公开(公告)号：US20160027675A1

公开(公告)日：2016-01-28

申请号：US14774377

申请日：2014-03-14

申请人： Abraham RAVID ,  Kevin GRIFFIN ,  Joseph YUDOVSKY ,  Kaushal GANGAKHEDKAR ,  Dmitry A. DZILNO ,  Alex MINKOVICH

发明人： Abraham Ravid ,  Kevin Griffin ,  Joseph Yudovsky ,  Kaushal Gangakhedkar ,  Dmitry A. Dzilno ,  Alex Minkovich

IPC分类号： H01L21/67 ,  C23C16/458 ,  C23C16/52 ,  H01L21/687 ,  C23C16/455

CPC分类号： H01L21/67259 ,  C23C16/45544 ,  C23C16/4584 ,  C23C16/52 ,  H01L21/67248 ,  H01L21/68764 ,  H01L21/68771

摘要： Apparatus and methods of measuring and controlling the gap between a susceptor assembly and a gas distribution assembly are described. Apparatus and methods for positional control and temperature control for wafer transfer purposes are also described.

摘要翻译： 描述了测量和控制基座组件和气体分配组件之间的间隙的装置和方法。 还描述了用于晶片转印目的的位置控制和温度控制的装置和方法。

公开(公告)号：US20150345022A1

公开(公告)日：2015-12-03

申请号：US14435070

申请日：2014-02-20

申请人： Joseph YUDOVSKY ,  Kevin GRIFFIN ,  Kaushal GANGAKHEDKAR

发明人： Joseph Yudovsky ,  Kevin Griffin ,  Kaushal Gangakhedkar

IPC分类号： C23C16/52 ,  H01L21/285 ,  H01L21/66 ,  H01L21/02 ,  C23C16/455 ,  C23C16/458

CPC分类号： C23C16/52 ,  C23C16/45544 ,  C23C16/45551 ,  C23C16/4583 ,  H01L21/0228 ,  H01L21/0262 ,  H01L21/28556 ,  H01L22/10

摘要： Described are apparatus and methods for processing a semiconductor wafer in which the gap between the wafer surface and the gas distribution assembly remains uniform and of known thickness. The wafer is positioned within a susceptor assembly and the assembly is lifted toward the gas distribution assembly using actuators. The wafer can be lifted toward the gas distribution assembly by creating a fluid bearing below and/or above the wafer.

摘要翻译： 描述了其中晶片表面和气体分配组件之间的间隙保持均匀并具有已知厚度的半导体晶片的处理装置和方法。 晶片定位在基座组件内，并且使用致动器将组件提升到气体分配组件。 可以通过在晶片下方和/或上方产生流体轴承来将晶片提升到气体分配组件。

公开(公告)号：US20150376790A1

公开(公告)日：2015-12-31

申请号：US14768911

申请日：2014-02-20

申请人： Joseph YUDOVSKY ,  Kevin Griffin ,  Kaushal GANGAKHEDKAR

发明人： Joseph Yudovsky ,  Kevin Griffin ,  Kaushal Gangakhedkar

IPC分类号： C23C16/48 ,  C23C16/458 ,  H01L21/02 ,  C23C16/455

CPC分类号： C23C16/481 ,  C23C16/455 ,  C23C16/45544 ,  C23C16/4583 ,  C23C16/4586 ,  H01L21/02104

摘要： Apparatus and methods for processing a semiconductor wafer so that the wafer remains in place during processing. The wafer is subjected to a pressure differential between the top surface and bottom surface so that sufficient force prevents the wafer from moving during processing.

摘要翻译： 用于处理半导体晶片的装置和方法，使得晶片在处理期间保持就位。 晶片经受顶表面和底表面之间的压差，使得足够的力防止晶片在加工过程中移动。

公开(公告)号：US07468611B2

公开(公告)日：2008-12-23

申请号：US11875655

申请日：2007-10-19

申请人： Kent Nguyen ,  Eric Thompson ,  Hai Tran ,  Kaushal Gangakhedkar ,  Robert Barnett ,  Daniel Toet ,  David Baldwin ,  Steve Aochi ,  Neil Nguyen

发明人： Kent Nguyen ,  Eric Thompson ,  Hai Tran ,  Kaushal Gangakhedkar ,  Robert Barnett ,  Daniel Toet ,  David Baldwin ,  Steve Aochi ,  Neil Nguyen

IPC分类号： G01R31/00 ,  G01R31/02

CPC分类号： G09G3/006 ,  G02F2001/136254

摘要： A system performs continuous full linear scan of a flat media. The system includes, in part, a chuck, and at least first, second and third gantries. The chuck is adapted to support the flat media during the test. The first gantry includes at least one linear array of non-contacting sensors that spans the width of the flat media and is adapted to move across an entire length of the flat media. Each of the second and third gantries includes a probe head that spans the width of the flat media and each is adapted to apply an electrical signal to the flat media. Each probe head is further adapted to move along a direction substantially perpendicular to the surface of the flat media during the times when the first gantry is in motion and while test signals are being continuously applied.

摘要翻译： 系统执行平面介质的连续全线性扫描。 该系统部分地包括卡盘以及至少第一，第二和第三门架。 在测试期间卡盘适于支撑平面介质。 第一机架包括至少一个线性阵列的非接触式传感器，它们跨过平坦介质的宽度并且适于在平坦介质的整个长度上移动。 第二和第三门架中的每一个包括跨越平坦介质的宽度的探头，并且每个都适于将电信号施加到平坦介质。 每个探针头还适于在第一台架运动期间以及在连续施加测试信号的同时沿着基本上垂直于平坦介质的表面的方向移动。

公开(公告)号：US09103876B2

公开(公告)日：2015-08-11

申请号：US13521034

申请日：2011-01-07

申请人： Kent Nguyen ,  Kaushal Gangakhedkar ,  David Baldwin ,  Nile Light ,  Steve Aochi ,  Yan Wang ,  Atila Ersahin ,  Hai Tran ,  Thomas H. Bailey ,  Kiran Jitendra ,  Alan Cable ,  Dave Smiley ,  Thomas E. Wishard

发明人： Kent Nguyen ,  Kaushal Gangakhedkar ,  David Baldwin ,  Nile Light ,  Steve Aochi ,  Yan Wang ,  Atila Ersahin ,  Hai Tran ,  Thomas H. Bailey ,  Kiran Jitendra ,  Alan Cable ,  Dave Smiley ,  Thomas E. Wishard

IPC分类号： G01R31/28

CPC分类号： G01R31/2893

摘要： A probe system for facilitating the inspection of a device under test. System incorporates a storage rack; a probe bar gantry assembly; a probe assembly configured to electrically mate the device under test; and a robot system for picking the probe assembly from the storage rack and deliver the probe assembly to the probe bar gantry. The robot system is also enabled to pick a probe assembly from the probe bar gantry and deliver the probe assembly to the storage rack. The probe assembly includes a clamping assembly for attaching the probe assembly to the probe bar gantry or the storage rack. The probe assembly may include an array of contact pins configured to mate with conductive pads on the device under test when the probe assembly is installed on the probe bar gantry assembly.

摘要翻译： 用于便于检查被测设备的探针系统。 系统集成了一个存储架; 探针龙门架组件; 探针组件，被配置为使被测设备电气匹配; 以及用于从存储架拾取探针组件并将探针组件传送到探棒台架的机器人系统。 机器人系统还能够从探针台架上挑取探头组件，并将探头组件传送到存储架。 探针组件包括用于将探针组件附接到探针台架或存储架的夹紧组件。 探针组件可以包括接头销的阵列，其被配置为当探针组件安装在探针杆架架组件上时与被测器件上的导电焊盘配合。

公开(公告)号：US20120319713A1

公开(公告)日：2012-12-20

申请号：US13521034

申请日：2011-01-07

申请人： Kent Nguyen ,  Kaushal Gangakhedkar ,  David Baldwin ,  Nile Light ,  Steve Aochi ,  Yan Wang ,  Atila Ersahin ,  Hai Tran ,  Thomas H. Bailey ,  Kiran Jitendra ,  Alan Cable ,  Dave Smiley ,  Thomas E. Wishard

发明人： Kent Nguyen ,  Kaushal Gangakhedkar ,  David Baldwin ,  Nile Light ,  Steve Aochi ,  Yan Wang ,  Atila Ersahin ,  Hai Tran ,  Thomas H. Bailey ,  Kiran Jitendra ,  Alan Cable ,  Dave Smiley ,  Thomas E. Wishard

IPC分类号： G01R31/20 ,  G01K1/00 ,  G01J1/00

CPC分类号： G01R31/2893

摘要： A probe system for facilitating the inspection of a device under test. System incorporates a storage rack; a probe bar gantry assembly; a probe assembly configured to electrically mate the device under test; and a robot system for picking the probe assembly from the storage rack and deliver the probe assembly to the probe bar gantry. The robot system is also enabled to pick a probe assembly from the probe bar gantry and deliver the probe assembly to the storage rack. The probe assembly includes a clamping assembly for attaching the probe assembly to the probe bar gantry or the storage rack. The probe assembly may include an array of contact pins configured to mate with conductive pads on the device under test when the probe assembly is installed on the probe bar gantry assembly.

摘要翻译： 用于便于检查被测设备的探针系统。 系统集成了一个存储架; 探针龙门架组件; 探针组件，被配置为使被测设备电气匹配; 以及用于从存储架拾取探针组件并将探针组件传送到探棒台架的机器人系统。 机器人系统还能够从探针台架上挑取探头组件，并将探头组件传送到存储架。 探针组件包括用于将探针组件附接到探针台架或存储架的夹紧组件。 探针组件可以包括接头销的阵列，其被配置为当探针组件安装在探针杆架架组件上时与被测器件上的导电焊盘配合。

公开(公告)号：US20150376786A1

公开(公告)日：2015-12-31

申请号：US14768908

申请日：2014-02-20

申请人： Joseph YUDOVSKY ,  Kaushal GANGAKHEDKAR ,  Kevin GRIFFIN

发明人： Joseph Yudovsky ,  Kaushal GANGAKHEDKAR ,  Kevin Griffin

IPC分类号： C23C16/455 ,  C23C16/458

CPC分类号： C23C16/45544 ,  C23C16/455 ,  C23C16/45551 ,  C23C16/45565 ,  C23C16/4584

摘要： Gas distribution assemblies and susceptor assemblies made up of a plurality of pie-shaped segments which can be individually leveled, moved or changed. Processing chambers comprising the gas distribution assemblies, the susceptor assemblies and sensors with feedback circuits to adjust the gap between the susceptor and gas distribution assembly are also described. Methods of using the gas distribution assemblies, susceptor assemblies and processing chambers are also described.

摘要翻译： 气体分配组件和基座组件由多个可以单独调平，移动或改变的饼形段组成。 还描述了包括气体分配组件，基座组件和具有用于调节基座和气体分配组件之间的间隙的反馈电路的传感器的处理室。 还描述了使用气体分配组件，基座组件和处理室的方法。

公开(公告)号：US20200024736A1

公开(公告)日：2020-01-23

申请号：US16515875

申请日：2019-07-18

申请人： Kaushal Gangakhedkar ,  Jonathan Frankel ,  Colin C. Neikirk ,  Pravin K. Narwankar

发明人： Kaushal Gangakhedkar ,  Jonathan Frankel ,  Colin C. Neikirk ,  Pravin K. Narwankar

IPC分类号： C23C16/455 ,  C23C16/44 ,  A61K9/16

摘要： A reactor for coating particles includes a vacuum chamber configured to hold particles to be coated, a vacuum port to exhaust gas from the vacuum chamber via the outlet of the vacuum chamber, a chemical delivery system configured to flow a process gas into the particles via a gas inlet on the vacuum chamber, one or more vibrational actuators located on a first mounting surface of the vacuum chamber, and a controller configured to cause the one or more vibrational actuators to generate a vibrational motion in the vacuum chamber sufficient to induce a vibrational motion in the particles held within the vacuum chamber.

公开(公告)号：US09617640B2

公开(公告)日：2017-04-11

申请号：US14435070

申请日：2014-02-20

申请人： Joseph Yudovsky ,  Kevin Griffin ,  Kaushal Gangakhedkar

发明人： Joseph Yudovsky ,  Kevin Griffin ,  Kaushal Gangakhedkar

IPC分类号： C23C16/00 ,  C23C16/52 ,  C23C16/455 ,  C23C16/458 ,  H01L21/66 ,  H01L21/02 ,  H01L21/285

CPC分类号： C23C16/52 ,  C23C16/45544 ,  C23C16/45551 ,  C23C16/4583 ,  H01L21/0228 ,  H01L21/0262 ,  H01L21/28556 ,  H01L22/10

摘要： Described are apparatus and methods for processing a semiconductor wafer in which the gap between the wafer surface and the gas distribution assembly remains uniform and of known thickness. The wafer is positioned within a susceptor assembly and the assembly is lifted toward the gas distribution assembly using actuators. The wafer can be lifted toward the gas distribution assembly by creating a fluid bearing below and/or above the wafer.

公开(公告)号：US20080094081A1

公开(公告)日：2008-04-24

申请号：US11875655

申请日：2007-10-19

申请人： Kent Nguyen ,  Eric Thompson ,  Hai Tran ,  Kaushal Gangakhedkar ,  Robert Barnett ,  Daniel Toet ,  David Baldwin ,  Steve Aochi ,  Neil Nguyen

发明人： Kent Nguyen ,  Eric Thompson ,  Hai Tran ,  Kaushal Gangakhedkar ,  Robert Barnett ,  Daniel Toet ,  David Baldwin ,  Steve Aochi ,  Neil Nguyen

IPC分类号： G01R31/302

CPC分类号： G09G3/006 ,  G02F2001/136254

摘要： A system performs continuous full linear scan of a flat media. The system includes, in part, a chuck, and at least first, second and third gantries. The chuck is adapted to support the flat media during the test. The first gantry includes at least one linear array of non-contacting sensors that spans the width of the flat media and is adapted to move across an entire length of the flat media. Each of the second and third gantries includes a probe head that spans the width of the flat media and each is adapted to apply an electrical signal to the flat media. Each probe head is further adapted to move along a direction substantially perpendicular to the surface of the flat media during the times when the first gantry is in motion and while test signals are being continuously applied.

摘要翻译： 系统执行平面介质的连续全线性扫描。 该系统部分地包括卡盘以及至少第一，第二和第三门架。 在测试期间卡盘适于支撑平面介质。 第一机架包括至少一个线性阵列的非接触式传感器，它们跨过平坦介质的宽度并且适于在平坦介质的整个长度上移动。 第二和第三门架中的每一个包括跨越平坦介质的宽度的探头，并且每个都适于将电信号施加到平坦介质。 每个探针头还适于在第一台架运动期间以及在连续施加测试信号的同时沿着基本上垂直于平坦介质的表面的方向移动。