设备之间的分辨率的音调依赖性。
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公开(公告)号：US07655368B2
公开(公告)日：2010-02-02
申请号：US10936727
申请日：2004-09-09
CPC分类号： G03F7/70333 , G03F7/70425
摘要： A method for exposing a resist layer on a substrate to an image of a pattern on a mask is disclosed whereby, after starting exposure and before completing exposure, a controlled amount of contrast loss is introduced by a controller in the image at the resist layer by changing during exposure the position of the substrate holder. The contrast loss affects the pitch dependency of the resolution of a lithographic projection apparatus, and its control is used to match pitch dependency of resolution between different lithographic projection apparatus.
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公开(公告)号：US20090047604A1
公开(公告)日：2009-02-19
申请号：US11889722
申请日：2007-08-15
申请人： Judocus Marie Dominicus Stoeldraijer , Erik Roelof Loopstra , Jan Bernard Plechelmus Van Schoot , Diederik Jan Maas
发明人： Judocus Marie Dominicus Stoeldraijer , Erik Roelof Loopstra , Jan Bernard Plechelmus Van Schoot , Diederik Jan Maas
CPC分类号： G03F7/7045 , G03F7/70425 , G03F7/70466 , G03F7/70733 , G03F7/70991
摘要： A lithographic apparatus and method is disclosed to reduce the exposure time that a substrate spends within a main lithographic apparatus by pre- (or post-) exposing one or more edge devices on the substrate. Because an edge device does not ultimately yield a useful device, it can be exposed with a lithographic apparatus that has a lower resolution than that used to expose one or more of the other, complete devices produced from the substrate. Therefore, the pre- (or post-) exposure of an edge device can be performed using a less complex, and less expensive, lithographic device.
摘要翻译： 公开了一种光刻设备和方法，以通过预先（或后）暴露基板上的一个或多个边缘设备来减少基板在主平版印刷设备内花费的曝光时间。 因为边缘装置最终不会产生有用的装置，所以可以用光刻设备曝光，该光刻设备的分辨率比用于暴露从基板产生的一个或多个其它完整装置的分辨率低。 因此，可以使用较不复杂和较便宜的光刻设备来执行边缘设备的预曝光（或后曝光）。
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