Electrostatic chuck having a plurality of gas inlet channels
    2.
    发明授权
    Electrostatic chuck having a plurality of gas inlet channels 有权
    具有多个气体入口通道的静电吸盘

    公开(公告)号:US06370006B1

    公开(公告)日:2002-04-09

    申请号:US09506423

    申请日:2000-02-17

    IPC分类号: H02N1300

    摘要: An electrostatic chuck and a process of manufacturing an electrostatic chuck for supporting a semiconductor wafer during wafer processing and for providing a plurality of gas inlet channels extending through the chuck and through which thermal transfer gas can be supplied to the back side of the wafer to enhance the thermal transfer between the wafer and the chuck, embedding a plurality of inserts in a ceramic electrostatic chuck, each insert comprising a matrix of the ceramic of which the electrostatic chuck is made and a plurality of removable elongate members, and removing the elongate members to form a plurality of elongate holes providing the plurality of gas inlet channels.

    摘要翻译: 一种静电卡盘和制造用于在晶片加工期间支撑半导体晶片的静电卡盘的工艺,以及用于提供延伸穿过卡盘的多个气体入口通道,并且热传递气体可以通过该导入通道提供到晶片的背面以增强 在晶片和卡盘之间的热传递,将多个插入件嵌入陶瓷静电卡盘中,每个插入件包括其上形成有静电卡盘的陶瓷基体和多个可移除的细长构件,并且将细长构件移除到 形成多个提供多个气体入口通道的细长孔。