Semiconductor device and method of manufacturing thereof
    1.
    发明授权
    Semiconductor device and method of manufacturing thereof 有权
    半导体装置及其制造方法

    公开(公告)号:US08262970B2

    公开(公告)日:2012-09-11

    申请号:US10599041

    申请日:2005-03-08

    IPC分类号: H01L23/29 H01L21/56

    摘要: A method of manufacturing a semiconductor device sealed in a cured silicone body by placing an unsealed semiconductor device into a mold and subjecting a curable liquid silicone composition that fills the spaces between the mold and the unsealed semiconductor device to compression molding under a predetermined molding temperature, wherein said curable liquid silicone composition has viscosity of 90 Pa·s or less at room temperature, a time interval from the moment directly after measurement of a torque with a curometer at the molding temperature to the moment when the torque reached 1 kgf·cm is not less than 1 min., while the time interval during which the torque grows from 1 kgf·cm to 5 kgf·cm is not more than 1 min.

    摘要翻译: 一种制造半导体器件的方法,该半导体器件通过将未密封的半导体器件放置在模具中并将填充模具和非密封半导体器件之间的空间的可固化液体硅氧烷组合物在预定的成型温度下进行压缩成型而密封在固化的硅氧烷体中, 其中所述可固化液体硅氧烷组合物在室温下的粘度为90Pa·s以下,从成型温度下的立方微米的扭矩测定之后的时刻到扭矩达到1kgf·cm时的时间间隔为 不小于1分钟,扭矩从1 kgf·cm增加到5 kgf·cm的时间间隔不超过1分钟。

    Method for forming insulating thin films
    10.
    发明授权
    Method for forming insulating thin films 失效
    绝缘薄膜的形成方法

    公开(公告)号:US06448175B1

    公开(公告)日:2002-09-10

    申请号:US09656728

    申请日:2000-09-07

    IPC分类号: H01L214763

    CPC分类号: H01L21/316

    摘要: To provide a method for forming insulating thin films that can induce condensation of silanol and dehydration to a high degree at or near ambient pressure. An interlevel dielectric layer is formed on a semiconductor substrate by coating hydrogen silsesquioxane resin onto the substrate and curing the hydrogen silsesquioxane resin to produce an interlevel dielectric layer. This interlevel dielectric layer is then heated at a pressure from 1 to 1,000 torr at a temperature from 150 to 550° C.

    摘要翻译: 提供一种形成绝缘薄膜的方法,该方法可以在环境压力或接近环境压力的情况下高度地引起硅烷醇的冷凝和脱水。通过将氢倍半硅氧烷树脂涂覆到基底上并固化氢倍半硅氧烷,形成在半导体衬底上的层间电介质层 树脂以产生层间介电层。 然后在150至550℃的温度下,将该层间电介质层在1至1000托的压力下加热。