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公开(公告)号：US06979527B2
公开(公告)日：2005-12-27
申请号：US10261609
申请日：2002-09-30
申请人： Jumi Kimura , Moriaki Abe , Kazuhiro Shinoda
发明人： Jumi Kimura , Moriaki Abe , Kazuhiro Shinoda
摘要： A master base for fabrication includes a substrate, a first photoresist layer disposed on the substrate, and a second photoresist layer disposed on the first photoresist layer, wherein the first photoresist layer attenuates or absorbs rays reflected at the interface between the first photoresist layer and the substrate to prevent the reflected rays from interfering with applied rays in a exposing step. A method for manufacturing a master base for fabrication includes the steps of forming a first photoresist layer on a substrate, baking the first photoresist layer at the setting temperature of the first photoresist layer, and forming a second photoresist layer on the first photoresist layer.
摘要翻译： 用于制造的主基底包括衬底，设置在衬底上的第一光致抗蚀剂层和设置在第一光致抗蚀剂层上的第二光致抗蚀剂层，其中第一光致抗蚀剂层衰减或吸收在第一光致抗蚀剂层和第二光致抗蚀剂层之间的界面反射的光线 基板，以防止反射光线在曝光步骤中干扰施加的光线。 制造用于制造的母版的方法包括以下步骤：在衬底上形成第一光致抗蚀剂层，在第一光致抗蚀剂层的设定温度下烘烤第一光致抗蚀剂层，以及在第一光致抗蚀剂层上形成第二光致抗蚀剂层。
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公开(公告)号：US20060035472A1
公开(公告)日：2006-02-16
申请号：US11250940
申请日：2005-10-14
申请人： Jumi Kimura , Moriaki Abe , Kazuhiro Shinoda
发明人： Jumi Kimura , Moriaki Abe , Kazuhiro Shinoda
IPC分类号： H01L21/31 , H01L21/469
摘要： A master base for fabrication includes a substrate, a first photoresist layer disposed on the substrate, and a second photoresist layer disposed on the first photoresist layer, wherein the first photoresist layer attenuates or absorbs rays reflected at the interface between the first photoresist layer and the substrate to prevent the reflected rays from interfering with applied rays in a exposing step. A method for manufacturing a master base for fabrication includes the steps of forming a first photoresist layer on a substrate, baking the first photoresist layer at the setting temperature of the first photoresist layer, and forming a second photoresist layer on the first photoresist layer.
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