公开(公告)号：US20090011681A1

公开(公告)日：2009-01-08

申请号：US12182205

申请日：2008-07-30

申请人： Kesahiro Koike ,  Junji Miyagaki

发明人： Kesahiro Koike ,  Junji Miyagaki

IPC分类号： B24B1/00

CPC分类号： C09G1/02 ,  B24B37/044

摘要： In a method of producing a glass substrate for a mask blank, a surface of the glass substrate is polished by the use of a polishing liquid having a pH value between 7.0 and 7.6 that contains abrasive grains, and the abrasive grains include colloidal silica abrasive grains produced by hydrolysis of an organosilicon compound. The polishing process includes a surface roughness control step for initially finishing the surface of the glass substrate to a predetermined surface roughness by moving a polishing member and the glass substrate relative to each other under a predetermined pressure. This is followed by a protrusion suppressing step, carried out immediately before the end of the polishing process, under a pressure lower than the predetermined pressure, to minimize polishing rate and suppress occurrence of a fine convex protrusion. A mask blank and then a transfer mask are formed from this polished glass substrate.

摘要翻译： 在制造掩模用玻璃基板的方法中，通过使用含有磨粒的pH值为7.0〜7.6的研磨液对玻璃基板的表面进行研磨，磨粒包括胶体二氧化硅磨粒 通过有机硅化合物的水解产生。 抛光工艺包括表面粗糙度控制步骤，用于通过在预定压力下相对于彼此移动抛光构件和玻璃基板来最初将玻璃基板的表面完成到预定的表面粗糙度。 接下来是在低于预定压力的压力下在抛光过程结束之前执行的突起抑制步骤，以最小化抛光速率并抑制细凸起突出的发生。 从该抛光的玻璃基板形成掩模坯料，然后形成转印掩模。

公开(公告)号：US07732101B2

公开(公告)日：2010-06-08

申请号：US12182205

申请日：2008-07-30

申请人： Kesahiro Koike ,  Junji Miyagaki

发明人： Kesahiro Koike ,  Junji Miyagaki

IPC分类号： G03F1/00 ,  G03F1/14 ,  B24B1/00 ,  B24B7/24 ,  B24C1/08

CPC分类号： C09G1/02 ,  B24B37/044

摘要： In a method of producing a glass substrate for a mask blank, a surface of the glass substrate is polished by the use of an alkaline polishing liquid that contains colloidal silica abrasive grains, from which alkali metal is removed to suppress occurrence of an alkali metal gel substance protrusion adhered on the glass substrate. The polishing process may include a surface roughness control step for initially finishing the surface of the glass substrate to a predetermined surface roughness by moving a polishing member and the glass substrate relative to each other under a predetermined pressure. This may be followed by a protrusion suppressing step under a pressure lower than the predetermined pressure, to minimize polishing rate and suppress occurrence of a fine convex protrusion.

摘要翻译： 在制造掩模用玻璃基板的方法中，通过使用含有胶体二氧化硅磨粒的碱性研磨液对玻璃基板的表面进行研磨，除去碱金属以抑制碱金属凝胶的发生 物质突起粘附在玻璃基板上。 抛光过程可以包括表面粗糙度控制步骤，用于通过在预定压力下相对于彼此移动抛光构件和玻璃基板来最初将玻璃基板的表面完成到预定的表面粗糙度。 这之后可以在低于预定压力的压力下进行突起抑制步骤，以最小化抛光速率并抑制细凸起突出的发生。

公开(公告)号：US07413832B2

公开(公告)日：2008-08-19

申请号：US10642657

申请日：2003-08-19

申请人： Kesahiro Koike ,  Junji Miyagaki

发明人： Kesahiro Koike ,  Junji Miyagaki

IPC分类号： C03F1/00 ,  B24B1/00 ,  C03C17/00 ,  C03C19/00 ,  B05D3/12

CPC分类号： C09G1/02 ,  B24B37/044

摘要： In a method of producing a glass substrate for a mask blank, a surface of the glass substrate is polished by the use of a polishing liquid having a pH value between 7.0 and 7.6 that contains abrasive grains, and the abrasive grains include colloidal silica abrasive grains produced by hydrolysis of an organosilicon compound. The polishing process includes a surface roughness control step for initially finishing the surface of the glass substrate to a predetermined surface roughness by moving a polishing member and the glass substrate relative to each other under a predetermined pressure. This is followed by a protrusion suppressing step, carried out immediately before the end of the polishing process, under a pressure lower than the predetermined pressure, to minimize polishing rate and suppress occurrence of a fine convex protrusion. A mask blank and then a transfer mask are formed from this polished glass substrate.

摘要翻译： 在制造掩模用玻璃基板的方法中，通过使用含有磨粒的pH值为7.0〜7.6的研磨液对玻璃基板的表面进行研磨，磨粒包括胶体二氧化硅磨粒 通过有机硅化合物的水解产生。 抛光工艺包括表面粗糙度控制步骤，用于通过在预定压力下相对于彼此移动抛光构件和玻璃基板来最初将玻璃基板的表面完成到预定的表面粗糙度。 接下来是在低于预定压力的压力下在抛光过程结束之前执行的突起抑制步骤，以最小化抛光速率并抑制细凸起突出的发生。 从该抛光的玻璃基板形成掩模坯料，然后形成转印掩模。